JPH052222B2 - - Google Patents

Info

Publication number
JPH052222B2
JPH052222B2 JP61073293A JP7329386A JPH052222B2 JP H052222 B2 JPH052222 B2 JP H052222B2 JP 61073293 A JP61073293 A JP 61073293A JP 7329386 A JP7329386 A JP 7329386A JP H052222 B2 JPH052222 B2 JP H052222B2
Authority
JP
Japan
Prior art keywords
document
pasting
original
input
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61073293A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62229248A (ja
Inventor
Junichi Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP61073293A priority Critical patent/JPS62229248A/ja
Publication of JPS62229248A publication Critical patent/JPS62229248A/ja
Publication of JPH052222B2 publication Critical patent/JPH052222B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Editing Of Facsimile Originals (AREA)
JP61073293A 1986-03-31 1986-03-31 スキヤナ用原稿貼込マスクの作成装置 Granted JPS62229248A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61073293A JPS62229248A (ja) 1986-03-31 1986-03-31 スキヤナ用原稿貼込マスクの作成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61073293A JPS62229248A (ja) 1986-03-31 1986-03-31 スキヤナ用原稿貼込マスクの作成装置

Publications (2)

Publication Number Publication Date
JPS62229248A JPS62229248A (ja) 1987-10-08
JPH052222B2 true JPH052222B2 (enrdf_load_stackoverflow) 1993-01-12

Family

ID=13513963

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61073293A Granted JPS62229248A (ja) 1986-03-31 1986-03-31 スキヤナ用原稿貼込マスクの作成装置

Country Status (1)

Country Link
JP (1) JPS62229248A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03284750A (ja) * 1990-03-30 1991-12-16 Toppan Printing Co Ltd レイアウトスキャナシステムにおける色校正用フィルム版の作成装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5458502A (en) * 1977-10-18 1979-05-11 Toppan Printing Co Ltd Method of mounting document at color scanner
JPS5835536A (ja) * 1981-08-28 1983-03-02 Toppan Printing Co Ltd 印刷用カットマスクの作製方法
JPS60112039A (ja) * 1983-11-22 1985-06-18 Dainippon Printing Co Ltd スキヤナ−用原稿角度設定装置

Also Published As

Publication number Publication date
JPS62229248A (ja) 1987-10-08

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