JPH0524989B2 - - Google Patents

Info

Publication number
JPH0524989B2
JPH0524989B2 JP9488788A JP9488788A JPH0524989B2 JP H0524989 B2 JPH0524989 B2 JP H0524989B2 JP 9488788 A JP9488788 A JP 9488788A JP 9488788 A JP9488788 A JP 9488788A JP H0524989 B2 JPH0524989 B2 JP H0524989B2
Authority
JP
Japan
Prior art keywords
chamber
tray
attached
substrate
slider
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP9488788A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01268870A (ja
Inventor
Yoshihiro Hirota
Tetsuo Nanbu
Yoshifumi Azehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP9488788A priority Critical patent/JPH01268870A/ja
Publication of JPH01268870A publication Critical patent/JPH01268870A/ja
Publication of JPH0524989B2 publication Critical patent/JPH0524989B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP9488788A 1988-04-18 1988-04-18 縦トレイ搬送式スパッタ装置 Granted JPH01268870A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9488788A JPH01268870A (ja) 1988-04-18 1988-04-18 縦トレイ搬送式スパッタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9488788A JPH01268870A (ja) 1988-04-18 1988-04-18 縦トレイ搬送式スパッタ装置

Publications (2)

Publication Number Publication Date
JPH01268870A JPH01268870A (ja) 1989-10-26
JPH0524989B2 true JPH0524989B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-04-09

Family

ID=14122555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9488788A Granted JPH01268870A (ja) 1988-04-18 1988-04-18 縦トレイ搬送式スパッタ装置

Country Status (1)

Country Link
JP (1) JPH01268870A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0378054U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1989-11-30 1991-08-07
JP2804849B2 (ja) * 1989-12-26 1998-09-30 株式会社日立製作所 赤外線温度画像測定装置及びそれを備えた成膜装置
US5660114A (en) * 1995-05-10 1997-08-26 Seagate Technology, Inc. Transport system for thin film sputtering system
US6692209B1 (en) * 1999-11-19 2004-02-17 Litton Systems, Inc. Method and system for manufacturing a photocathode
JP4580860B2 (ja) * 2005-11-02 2010-11-17 大日本印刷株式会社 成膜装置
CN101641272B (zh) * 2007-04-16 2011-11-16 株式会社爱发科 输送机和成膜装置及其维护方法

Also Published As

Publication number Publication date
JPH01268870A (ja) 1989-10-26

Similar Documents

Publication Publication Date Title
US5538610A (en) Vacuum coating system
US4042128A (en) Substrate transfer apparatus for a vacuum coating system
JP3909888B2 (ja) トレイ搬送式インライン成膜装置
US6183615B1 (en) Transport system for wafer processing line
JP4034860B2 (ja) トレイ搬送式成膜装置及び補助チャンバー
JP2001237296A (ja) 連続堆積装置
JPH09176857A (ja) ワークピースを表面処理するための真空装置
WO2007013363A1 (ja) 真空処理装置
KR101992074B1 (ko) 성막 장치 및 성막 방법 그리고 태양 전지의 제조 방법
JP5116525B2 (ja) スパッタ装置
JPH0524989B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP4665155B2 (ja) 薄膜形成装置及びその方法
JPH07435Y2 (ja) 真空処理炉の搬送装置
JP2008266737A (ja) トレイ搬送式インライン成膜装置
KR101511179B1 (ko) 성막장치, 및 성막장치용 반송트레이
KR20120046223A (ko) 기판 처리 방법
KR20100071658A (ko) 박막 증착 장치
JP3997223B2 (ja) 長方形のもしくは正方形の平らな基板のための真空処理装置
JPH01272768A (ja) 縦トレイ搬送式スパッタ装置
KR100670620B1 (ko) 기판기립장치 및 진공처리장치
JP4421311B2 (ja) インライン型成膜装置及び成膜装置用ユニット
JPH02207546A (ja) インライン式真空装置に於ける基板搬送装置
JPH04231464A (ja) インライン式成膜装置の搬送装置
JP2010024469A (ja) スパッタ装置
JP4163290B2 (ja) 真空成膜装置および真空成膜方法

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees