JPH05136151A - Method of forming electrode of semiconductor device and packaged body - Google Patents

Method of forming electrode of semiconductor device and packaged body

Info

Publication number
JPH05136151A
JPH05136151A JP30012491A JP30012491A JPH05136151A JP H05136151 A JPH05136151 A JP H05136151A JP 30012491 A JP30012491 A JP 30012491A JP 30012491 A JP30012491 A JP 30012491A JP H05136151 A JPH05136151 A JP H05136151A
Authority
JP
Japan
Prior art keywords
semiconductor device
solder
electrode
bump
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30012491A
Other languages
Japanese (ja)
Inventor
Yoshihiro Bessho
芳宏 別所
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP30012491A priority Critical patent/JPH05136151A/en
Publication of JPH05136151A publication Critical patent/JPH05136151A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods

Abstract

PURPOSE:To obtain a method of forming electrodes of a semiconductor device and a packaged body wherein a semiconductor device can be simply and highly reliablly connected with a circuit board. CONSTITUTION:Protruding type bump electrodes 3 are arranged on aluminum electrode pads 2 of an IC substrate 1 in a semiconductor device, and solder 7 is effectively transferred onto the bump electrodes 3 from a base member 5 free from solder wettability, thereby forming electrodes composed of the bump electrodes 3 and the transferred solder 7. A packaged body is so constituted that a semiconductor device is electrically connected with terminal electrodes on a circuit board, in a face down manner via the solder 7. Hence the contamination of a semiconductor device can be evaded by forming the solder 7 on the bump electrode 3 by transferring. Control of the speed of a bonding layer is enabled by the protruding type bump electrodes 3, and fine pitch bonding can be realized.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体装置を回路基板
に実装する際の電極形成方法とその実装体に関するもの
であり、特にフェースダウンで実装してなる半導体装置
の電極形成方法と実装体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode forming method for mounting a semiconductor device on a circuit board and its mounting body, and more particularly to an electrode forming method and mounting body for a semiconductor device mounted face down. Regarding

【0002】[0002]

【従来の技術】従来、半導体装置の回路基板上への実装
には半田付けがよく利用されていたが、近年、半導体装
置のパッケージの小型化と接続端子数の増加により、接
続端子間隔が狭くなり、従来の半田付け技術で対処する
ことが次第に困難になってきた。
2. Description of the Related Art Conventionally, soldering has been often used for mounting a semiconductor device on a circuit board. In recent years, however, due to the miniaturization of the package of the semiconductor device and the increase in the number of connection terminals, the connection terminal spacing has become narrow. It has become increasingly difficult to deal with the conventional soldering technology.

【0003】そこで、最近では裸の半導体装置を回路基
板上に直付けして実装面積の小型化と効率的使用を図ろ
うとする方法が考案されてきた。
Therefore, recently, there has been devised a method of directly mounting a bare semiconductor device on a circuit board to reduce the mounting area and efficiently use it.

【0004】なかでも、半導体装置を回路基板に接続す
るに際し、あらかじめ半導体装置のアルミ電極パッド上
に密着金属や拡散防止金属の蒸着膜とこの上にメッキに
より形成した半田層とからなる電極構造を有する半導体
装置を下向き(フェースダウン)にして、高温に加熱し
て半田を回路基板の端子電極に融着する実装構造が、接
続後の機械的強度が強く、接続が一括にできることなど
から有効な方法であるとされている。(例えば、工業調
査会、1980年1月15日発行、日本マイクロエレク
トロニクス協会編、『IC化実装技術』) 以下図面を参照しながら、上述した従来の半導体装置の
電極形成方法と実装方法の一例について説明する。
In particular, when connecting a semiconductor device to a circuit board, an electrode structure is formed in advance on an aluminum electrode pad of the semiconductor device by a vapor deposition film of a contact metal or a diffusion preventing metal and a solder layer formed by plating on the vapor deposition film. The mounting structure in which the semiconductor device is turned down (face down) and heated to a high temperature to fuse the solder to the terminal electrodes of the circuit board is effective because the mechanical strength after connection is strong and the connection can be made all at once. It is said to be a method. (For example, "Industrial Research Council, published January 15, 1980, edited by Japan Microelectronics Association," IC mounting technology "). An example of the conventional electrode forming method and mounting method of the semiconductor device described above with reference to the drawings. Will be described.

【0005】図4は従来の半田バンプ電極を有する半導
体装置の電極形成方法の概略説明図であり、図5は上記
半田バンプ電極の電極構造の概略説明図であり、図6は
上記半導体装置の実装体の概略説明図である。
FIG. 4 is a schematic explanatory view of an electrode forming method of a conventional semiconductor device having a solder bump electrode, FIG. 5 is a schematic explanatory view of an electrode structure of the solder bump electrode, and FIG. 6 is a schematic diagram of the semiconductor device. It is a schematic explanatory drawing of a mounted body.

【0006】図4において、10は半導体装置のIC基
板であり、11はアルミ電極パッドである。12は密着
金属膜であり、13は拡散防止金属膜である。14はパ
ッシベーション膜であり、15はフォトレジスト膜であ
る。16はメッキ後の半田バンプであり、17はリフロ
ー後の半田バンプである。図6において、18は回路基
板であり、19は端子電極である。
In FIG. 4, 10 is an IC substrate of a semiconductor device, and 11 is an aluminum electrode pad. Reference numeral 12 is an adhesion metal film, and 13 is a diffusion prevention metal film. Reference numeral 14 is a passivation film, and 15 is a photoresist film. Reference numeral 16 is a solder bump after plating, and 17 is a solder bump after reflow. In FIG. 6, 18 is a circuit board and 19 is a terminal electrode.

【0007】以上のように構成された従来の半田バンプ
電極を有する半導体装置の電極形成方法と実装体につい
て、以下その概略を説明する。
The electrode forming method and the mounting body of the semiconductor device having the conventional solder bump electrodes configured as described above will be outlined below.

【0008】まず、図4の(a)に示すように半導体装
置のIC基板10のアルミ電極パッド11上にCuなど
の密着金属膜12、および、Crなどの拡散防止金属膜
13を蒸着により形成する。その後、図4の(b)に示
すように電極部以外をフォトレジスト15で覆い、メッ
キ法により半田を拡散防止金属膜13上に析出させて図
4の(c)に示すキノコ状の半田バンプ16を得る。最
後に、半田リフローを行うことにより、図4の(d)に
示すように半田バンプ17を形成して図5に示す電極構
造の半田バンプ電極を得る。
First, as shown in FIG. 4A, an adhesion metal film 12 such as Cu and a diffusion prevention metal film 13 such as Cr are formed on an aluminum electrode pad 11 of an IC substrate 10 of a semiconductor device by vapor deposition. To do. Thereafter, as shown in FIG. 4B, the portions other than the electrode portions are covered with the photoresist 15, and the solder is deposited on the diffusion preventing metal film 13 by the plating method to form the mushroom-shaped solder bumps shown in FIG. 4C. Get 16. Finally, by performing solder reflow, solder bumps 17 are formed as shown in FIG. 4D, and solder bump electrodes having the electrode structure shown in FIG. 5 are obtained.

【0009】さらに、以上のようにして得た半田バンプ
電極を有する半導体装置を、回路基板18の所定の位置
に位置合わせを行ってフェースダウンで積載した後、2
00〜300℃の高温に加熱して半田バンプ17を溶融
し、端子電極19に融着することで図6の実装構造で半
導体装置の実装体を得るものである。
Further, the semiconductor device having the solder bump electrodes obtained as described above is aligned at a predetermined position on the circuit board 18 and is loaded face down, and then 2
The solder bumps 17 are melted by heating to a high temperature of 00 to 300 ° C., and the solder bumps 17 are fused to the terminal electrodes 19 to obtain a mounted body of the semiconductor device with the mounting structure of FIG.

