JPH0521986B2 - - Google Patents

Info

Publication number
JPH0521986B2
JPH0521986B2 JP60052243A JP5224385A JPH0521986B2 JP H0521986 B2 JPH0521986 B2 JP H0521986B2 JP 60052243 A JP60052243 A JP 60052243A JP 5224385 A JP5224385 A JP 5224385A JP H0521986 B2 JPH0521986 B2 JP H0521986B2
Authority
JP
Japan
Prior art keywords
magnetic field
plasma deposition
vacuum chamber
microwave
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60052243A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61213377A (ja
Inventor
Takeshi Watanabe
Mitsuo Nakatani
Susumu Tsujiku
Masaaki Sato
Masaaki Okunaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60052243A priority Critical patent/JPS61213377A/ja
Publication of JPS61213377A publication Critical patent/JPS61213377A/ja
Publication of JPH0521986B2 publication Critical patent/JPH0521986B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP60052243A 1985-03-18 1985-03-18 プラズマデポジシヨン法及びその装置 Granted JPS61213377A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60052243A JPS61213377A (ja) 1985-03-18 1985-03-18 プラズマデポジシヨン法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60052243A JPS61213377A (ja) 1985-03-18 1985-03-18 プラズマデポジシヨン法及びその装置

Publications (2)

Publication Number Publication Date
JPS61213377A JPS61213377A (ja) 1986-09-22
JPH0521986B2 true JPH0521986B2 (enExample) 1993-03-26

Family

ID=12909281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60052243A Granted JPS61213377A (ja) 1985-03-18 1985-03-18 プラズマデポジシヨン法及びその装置

Country Status (1)

Country Link
JP (1) JPS61213377A (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0740553B2 (ja) * 1985-10-18 1995-05-01 松下電器産業株式会社 薄膜形成方法及びエッチング方法
JPH0732134B2 (ja) * 1986-12-29 1995-04-10 住友金属工業株式会社 プラズマ装置
DE3774098D1 (de) * 1986-12-29 1991-11-28 Sumitomo Metal Ind Plasmageraet.
US5433788A (en) * 1987-01-19 1995-07-18 Hitachi, Ltd. Apparatus for plasma treatment using electron cyclotron resonance
KR880013424A (ko) * 1987-04-08 1988-11-30 미타 가츠시게 플라즈머 장치
US4926791A (en) 1987-04-27 1990-05-22 Semiconductor Energy Laboratory Co., Ltd. Microwave plasma apparatus employing helmholtz coils and ioffe bars
US5203959A (en) * 1987-04-27 1993-04-20 Semiconductor Energy Laboratory Co., Ltd. Microwave plasma etching and deposition method employing first and second magnetic fields
JPH0668152B2 (ja) * 1988-01-27 1994-08-31 株式会社半導体エネルギー研究所 薄膜形成装置
JPH0215174A (ja) * 1988-07-01 1990-01-18 Canon Inc マイクロ波プラズマｃｖｄ装置
US5565247A (en) * 1991-08-30 1996-10-15 Canon Kabushiki Kaisha Process for forming a functional deposited film
JP2715277B2 (ja) * 1995-08-28 1998-02-18 株式会社半導体エネルギー研究所 薄膜形成装置

Also Published As

Publication number Publication date
JPS61213377A (ja) 1986-09-22

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