JPH0515709B2 - - Google Patents

Info

Publication number
JPH0515709B2
JPH0515709B2 JP32318087A JP32318087A JPH0515709B2 JP H0515709 B2 JPH0515709 B2 JP H0515709B2 JP 32318087 A JP32318087 A JP 32318087A JP 32318087 A JP32318087 A JP 32318087A JP H0515709 B2 JPH0515709 B2 JP H0515709B2
Authority
JP
Japan
Prior art keywords
water
meth
monomer
acrylate
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP32318087A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01163174A (ja
Inventor
Kazumi Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Soken Kagaku KK
Original Assignee
Soken Kagaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soken Kagaku KK filed Critical Soken Kagaku KK
Priority to JP32318087A priority Critical patent/JPH01163174A/ja
Publication of JPH01163174A publication Critical patent/JPH01163174A/ja
Publication of JPH0515709B2 publication Critical patent/JPH0515709B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Furan Compounds (AREA)
  • Polymerisation Methods In General (AREA)
JP32318087A 1987-12-18 1987-12-18 テトラヒドロフルフリオキシメチルアクリルアミド Granted JPH01163174A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32318087A JPH01163174A (ja) 1987-12-18 1987-12-18 テトラヒドロフルフリオキシメチルアクリルアミド

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32318087A JPH01163174A (ja) 1987-12-18 1987-12-18 テトラヒドロフルフリオキシメチルアクリルアミド

Publications (2)

Publication Number Publication Date
JPH01163174A JPH01163174A (ja) 1989-06-27
JPH0515709B2 true JPH0515709B2 (da) 1993-03-02

Family

ID=18151963

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32318087A Granted JPH01163174A (ja) 1987-12-18 1987-12-18 テトラヒドロフルフリオキシメチルアクリルアミド

Country Status (1)

Country Link
JP (1) JPH01163174A (da)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0273810A (ja) * 1988-09-08 1990-03-13 Tokyo Ohka Kogyo Co Ltd 光重合性樹脂組成物
JP4882143B2 (ja) * 2000-08-23 2012-02-22 凸版印刷株式会社 磁気可視記録媒体の製造方法
JP4779512B2 (ja) * 2004-08-31 2011-09-28 Dic株式会社 隠蔽カードおよびその製造方法
JP4779511B2 (ja) * 2004-08-31 2011-09-28 Dic株式会社 隠蔽カードおよびその製造方法

Also Published As

Publication number Publication date
JPH01163174A (ja) 1989-06-27

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Legal Events

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R250 Receipt of annual fees

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LAPS Cancellation because of no payment of annual fees