【0010】[0010]

【発明が解決しようとする課題】しかしながら上記のよ
うな半導体装置の電極形成方法や実装体においては、
1.メッキ法により半田バンプを形成するために、メッ
キ液からの半導体装置の汚染を洗浄する必要があり、か
つ、電極形成方法が複雑となり汎用性に欠ける。2.高
温に加熱して半田を溶融して端子電極と接続する際に、
IC基板と回路基板とのギャップを維持することが出来
ないため、半田が広がって隣接とショートする危険があ
る。などといった課題を有していた。
However, in the electrode forming method of the semiconductor device and the mounting body as described above,
1. In order to form the solder bumps by the plating method, it is necessary to clean the contamination of the semiconductor device from the plating solution, and the electrode forming method becomes complicated and lacks versatility. 2. When heating to high temperature to melt the solder and connect it to the terminal electrode,
Since the gap between the IC substrate and the circuit substrate cannot be maintained, there is a risk that the solder spreads and short-circuits with the adjacent one. Had problems such as.

【0011】本発明は上記の課題に鑑みてなされたもの
であり、その目的とするところは、半導体装置と回路基
板とを容易に信頼性良く、かつ、微細ピッチで接続する
ことを可能とする半導体装置の電極形成方法と実装体を
提供することにある。
The present invention has been made in view of the above problems, and an object of the present invention is to easily and reliably connect a semiconductor device and a circuit board at a fine pitch. An object is to provide a method for forming electrodes of a semiconductor device and a mounting body.

【0012】[0012]

【課題を解決するための手段】本発明は上記の課題を解
決するため、フェースダウンで回路基板に実装する半導
体装置において、半導体装置のアルミ電極パッド部上に
突起状のバンプ電極を備え、別に用意した半田濡れ性の
ない基材上に電極パターンに合わせて形成した半田ペー
ストに上記バンプ電極を接触させた後、半田ペーストの
溶融温度以上に加熱してバンプ電極上に半田を転写して
半導体装置の電極を形成した後、回路基板の端子電極に
位置合わせして積載して加熱することによりバンプ電極
を端子電極と接合して半導体装置の実装体を得ることを
特徴として、信頼性の高い半導体装置の回路基板への実
装を実現しようとするものである。
In order to solve the above problems, the present invention provides a semiconductor device mounted face down on a circuit board, wherein bump electrodes are provided on the aluminum electrode pad of the semiconductor device, and the bump electrodes are provided separately. After the bump electrode is contacted with the solder paste formed according to the electrode pattern on the prepared base material with no solder wettability, the solder paste is heated above the melting temperature of the solder paste to transfer the solder onto the bump electrode to form a semiconductor. After forming the electrodes of the device, the bump electrodes are bonded to the terminal electrodes by aligning them with the terminal electrodes of the circuit board and heating them to obtain a semiconductor device package, which is highly reliable. It is intended to realize mounting of a semiconductor device on a circuit board.

【0013】[0013]

【作用】本発明は、半導体装置のアルミ電極パッド部上
に形成した突起形状のバンプ電極上に半田濡れ性のない
基材から半田を転写することにより、半導体装置を汚染
することなく電極形成でき、半導体装置を回路基板の端
子電極に接合する際に半田が隣接とショートすることな
く微細ピッチでの接合が可能となり、かつ、信頼性の高
い半導体装置の実装体が実現できる。
According to the present invention, electrodes can be formed without contaminating the semiconductor device by transferring the solder from the base material having no solder wettability onto the bump-shaped bump electrodes formed on the aluminum electrode pad portion of the semiconductor device. When the semiconductor device is joined to the terminal electrode of the circuit board, the solder can be joined at a fine pitch without short-circuiting with the adjacent one, and a highly reliable semiconductor device mounting body can be realized.

【0014】[0014]

【実施例】以下、本発明の一実施例の半導体装置の電極
形成方法と実装体について、図面を参照しながら説明す
る。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An electrode forming method for a semiconductor device and a mounting body according to an embodiment of the present invention will be described below with reference to the drawings.

【0015】図1は、本発明の一実施例における半導体
装置の電極形成方法の概略説明図であり、図2は、上記
実施例の電極形成方法による半導体装置の電極構造の概
略説明図であり、図3は、本発明の一実施例における半
導体装置の実装体の概略説明図である。
FIG. 1 is a schematic explanatory view of an electrode forming method of a semiconductor device according to an embodiment of the present invention, and FIG. 2 is a schematic explanatory view of an electrode structure of a semiconductor device by the electrode forming method of the above embodiment. 3A and 3B are schematic explanatory views of a semiconductor device package according to an embodiment of the present invention.

