JPH0535217B2 - - Google Patents
Info
- Publication number
- JPH0535217B2 JPH0535217B2 JP3111886A JP3111886A JPH0535217B2 JP H0535217 B2 JPH0535217 B2 JP H0535217B2 JP 3111886 A JP3111886 A JP 3111886A JP 3111886 A JP3111886 A JP 3111886A JP H0535217 B2 JPH0535217 B2 JP H0535217B2
- Authority
- JP
- Japan
- Prior art keywords
- deposited
- reactive gas
- vapor
- deposition apparatus
- substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3111886A JPS62188774A (ja) | 1986-02-13 | 1986-02-13 | 蒸着装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3111886A JPS62188774A (ja) | 1986-02-13 | 1986-02-13 | 蒸着装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62188774A JPS62188774A (ja) | 1987-08-18 |
JPH0535217B2 true JPH0535217B2 (enrdf_load_stackoverflow) | 1993-05-26 |
Family
ID=12322489
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3111886A Granted JPS62188774A (ja) | 1986-02-13 | 1986-02-13 | 蒸着装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62188774A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03245523A (ja) * | 1990-02-22 | 1991-11-01 | Mitsubishi Electric Corp | 量子井戸構造の製造方法 |
-
1986
- 1986-02-13 JP JP3111886A patent/JPS62188774A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62188774A (ja) | 1987-08-18 |
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