JPH0519328Y2 - - Google Patents
Info
- Publication number
- JPH0519328Y2 JPH0519328Y2 JP1986086822U JP8682286U JPH0519328Y2 JP H0519328 Y2 JPH0519328 Y2 JP H0519328Y2 JP 1986086822 U JP1986086822 U JP 1986086822U JP 8682286 U JP8682286 U JP 8682286U JP H0519328 Y2 JPH0519328 Y2 JP H0519328Y2
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- deposited
- evaporated
- vacuum chamber
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986086822U JPH0519328Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-06-06 | 1986-06-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986086822U JPH0519328Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-06-06 | 1986-06-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62198268U JPS62198268U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-12-17 |
JPH0519328Y2 true JPH0519328Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-05-21 |
Family
ID=30943480
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1986086822U Expired - Lifetime JPH0519328Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-06-06 | 1986-06-06 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0519328Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58100675A (ja) * | 1981-12-11 | 1983-06-15 | Mitsubishi Heavy Ind Ltd | 連続蒸着方法及びその装置 |
JPS6134173A (ja) * | 1984-07-24 | 1986-02-18 | Agency Of Ind Science & Technol | 高硬度窒化ホウ素膜の製造方法 |
-
1986
- 1986-06-06 JP JP1986086822U patent/JPH0519328Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS62198268U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-12-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100279344B1 (ko) | 기재의 미세공을 충전하기 위한 박막형성장치 | |
WO2000008226A3 (en) | Vapor deposition system | |
US6352627B2 (en) | Method and device for PVD coating | |
JPS6483656A (en) | Method and vacuum painting machine for applying film to base layer | |
US6337005B2 (en) | Depositing device employing a depositing zone and reaction zone | |
US3649502A (en) | Apparatus for supported discharge sputter-coating of a substrate | |
JPH0533304B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JPH0519328Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JPH04191364A (ja) | イオンプレーティング方法および装置 | |
JP2572279B2 (ja) | 長尺物用イオンプレーティング装置 | |
JPH04198474A (ja) | イオンプレーティング方法および装置 | |
JPS6324068A (ja) | 連続真空蒸着メツキ装置 | |
JPS5842771A (ja) | イオンプレ−テイング装置 | |
JPH0784650B2 (ja) | 真空蒸着方法及び真空蒸着装置 | |
Morimoto et al. | Ion Plating Apparatus | |
JPS60255972A (ja) | 薄膜蒸着装置 | |
JPS6227564A (ja) | イオンプレ−テイング装置 | |
JP3291088B2 (ja) | 被膜形成方法 | |
JPH03191054A (ja) | 薄膜作成方法 | |
JPH0635653B2 (ja) | イオン蒸着薄膜形成装置 | |
KR930018051A (ko) | 이온 도금법 및 그 방법을 위한 장치 | |
JPH02104661A (ja) | 薄膜形成装置 | |
KR100326343B1 (en) | Apparatus and method for ion-cleaning physical vapor deposition coating by using large current electron beam shutter | |
JPS6227565A (ja) | イオンプレ−テイング装置 | |
JPH04202656A (ja) | 薄膜形成装置 |