【0016】図1において、1は半導体装置のIC基板
であり、2はアルミ電極パッドである。3は突起状のバ
ンプ電極であり、4はパッシベーション膜である。5は
半田濡れ性のない基材であり、6は半田ペーストであ
る。7はバンプ電極上に転写された半田である。図3に
おいて、8は回路基板であり、9は端子電極である。
In FIG. 1, 1 is an IC substrate of a semiconductor device, and 2 is an aluminum electrode pad. Reference numeral 3 is a bump-shaped bump electrode, and 4 is a passivation film. Reference numeral 5 is a base material having no solder wettability, and 6 is a solder paste. 7 is a solder transferred onto the bump electrode. In FIG. 3, 8 is a circuit board and 9 is a terminal electrode.

【0017】以上のように構成された半導体装置の電極
形成方法と実装体について、以下図面を用いて説明す
る。
The electrode forming method and the mounting body of the semiconductor device configured as described above will be described below with reference to the drawings.

【0018】まず、図1の(a)に示すように公知の方
法により半導体装置のIC基板1のアルミ電極パッド2
上に突起状のバンプ電極3を形成する。
First, as shown in FIG. 1A, the aluminum electrode pad 2 of the IC substrate 1 of the semiconductor device is manufactured by a known method.
A bump-shaped bump electrode 3 is formed on the top.

【0019】また、図1の(b)に示すようにアルミナ
やガラスなどのように半田濡れ性のない基材5上に半田
ペースト6を半導体装置の電極パターンに合わせてスク
リーン印刷法により形成する。
Further, as shown in FIG. 1B, a solder paste 6 is formed on a base material 5 having no solder wettability, such as alumina or glass, by a screen printing method in accordance with an electrode pattern of a semiconductor device. ..

【0020】次に、図1の(c)に示すようにバンプ電
極3と半田ペースト6を位置合わせを行った後、接触さ
せた状態で半田ペーストの溶融温度以上に加熱して、バ
ンプ電極3上に半田7を転写する。この際、半田濡れ性
のない基材5側には溶融した半田は濡れないため、図1
の(d)に示すようにバンプ3側に半田7が効率良く転
写ができる。
Next, as shown in FIG. 1C, after the bump electrode 3 and the solder paste 6 are aligned with each other, the bump electrode 3 is heated to a temperature higher than the melting temperature of the solder paste in a contact state. The solder 7 is transferred onto the top. At this time, the molten solder does not get wet on the side of the base material 5 having no solder wettability.
As shown in (d), the solder 7 can be efficiently transferred to the bump 3 side.

【0021】上記の方法により、図2に示すような半導
体装置のアルミ電極パッド2上に突起状のバンプ電極3
と転写された半田7からなるフェースダウンで半導体装
置を実装するのに適した電極が容易に形成できる。
By the method described above, the bump electrode 3 having a projection shape is formed on the aluminum electrode pad 2 of the semiconductor device as shown in FIG.
Electrodes suitable for mounting a semiconductor device can be easily formed with the face-down of the solder 7 transferred with the above.

【0022】また、本実施例の半導体装置の実装体は、
本発明の半導体装置の電極形成方法により半導体装置の
アルミ電極パッド2に突起上のバンプ電極3と転写され
た半田7からなる電極を形成した後、図3に示すように
回路基板8の所定の位置に位置合わせを行ってフェース
ダウンで積載した後、半田の溶融温度以上に加熱してバ
ンプ電極3上の半田7を再溶融して端子電極9に接合す
ることによって半導体装置の実装体を得る。
The semiconductor device package of this embodiment is
After forming the bump electrodes 3 on the protrusions and the electrodes made of the transferred solder 7 on the aluminum electrode pads 2 of the semiconductor device by the electrode forming method of the semiconductor device of the present invention, as shown in FIG. After aligning the positions and stacking face down, the solder 7 on the bump electrodes 3 is remelted by being heated above the melting temperature of the solder and bonded to the terminal electrodes 9 to obtain a semiconductor device package. ..

