JPH0526182B2 - - Google Patents
Info
- Publication number
- JPH0526182B2 JPH0526182B2 JP59135203A JP13520384A JPH0526182B2 JP H0526182 B2 JPH0526182 B2 JP H0526182B2 JP 59135203 A JP59135203 A JP 59135203A JP 13520384 A JP13520384 A JP 13520384A JP H0526182 B2 JPH0526182 B2 JP H0526182B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- mask
- exposure
- photosensitive material
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 claims description 22
- 238000005530 etching Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 239000010409 thin film Substances 0.000 claims description 5
- 238000007665 sagging Methods 0.000 claims description 4
- 238000000206 photolithography Methods 0.000 claims description 3
- 238000001312 dry etching Methods 0.000 claims description 2
- 238000000992 sputter etching Methods 0.000 claims description 2
- 238000001020 plasma etching Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 13
- 229910004298 SiO 2 Inorganic materials 0.000 description 12
- 239000004020 conductor Substances 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 125000006850 spacer group Chemical group 0.000 description 8
- 230000009977 dual effect Effects 0.000 description 6
- 229910000889 permalloy Inorganic materials 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59135203A JPS6115140A (ja) | 1984-07-02 | 1984-07-02 | パタ−ン作成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59135203A JPS6115140A (ja) | 1984-07-02 | 1984-07-02 | パタ−ン作成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6115140A JPS6115140A (ja) | 1986-01-23 |
| JPH0526182B2 true JPH0526182B2 (US20030220297A1-20031127-C00074.png) | 1993-04-15 |
Family
ID=15146260
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59135203A Granted JPS6115140A (ja) | 1984-07-02 | 1984-07-02 | パタ−ン作成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6115140A (US20030220297A1-20031127-C00074.png) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07113283B2 (ja) * | 1991-01-31 | 1995-12-06 | 鹿島建設株式会社 | 竪型地下駐車場 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5429976A (en) * | 1977-08-10 | 1979-03-06 | Nec Home Electronics Ltd | Manufacture of semiconductor device |
| JPS5968737A (ja) * | 1982-10-13 | 1984-04-18 | Tokyo Ohka Kogyo Co Ltd | ポジ型及びネガ型パタ−ンの同時形成方法 |
-
1984
- 1984-07-02 JP JP59135203A patent/JPS6115140A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5429976A (en) * | 1977-08-10 | 1979-03-06 | Nec Home Electronics Ltd | Manufacture of semiconductor device |
| JPS5968737A (ja) * | 1982-10-13 | 1984-04-18 | Tokyo Ohka Kogyo Co Ltd | ポジ型及びネガ型パタ−ンの同時形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6115140A (ja) | 1986-01-23 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |