JPH0515304B2 - - Google Patents

Info

Publication number
JPH0515304B2
JPH0515304B2 JP1064939A JP6493989A JPH0515304B2 JP H0515304 B2 JPH0515304 B2 JP H0515304B2 JP 1064939 A JP1064939 A JP 1064939A JP 6493989 A JP6493989 A JP 6493989A JP H0515304 B2 JPH0515304 B2 JP H0515304B2
Authority
JP
Japan
Prior art keywords
gate electrode
shot
electrode
forming
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1064939A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0249437A (ja
Inventor
Naoki Yokoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6493989A priority Critical patent/JPH0249437A/ja
Publication of JPH0249437A publication Critical patent/JPH0249437A/ja
Publication of JPH0515304B2 publication Critical patent/JPH0515304B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Junction Field-Effect Transistors (AREA)
JP6493989A 1989-03-18 1989-03-18 半導体装置の製造方法 Granted JPH0249437A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6493989A JPH0249437A (ja) 1989-03-18 1989-03-18 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6493989A JPH0249437A (ja) 1989-03-18 1989-03-18 半導体装置の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP55189544A Division JPS57113289A (en) 1980-12-30 1980-12-30 Semiconductor device and its manufacture

Publications (2)

Publication Number Publication Date
JPH0249437A JPH0249437A (ja) 1990-02-19
JPH0515304B2 true JPH0515304B2 (cs) 1993-03-01

Family

ID=13272503

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6493989A Granted JPH0249437A (ja) 1989-03-18 1989-03-18 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPH0249437A (cs)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018037530A1 (ja) * 2016-08-25 2018-03-01 三菱電機株式会社 半導体装置およびその製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS588590B2 (ja) * 1975-07-18 1983-02-16 三洋電機株式会社 ショットキ障壁ゲ−ト型電界効果トランジスタの製造方法
JPS5390878A (en) * 1977-01-21 1978-08-10 Nec Corp Manufacture of schottky barrier gate field effect transistor
JPS53119866U (cs) * 1977-02-28 1978-09-22
JPS57113289A (en) * 1980-12-30 1982-07-14 Fujitsu Ltd Semiconductor device and its manufacture
JP2769162B2 (ja) * 1988-07-08 1998-06-25 富士通株式会社 Ｃａｄシステムにおける操作復元処理方式

Also Published As

Publication number Publication date
JPH0249437A (ja) 1990-02-19

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