【0023】上記の方法により、バンプ電極3上の半田
7を溶融させて端子電極9と接合する際に、半導体装置
のIC基板1と回路基板8とのギャップを突起状のバン
プ電極3により維持することができるため、再溶融した
半田の広がりを規制することが可能となって隣接とショ
ートする危険がなく、微細ピッチでの接続が可能な半導
体装置の実装体が得られる。
According to the above method, when the solder 7 on the bump electrode 3 is melted and joined to the terminal electrode 9, the gap between the IC substrate 1 and the circuit substrate 8 of the semiconductor device is maintained by the bump electrode 3 having a projecting shape. As a result, the spread of the remelted solder can be regulated, there is no risk of short-circuiting with the adjacent solder, and a semiconductor device package that can be connected at a fine pitch can be obtained.

【0024】本発明の半導体装置の実装体は、上記した
方法により、従来の半田バンプ電極による実装体では不
可能であった半田の広がりの規制が突起状のバンプ電極
により可能となり、極めて安定で信頼性良く、かつ、高
密度に半導体装置を実装できる。
The semiconductor device mounting body of the present invention is extremely stable by the above-described method, because the bump electrodes can control the spread of the solder, which was impossible with the conventional mounting body using the solder bump electrodes. Semiconductor devices can be mounted with high reliability and high density.

【0025】なお、本実施例においてバンプ電極の形状
を2段突起形状とすれば半田の広がりを規制する効果が
より顕著に発揮できる。
In this embodiment, if the bump electrode is formed in the shape of a two-step protrusion, the effect of restricting the spread of the solder can be more remarkably exhibited.

【0026】また、本実施例においては突起状のバンプ
電極をメッキ法を用いて形成するとしたが、その形状が
突起状であればワイヤボンディングなど他の方法で形成
しても良い。
In the present embodiment, the bump electrodes having a protruding shape are formed by using a plating method, but if the shape is a protruding shape, they may be formed by another method such as wire bonding.

【0027】さらに、半田ペーストを半田濡れ性のない
基材上に形成するとしたが、あらゆる基材の表面に半田
濡れ性のない材質でコートしたものの上に形成しても良
く、例えば半田レジストを用いればバンプ電極上への半
田の完全転写がより効果的に可能となる。
Further, although the solder paste is formed on the base material having no solder wettability, it may be formed on the surface of any base material coated with a material having no solder wettability. If used, the complete transfer of the solder onto the bump electrode can be more effectively performed.

【0028】また、低融点合金箔を半田からなるとした
が、その材質は半田に限られる物でなく、低融点合金か
らなるものであれば他の金属から形成しても良い。
Further, although the low melting point alloy foil is made of solder, the material is not limited to solder, and may be made of other metal as long as it is made of a low melting point alloy.

【0029】[0029]

【発明の効果】以上に説明したように、本発明の半導体
装置の電極形成方法と実装体によれば、半導体装置のア
ルミ電極パッド部上に形成した突起状のバンプ電極上に
半田濡れ性のない基材から半田を効率よく転写して電極
を形成することにより、メッキ液などによる半導体装置
への汚染なく半導体装置にバンプ電極と半田からなる電
極を形成することができるため、極めて汎用性が高い。
As described above, according to the electrode forming method and the mounting body of the semiconductor device of the present invention, the solder wettability is provided on the bump-shaped bump electrode formed on the aluminum electrode pad portion of the semiconductor device. By efficiently transferring solder from a non-base material to form electrodes, bump electrodes and solder electrodes can be formed on the semiconductor device without contamination of the semiconductor device by plating liquid or the like, which makes it extremely versatile. high.

【0030】さらに、半導体装置の突起状のバンプ電極
上に半田を転写した電極構造を有することにより、半導
体装置を回路基板の端子電極に接合する際に半田の広が
りの規制が可能となり、半導体装置を回路基板に実装す
る際に半田が隣接とショートすることなく微細ピッチで
の接合が可能となり、極めて安定で信頼性良く、かつ、
高密度に半導体装置を実装できる。
Further, by having the electrode structure in which the solder is transferred onto the bump-shaped bump electrodes of the semiconductor device, the spread of the solder can be regulated when the semiconductor device is bonded to the terminal electrode of the circuit board, and the semiconductor device can be controlled. When mounting on a circuit board, solder can be joined at a fine pitch without short-circuiting with adjacent parts, which is extremely stable and reliable, and
Semiconductor devices can be mounted at high density.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例における半導体装置の電極形
成方法の概略説明図
FIG. 1 is a schematic explanatory diagram of an electrode forming method for a semiconductor device according to an embodiment of the present invention.

【図2】本発明の半導体装置の電極形成方法による半導
体装置の電極構造の概略説明図
FIG. 2 is a schematic explanatory view of an electrode structure of a semiconductor device according to the electrode forming method of the semiconductor device of the present invention.

【図3】本発明の一実施例における半導体装置の実装体
の概略説明図
FIG. 3 is a schematic explanatory view of a semiconductor device mounting body according to an embodiment of the present invention.

【図4】従来の半田バンプ電極を有する半導体装置の電
極形成方法の概略説明図
FIG. 4 is a schematic explanatory view of an electrode forming method of a conventional semiconductor device having a solder bump electrode.

【図5】従来の半田バンプ電極の電極構造の概略説明図FIG. 5 is a schematic explanatory diagram of an electrode structure of a conventional solder bump electrode.

【図6】従来の半田バンプ電極により実装された半導体
装置の実装構造の概略説明図
FIG. 6 is a schematic explanatory view of a mounting structure of a semiconductor device mounted by a conventional solder bump electrode.

【符号の説明】[Explanation of symbols]

1 半導体装置のIC基板 2 アルミ電極パッド 3 突起状のバンプ電極 4 パッシベーション膜 5 半田濡れ性のない基材 6 半田ペースト 7 転写された半田 8 回路基板 9 端子電極 10 IC基板 11 アルミ電極パッド 12 密着金属膜 13 拡散防止金属膜 14 パッシベーション膜 15 フォトレジスト膜 16 メッキ後の半田バンプ 17 リフロー後の半田バンプ 18 回路基板 19 端子電極 1 IC substrate of semiconductor device 2 Aluminum electrode pad 3 Protruding bump electrode 4 Passivation film 5 Base material without solder wettability 6 Solder paste 7 Transferred solder 8 Circuit board 9 Terminal electrode 10 IC board 11 Aluminum electrode pad 12 Adhesion Metal film 13 Diffusion prevention metal film 14 Passivation film 15 Photoresist film 16 Solder bump after plating 17 Solder bump after reflow 18 Circuit board 19 Terminal electrode

