JPH0523493B2 - - Google Patents

Info

Publication number
JPH0523493B2
JPH0523493B2 JP60220207A JP22020785A JPH0523493B2 JP H0523493 B2 JPH0523493 B2 JP H0523493B2 JP 60220207 A JP60220207 A JP 60220207A JP 22020785 A JP22020785 A JP 22020785A JP H0523493 B2 JPH0523493 B2 JP H0523493B2
Authority
JP
Japan
Prior art keywords
semiconductor device
polyimide
thick film
etching
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60220207A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6281029A (ja
Inventor
Osamu Takahata
Shingo Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP22020785A priority Critical patent/JPS6281029A/ja
Publication of JPS6281029A publication Critical patent/JPS6281029A/ja
Publication of JPH0523493B2 publication Critical patent/JPH0523493B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP22020785A 1985-10-04 1985-10-04 半導体装置の製造方法 Granted JPS6281029A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22020785A JPS6281029A (ja) 1985-10-04 1985-10-04 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22020785A JPS6281029A (ja) 1985-10-04 1985-10-04 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6281029A JPS6281029A (ja) 1987-04-14
JPH0523493B2 true JPH0523493B2 (cs) 1993-04-02

Family

ID=16747562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22020785A Granted JPS6281029A (ja) 1985-10-04 1985-10-04 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6281029A (cs)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5125079A (ja) * 1974-08-26 1976-03-01 Fujitsu Ltd Kotainetsuseijushimakuno shorihoho
JPS59182531A (ja) * 1983-04-01 1984-10-17 Hitachi Micro Comput Eng Ltd 半導体装置における絶縁膜加工法

Also Published As

Publication number Publication date
JPS6281029A (ja) 1987-04-14

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