JPH0515252B2 - - Google Patents

Info

Publication number
JPH0515252B2
JPH0515252B2 JP61229330A JP22933086A JPH0515252B2 JP H0515252 B2 JPH0515252 B2 JP H0515252B2 JP 61229330 A JP61229330 A JP 61229330A JP 22933086 A JP22933086 A JP 22933086A JP H0515252 B2 JPH0515252 B2 JP H0515252B2
Authority
JP
Japan
Prior art keywords
chromium
see
thin film
photomask
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61229330A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6381426A (ja
Inventor
Masao Ushida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP61229330A priority Critical patent/JPS6381426A/ja
Publication of JPS6381426A publication Critical patent/JPS6381426A/ja
Publication of JPH0515252B2 publication Critical patent/JPH0515252B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP61229330A 1986-09-26 1986-09-26 フオトマスクブランクとフオトマスク Granted JPS6381426A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61229330A JPS6381426A (ja) 1986-09-26 1986-09-26 フオトマスクブランクとフオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61229330A JPS6381426A (ja) 1986-09-26 1986-09-26 フオトマスクブランクとフオトマスク

Publications (2)

Publication Number Publication Date
JPS6381426A JPS6381426A (ja) 1988-04-12
JPH0515252B2 true JPH0515252B2 (enrdf_load_stackoverflow) 1993-03-01

Family

ID=16890458

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61229330A Granted JPS6381426A (ja) 1986-09-26 1986-09-26 フオトマスクブランクとフオトマスク

Country Status (1)

Country Link
JP (1) JPS6381426A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100311704B1 (ko) * 1993-08-17 2001-12-15 기타오카 다카시 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및그블랭크스의제조방법
KR0147493B1 (ko) * 1995-10-25 1998-08-01 김주용 하프톤 위상반전마스크 제조방법
KR20020091632A (ko) * 2001-05-31 2002-12-06 엘지.필립스 엘시디 주식회사 슬릿형 포토 마스크

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54120002A (en) * 1978-03-09 1979-09-18 Tokyo Shibaura Electric Co Photoetching mask
JPS55121441A (en) * 1979-03-14 1980-09-18 Fujitsu Ltd Mask for far ultraviolet exposure

Also Published As

Publication number Publication date
JPS6381426A (ja) 1988-04-12

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term