JPH0525178B2 - - Google Patents

Info

Publication number
JPH0525178B2
JPH0525178B2 JP60176191A JP17619185A JPH0525178B2 JP H0525178 B2 JPH0525178 B2 JP H0525178B2 JP 60176191 A JP60176191 A JP 60176191A JP 17619185 A JP17619185 A JP 17619185A JP H0525178 B2 JPH0525178 B2 JP H0525178B2
Authority
JP
Japan
Prior art keywords
electron beam
sample
chip
sample stage
front chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60176191A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6235641A (ja
Inventor
Tetsuya Muku
Joji Serizawa
Kazuo Yagi
Hiroyuki Tate
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP60176191A priority Critical patent/JPS6235641A/ja
Publication of JPS6235641A publication Critical patent/JPS6235641A/ja
Publication of JPH0525178B2 publication Critical patent/JPH0525178B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP60176191A 1985-08-09 1985-08-09 電子ビーム照射方法 Granted JPS6235641A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60176191A JPS6235641A (ja) 1985-08-09 1985-08-09 電子ビーム照射方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60176191A JPS6235641A (ja) 1985-08-09 1985-08-09 電子ビーム照射方法

Publications (2)

Publication Number Publication Date
JPS6235641A JPS6235641A (ja) 1987-02-16
JPH0525178B2 true JPH0525178B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-04-12

Family

ID=16009231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60176191A Granted JPS6235641A (ja) 1985-08-09 1985-08-09 電子ビーム照射方法

Country Status (1)

Country Link
JP (1) JPS6235641A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017157692A (ja) * 2016-03-02 2017-09-07 株式会社Ｓｃｒｅｅｎホールディングス 検査装置及び検査方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2819165A1 (de) * 1978-05-02 1979-11-15 Siemens Ag Rasterelektronenmikroskop
JPS5715434A (en) * 1980-06-30 1982-01-26 Mitsubishi Electric Corp Bonding apparatus
JPS5969305A (ja) * 1982-10-13 1984-04-19 Hitachi Ltd 搬送装置

Also Published As

Publication number Publication date
JPS6235641A (ja) 1987-02-16

Similar Documents

Publication Publication Date Title
JP5307181B2 (ja) 試料表面検査方法及び検査装置
JP4886549B2 (ja) 位置検出装置および位置検出方法
JPS61287122A (ja) マスク検査方法
US5527707A (en) Method of analyzing impurities in the surface of a semiconductor wafer
JPH0525178B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP3094199B2 (ja) 微小部分析方法
JPS6156868B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPS62149127A (ja) 荷電ビ−ム露光装置
JP2000124271A (ja) 欠陥検査装置
JPH0210819A (ja) パターン欠陥の検査方法
KR101009808B1 (ko) 검사 장치, 검사 방법 및 기억 매체
JPS6329507A (ja) 電子線描画装置
US5570407A (en) Distortionless x-ray inspection
JPH10209010A (ja) 荷電ビーム露光方法，荷電ビーム露光装置およびパレット
JPH04369851A (ja) 半導体装置の製造方法および製造装置
KR20240035061A (ko) 다점 검사 구조의 엑스레이 검사 장치
JPH0529143B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH0213835A (ja) 検査装置
JPS63307729A (ja) 半導体ウエハの露光方法
JP2005207908A (ja) 蛍光ｘ線分析装置
JPH09129701A (ja) マルチチャンバ装置およびそのウェハ検査方法
JPH0552781A (ja) 表面組成評価装置
JPS5885533A (ja) 半導体装置の製造方法
JP2000266703A (ja) Ｘ線照射寸法確認用冶具
JPS63128627A (ja) 半導体装置