JPH0529160B2 - - Google Patents
Info
- Publication number
- JPH0529160B2 JPH0529160B2 JP62011287A JP1128787A JPH0529160B2 JP H0529160 B2 JPH0529160 B2 JP H0529160B2 JP 62011287 A JP62011287 A JP 62011287A JP 1128787 A JP1128787 A JP 1128787A JP H0529160 B2 JPH0529160 B2 JP H0529160B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- substrate
- crystallized glass
- paste
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
- H10W70/68—Shapes or dispositions thereof
- H10W70/6875—Shapes or dispositions thereof being on a metallic substrate, e.g. insulated metal substrates [IMS]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W40/00—Arrangements for thermal protection or thermal control
- H10W40/20—Arrangements for cooling
- H10W40/25—Arrangements for cooling characterised by their materials
- H10W40/259—Ceramics or glasses
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
- H10W70/69—Insulating materials thereof
- H10W70/692—Ceramics or glasses
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4664—Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders
- H05K3/4667—Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders characterized by using an inorganic intermediate insulating layer
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62011287A JPS63181399A (ja) | 1987-01-22 | 1987-01-22 | 高熱伝導性厚膜多層配線基板 |
| US07/456,087 US5122930A (en) | 1987-01-22 | 1990-01-04 | High heat-conductive, thick film multi-layered circuit board |
| US08/131,560 US5352482A (en) | 1987-01-22 | 1993-10-04 | Process for making a high heat-conductive, thick film multi-layered circuit board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62011287A JPS63181399A (ja) | 1987-01-22 | 1987-01-22 | 高熱伝導性厚膜多層配線基板 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63181399A JPS63181399A (ja) | 1988-07-26 |
| JPH0529160B2 true JPH0529160B2 (enExample) | 1993-04-28 |
Family
ID=11773778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62011287A Granted JPS63181399A (ja) | 1987-01-22 | 1987-01-22 | 高熱伝導性厚膜多層配線基板 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US5122930A (enExample) |
| JP (1) | JPS63181399A (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2615970B2 (ja) * | 1989-02-10 | 1997-06-04 | 三菱マテリアル株式会社 | 内部に導体、抵抗体を配線したA▲l▼N多層基板の製造方法 |
| US5614320A (en) * | 1991-07-17 | 1997-03-25 | Beane; Alan F. | Particles having engineered properties |
| US5453293A (en) * | 1991-07-17 | 1995-09-26 | Beane; Alan F. | Methods of manufacturing coated particles having desired values of intrinsic properties and methods of applying the coated particles to objects |
| US6696103B1 (en) * | 1993-03-19 | 2004-02-24 | Sumitomo Electric Industries, Ltd. | Aluminium nitride ceramics and method for preparing the same |
| US6297538B1 (en) | 1998-03-23 | 2001-10-02 | The University Of Delaware | Metal-insulator-semiconductor field effect transistor having an oxidized aluminum nitride gate insulator formed on a gallium nitride or silicon substrate |
| JP3756041B2 (ja) * | 1999-05-27 | 2006-03-15 | Hoya株式会社 | 多層プリント配線板の製造方法 |
| JP2007266289A (ja) * | 2006-03-28 | 2007-10-11 | Tdk Corp | 積層型セラミック電子部品およびその製造方法 |
| US8076587B2 (en) * | 2008-09-26 | 2011-12-13 | Siemens Energy, Inc. | Printed circuit board for harsh environments |
| RU2390877C1 (ru) * | 2009-04-08 | 2010-05-27 | Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" (ФГУП НПП "Исток") | Гибридная интегральная схема свч-диапазона |
| RU2537695C1 (ru) * | 2013-06-18 | 2015-01-10 | Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" (ФГУП "НПП "Исток") | Способ изготовления мощной гибридной интегральной схемы свч-диапазона |
| CN110462826B (zh) * | 2017-03-29 | 2023-09-19 | 株式会社村田制作所 | 功率模块以及功率模块的制造方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3187226A (en) * | 1961-08-07 | 1965-06-01 | Curtiss Wright Corp | Miniaturized electrical apparatus with combined heat dissipating and insulating structure |
| US3293501A (en) * | 1964-11-24 | 1966-12-20 | Sprague Electric Co | Ceramic with metal film via binder of copper oxide containing glass |
| US3585272A (en) * | 1969-10-01 | 1971-06-15 | Fairchild Camera Instr Co | Semiconductor package of alumina and aluminum |
| JPS5228547B2 (enExample) * | 1972-07-10 | 1977-07-27 | ||
| SU546240A1 (ru) * | 1975-03-25 | 1978-09-25 | Предприятие П/Я Г-4515 | Микросхема |
| US4188652A (en) * | 1978-01-17 | 1980-02-12 | Smolko Gennady G | Electronic device |
| US4301324A (en) * | 1978-02-06 | 1981-11-17 | International Business Machines Corporation | Glass-ceramic structures and sintered multilayer substrates thereof with circuit patterns of gold, silver or copper |
| US4322778A (en) * | 1980-01-25 | 1982-03-30 | International Business Machines Corp. | High performance semiconductor package assembly |
| JPS5817651A (ja) * | 1981-07-24 | 1983-02-01 | Hitachi Ltd | 多層回路板とその製造方法 |
| DE3247985C2 (de) * | 1982-12-24 | 1992-04-16 | W.C. Heraeus Gmbh, 6450 Hanau | Keramischer Träger |
| US4650923A (en) * | 1984-06-01 | 1987-03-17 | Narumi China Corporation | Ceramic article having a high moisture proof |
| JPH0634452B2 (ja) * | 1985-08-05 | 1994-05-02 | 株式会社日立製作所 | セラミツクス回路基板 |
| US4788627A (en) * | 1986-06-06 | 1988-11-29 | Tektronix, Inc. | Heat sink device using composite metal alloy |
| JPH0777247B2 (ja) * | 1986-09-17 | 1995-08-16 | 富士通株式会社 | 半導体装置の製造方法 |
| US4731701A (en) * | 1987-05-12 | 1988-03-15 | Fairchild Semiconductor Corporation | Integrated circuit package with thermal path layers incorporating staggered thermal vias |
-
1987
- 1987-01-22 JP JP62011287A patent/JPS63181399A/ja active Granted
-
1990
- 1990-01-04 US US07/456,087 patent/US5122930A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US5122930A (en) | 1992-06-16 |
| JPS63181399A (ja) | 1988-07-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2906282B2 (ja) | ガラスセラミック・グリーンシートと多層基板、及び、その製造方法 | |
| EP0163155B1 (en) | Low temperature fired ceramics | |
| EP0480468A1 (en) | Glassy low dielectric inorganic composition | |
| JPH04243962A (ja) | 多層セラミックパッケージ用低誘電性無機組成物、及びその調製方法 | |
| US5206190A (en) | Dielectric composition containing cordierite and glass | |
| JPH0529160B2 (enExample) | ||
| US4943470A (en) | Ceramic substrate for electrical devices | |
| JPH0946013A (ja) | スルーホール充填用導体ペースト及びセラミック回路基板 | |
| US5352482A (en) | Process for making a high heat-conductive, thick film multi-layered circuit board | |
| JP3550270B2 (ja) | 低温焼成磁器組成物および低温焼成磁器の製造方法 | |
| JPH11514627A (ja) | 多層共焼成セラミック組成物およびセラミックオンメタル回路基板 | |
| JP2001015878A (ja) | 高周波用配線基板およびその製造方法 | |
| JPH09172258A (ja) | ガラスセラミックス多層配線基板およびその製造方法 | |
| JPH029473B2 (enExample) | ||
| JPH0260236B2 (enExample) | ||
| JPH01166599A (ja) | 積層セラミック基板の製造方法 | |
| JP3085667B2 (ja) | 高周波用磁器組成物および高周波用磁器並びにその製造方法 | |
| KR20050086589A (ko) | 다층 ltcc 및 ltcc―m 기판상에 고전력 소자의향상된 온도 제어를 위한 방법 및 구조물 | |
| JPH0360443A (ja) | 低温焼成ガラスセラミック体 | |
| JPH0416039B2 (enExample) | ||
| JP2605306B2 (ja) | 多層回路基板 | |
| JP3131191B2 (ja) | 高周波用磁器組成物および高周波用磁器 | |
| JP3093602B2 (ja) | セラミック回路基板の製造方法 | |
| JP2002020162A (ja) | ガラスセラミック焼結体およびそれを用いた配線基板 | |
| JPS63307182A (ja) | 多層セラミックス回路基板 |