JPH0513004Y2 - - Google Patents
Info
- Publication number
- JPH0513004Y2 JPH0513004Y2 JP1985093874U JP9387485U JPH0513004Y2 JP H0513004 Y2 JPH0513004 Y2 JP H0513004Y2 JP 1985093874 U JP1985093874 U JP 1985093874U JP 9387485 U JP9387485 U JP 9387485U JP H0513004 Y2 JPH0513004 Y2 JP H0513004Y2
- Authority
- JP
- Japan
- Prior art keywords
- electrode plate
- wafer
- spacer
- hole
- plasma cvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 235000012431 wafers Nutrition 0.000 claims description 36
- 125000006850 spacer group Chemical group 0.000 claims description 20
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 19
- 238000000151 deposition Methods 0.000 claims description 2
- 239000012808 vapor phase Substances 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 5
- 239000012495 reaction gas Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000000428 dust Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985093874U JPH0513004Y2 (ko) | 1985-06-20 | 1985-06-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985093874U JPH0513004Y2 (ko) | 1985-06-20 | 1985-06-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS622240U JPS622240U (ko) | 1987-01-08 |
| JPH0513004Y2 true JPH0513004Y2 (ko) | 1993-04-06 |
Family
ID=30651941
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985093874U Expired - Lifetime JPH0513004Y2 (ko) | 1985-06-20 | 1985-06-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0513004Y2 (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014125670A (ja) * | 2012-12-27 | 2014-07-07 | Kobe Steel Ltd | プラズマｃｖｄ法による保護膜の形成方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS561526A (en) * | 1979-06-15 | 1981-01-09 | Matsushita Electric Ind Co Ltd | Substrate holding jig for substrate treatment |
| JPS5898920A (ja) * | 1981-12-08 | 1983-06-13 | Mitsubishi Electric Corp | プラズマ気相成長装置 |
-
1985
- 1985-06-20 JP JP1985093874U patent/JPH0513004Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS561526A (en) * | 1979-06-15 | 1981-01-09 | Matsushita Electric Ind Co Ltd | Substrate holding jig for substrate treatment |
| JPS5898920A (ja) * | 1981-12-08 | 1983-06-13 | Mitsubishi Electric Corp | プラズマ気相成長装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS622240U (ko) | 1987-01-08 |
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