JPH0523490B2 - - Google Patents

Info

Publication number
JPH0523490B2
JPH0523490B2 JP61090918A JP9091886A JPH0523490B2 JP H0523490 B2 JPH0523490 B2 JP H0523490B2 JP 61090918 A JP61090918 A JP 61090918A JP 9091886 A JP9091886 A JP 9091886A JP H0523490 B2 JPH0523490 B2 JP H0523490B2
Authority
JP
Japan
Prior art keywords
pattern
wafer
patterns
mask
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61090918A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62247525A (ja
Inventor
Hiromi Honda
Yoshio Kono
Kyoteru Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP61090918A priority Critical patent/JPS62247525A/ja
Publication of JPS62247525A publication Critical patent/JPS62247525A/ja
Publication of JPH0523490B2 publication Critical patent/JPH0523490B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61090918A 1986-04-18 1986-04-18 アライメント方法 Granted JPS62247525A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61090918A JPS62247525A (ja) 1986-04-18 1986-04-18 アライメント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61090918A JPS62247525A (ja) 1986-04-18 1986-04-18 アライメント方法

Publications (2)

Publication Number Publication Date
JPS62247525A JPS62247525A (ja) 1987-10-28
JPH0523490B2 true JPH0523490B2 (enEXAMPLES) 1993-04-02

Family

ID=14011803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61090918A Granted JPS62247525A (ja) 1986-04-18 1986-04-18 アライメント方法

Country Status (1)

Country Link
JP (1) JPS62247525A (enEXAMPLES)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6094256A (en) 1998-09-29 2000-07-25 Nikon Precision Inc. Method for forming a critical dimension test structure and its use
US6956659B2 (en) 2001-05-22 2005-10-18 Nikon Precision Inc. Measurement of critical dimensions of etched features
US6974653B2 (en) 2002-04-19 2005-12-13 Nikon Precision Inc. Methods for critical dimension and focus mapping using critical dimension test marks

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57169239A (en) * 1981-04-09 1982-10-18 Nec Corp Semiconductor device
JPS60145618A (ja) * 1984-01-10 1985-08-01 Nec Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS62247525A (ja) 1987-10-28

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