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 フェースダウンで回路基板に実装する半
導体装置の電極形成方法において、半導体装置のアルミ
電極パッド部上に突起状のバンプ電極を備え、別に用意
した半田濡れ性のない基材上に電極パターンに合わせて
形成した半田ペーストに上記バンプ電極を接触させた
後、半田ペーストの溶融温度以上に加熱してバンプ電極
上に半田を転写することを特徴とする半導体装置の電極
形成方法。
1. A method for forming electrodes of a semiconductor device mounted face down on a circuit board, wherein bump electrodes having protrusions are provided on an aluminum electrode pad portion of the semiconductor device, and the bumps are provided on a separately prepared base material having no solder wettability. An electrode forming method for a semiconductor device, comprising: contacting the bump electrode with a solder paste formed in accordance with an electrode pattern, and then heating the solder paste to a temperature higher than a melting temperature of the solder paste to transfer the solder onto the bump electrode.
【請求項2】 突起状のバンプ電極が2段突起形状であ
ることを特徴とする請求項1記載の半導体装置の電極形
成方法。
2. The method for forming an electrode of a semiconductor device according to claim 1, wherein the bump electrode having a projection shape has a two-step projection shape.
【請求項3】 突起状のバンプ電極の材質がAuからな
ることを特徴とする請求項1記載の半導体装置の電極形
成方法。
3. The method for forming an electrode of a semiconductor device according to claim 1, wherein the material of the bump-shaped bump electrode is Au.
【請求項4】 スクリーン印刷により半田ペーストを半
田濡れ性のない基材上に形成することを特徴とする請求
項1記載の半導体装置の電極形成方法。
4. The method for forming an electrode of a semiconductor device according to claim 1, wherein the solder paste is formed on the base material having no solder wettability by screen printing.
【請求項5】 半田濡れ性のない基材の材質がアルミナ
からなることを特徴とする請求項1記載の半導体装置の
電極形成方法。
5. The method for forming an electrode of a semiconductor device according to claim 1, wherein the material of the base material having no solder wettability is alumina.
【請求項6】 半田濡れ性のない基材の材質がガラスか
らなることを特徴とする請求項1記載の半導体装置の電
極形成方法。
6. The method for forming an electrode of a semiconductor device according to claim 1, wherein the material of the base material having no solder wettability is glass.
【請求項7】 フェースダウンで回路基板に実装する半
導体装置の実装体において、半導体装置のアルミ電極パ
ッド上のバンプ電極に半田濡れ性のない基材から半田を
転写した後、回路基板の端子電極に位置合わせして積載
して加熱することによりバンプ電極を端子電極と接合し
て半導体装置の実装を行うことを特徴とする半導体装置
の実装体。
7. In a semiconductor device mounting body to be mounted face down on a circuit board, after solder is transferred from a base material having no solder wettability to bump electrodes on aluminum electrode pads of the semiconductor device, the terminal electrodes of the circuit board are mounted. A semiconductor device mounting body, characterized in that the semiconductor device is mounted by bonding the bump electrodes to the terminal electrodes by aligning and stacking with each other and heating.
【請求項8】 バンプ電極が2段突起形状であることを
特徴とする請求項7記載の半導体装置の実装体。
8. The semiconductor device package according to claim 7, wherein the bump electrode has a two-step projection shape.
【請求項9】 バンプ電極の材質がAuからなることを
特徴とする請求項7記載の半導体装置の実装体。
9. The package of a semiconductor device according to claim 7, wherein the material of the bump electrode is Au.
【請求項10】 半田濡れ性のない基材の材質がアルミ
ナからなることを特徴とする請求項7記載の半導体装置
の実装体。
10. The semiconductor device package according to claim 7, wherein the material of the base material having no solder wettability is alumina.
【請求項11】 半田濡れ性のない基材の材質がガラス
からなることを特徴とする請求項7記載の半導体装置の
実装体。
11. The package of a semiconductor device according to claim 7, wherein the material of the base material having no solder wettability is glass.
JP30012491A 1991-11-15 1991-11-15 Method of forming electrode of semiconductor device and packaged body Pending JPH05136151A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30012491A JPH05136151A (en) 1991-11-15 1991-11-15 Method of forming electrode of semiconductor device and packaged body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30012491A JPH05136151A (en) 1991-11-15 1991-11-15 Method of forming electrode of semiconductor device and packaged body

Publications (1)

Publication Number Publication Date
JPH05136151A true JPH05136151A (en) 1993-06-01

Family

ID=17881017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30012491A Pending JPH05136151A (en) 1991-11-15 1991-11-15 Method of forming electrode of semiconductor device and packaged body

Country Status (1)

Country Link
JP (1) JPH05136151A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05218044A (en) * 1992-02-06 1993-08-27 Matsushita Electron Corp Forming method for bump

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52140269A (en) * 1976-05-19 1977-11-22 Hitachi Ltd Formation of solder electrode
JPH0234949A (en) * 1988-07-25 1990-02-05 Matsushita Electric Ind Co Ltd Method for mounting semiconductor device
JPH03225923A (en) * 1990-01-31 1991-10-04 Toshiba Corp Formation of bump

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52140269A (en) * 1976-05-19 1977-11-22 Hitachi Ltd Formation of solder electrode
JPH0234949A (en) * 1988-07-25 1990-02-05 Matsushita Electric Ind Co Ltd Method for mounting semiconductor device
JPH03225923A (en) * 1990-01-31 1991-10-04 Toshiba Corp Formation of bump

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05218044A (en) * 1992-02-06 1993-08-27 Matsushita Electron Corp Forming method for bump

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