JPH0530301B2 - - Google Patents
Info
- Publication number
- JPH0530301B2 JPH0530301B2 JP60045139A JP4513985A JPH0530301B2 JP H0530301 B2 JPH0530301 B2 JP H0530301B2 JP 60045139 A JP60045139 A JP 60045139A JP 4513985 A JP4513985 A JP 4513985A JP H0530301 B2 JPH0530301 B2 JP H0530301B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- cathode
- plasma processing
- processing apparatus
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
- 
        - H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
 
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP4513985A JPS611025A (ja) | 1985-03-07 | 1985-03-07 | プラズマ処理装置 | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP4513985A JPS611025A (ja) | 1985-03-07 | 1985-03-07 | プラズマ処理装置 | 
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP1779684A Division JPS60163433A (ja) | 1984-02-03 | 1984-02-03 | プラズマ処理装置 | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| JPS611025A JPS611025A (ja) | 1986-01-07 | 
| JPH0530301B2 true JPH0530301B2 (OSRAM) | 1993-05-07 | 
Family
ID=12710947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP4513985A Granted JPS611025A (ja) | 1985-03-07 | 1985-03-07 | プラズマ処理装置 | 
Country Status (1)
| Country | Link | 
|---|---|
| JP (1) | JPS611025A (OSRAM) | 
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS62263637A (ja) * | 1986-05-12 | 1987-11-16 | Ulvac Corp | マグネトロンエツチング装置 | 
| JPS6333825A (ja) * | 1986-07-28 | 1988-02-13 | Nec Corp | プラズマ化学気相成長装置 | 
| JP2628529B2 (ja) * | 1988-02-24 | 1997-07-09 | 東京エレクトロン株式会社 | プラズマcvd装置 | 
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS5927212B2 (ja) * | 1979-09-25 | 1984-07-04 | 三菱電機株式会社 | プラズマ反応装置 | 
| JPS57159025A (en) * | 1981-03-27 | 1982-10-01 | Toshiba Corp | Method and device for dry etching | 
| JPS5825236A (ja) * | 1981-08-07 | 1983-02-15 | Mitsubishi Electric Corp | ドライエツチング装置 | 
| JPS5867870A (ja) * | 1981-10-20 | 1983-04-22 | World Eng Kk | 磁界圧着マグネトロン形高速プラズマエッチングおよび反応性イオンエッチング装置 | 
- 
        1985
        - 1985-03-07 JP JP4513985A patent/JPS611025A/ja active Granted
 
Also Published As
| Publication number | Publication date | 
|---|---|
| JPS611025A (ja) | 1986-01-07 | 
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| JPH0234427B2 (OSRAM) | 
Legal Events
| Date | Code | Title | Description | 
|---|---|---|---|
| EXPY | Cancellation because of completion of term |