JPH0514507Y2 - - Google Patents

Info

Publication number
JPH0514507Y2
JPH0514507Y2 JP1986095749U JP9574986U JPH0514507Y2 JP H0514507 Y2 JPH0514507 Y2 JP H0514507Y2 JP 1986095749 U JP1986095749 U JP 1986095749U JP 9574986 U JP9574986 U JP 9574986U JP H0514507 Y2 JPH0514507 Y2 JP H0514507Y2
Authority
JP
Japan
Prior art keywords
chamber
plasma
electrode
reaction
lower electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1986095749U
Other languages
English (en)
Japanese (ja)
Other versions
JPS633139U (OSRAM
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986095749U priority Critical patent/JPH0514507Y2/ja
Publication of JPS633139U publication Critical patent/JPS633139U/ja
Application granted granted Critical
Publication of JPH0514507Y2 publication Critical patent/JPH0514507Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP1986095749U 1986-06-23 1986-06-23 Expired - Lifetime JPH0514507Y2 (OSRAM)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986095749U JPH0514507Y2 (OSRAM) 1986-06-23 1986-06-23

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986095749U JPH0514507Y2 (OSRAM) 1986-06-23 1986-06-23

Publications (2)

Publication Number Publication Date
JPS633139U JPS633139U (OSRAM) 1988-01-11
JPH0514507Y2 true JPH0514507Y2 (OSRAM) 1993-04-19

Family

ID=30960683

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986095749U Expired - Lifetime JPH0514507Y2 (OSRAM) 1986-06-23 1986-06-23

Country Status (1)

Country Link
JP (1) JPH0514507Y2 (OSRAM)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52123173A (en) * 1976-04-08 1977-10-17 Fuji Photo Film Co Ltd Sputter etching method
JPS5582438A (en) * 1978-12-15 1980-06-21 Nec Corp Plasma etching device

Also Published As

Publication number Publication date
JPS633139U (OSRAM) 1988-01-11

Similar Documents

Publication Publication Date Title
JPH08335567A (ja) プラズマ処理装置
JP3535309B2 (ja) 減圧処理装置
KR20010030090A (ko) 플라즈마 처리 장치
JP2000124205A (ja) プラズマエッチング装置
JPH0571668B2 (OSRAM)
JPH0514507Y2 (OSRAM)
JPH05114582A (ja) 真空処理装置
JPH07153743A (ja) プラズマ処理装置
JP2000082698A (ja) プラズマ処理装置
JPH0735386Y2 (ja) プラズマ反応処理装置
JP3002496B2 (ja) 半導体ウェハのドライエッチング方法
JPH05299382A (ja) プラズマ処理装置およびその方法
JPH05243190A (ja) プラズマ装置
JPH0613345A (ja) プラズマ反応処理装置
JP2718926B2 (ja) プラズマドーピング方法
JPH0417330A (ja) 同軸型プラズマ処理装置
US6551520B1 (en) Exhausting method and means in a dry etching apparatus
JP3255966B2 (ja) プラズマ処理装置
KR20000019096A (ko) 반도체 플라즈마설비의 웨이퍼 가드링
JPS63260033A (ja) プラズマ反応処理装置
JP2001284256A (ja) プラズマ処理装置
JP3512210B2 (ja) プラズマ処理装置
JP2006135029A (ja) ドライエッチング装置
JPH06275566A (ja) マイクロ波プラズマ処理装置
JPS6032972B2 (ja) エツチング装置