JPS561526A - Substrate holding jig for substrate treatment - Google Patents

Substrate holding jig for substrate treatment

Info

Publication number
JPS561526A
JPS561526A JP7612879A JP7612879A JPS561526A JP S561526 A JPS561526 A JP S561526A JP 7612879 A JP7612879 A JP 7612879A JP 7612879 A JP7612879 A JP 7612879A JP S561526 A JPS561526 A JP S561526A
Authority
JP
Japan
Prior art keywords
substrate holding
holding plate
metal
substrate
carbide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7612879A
Other languages
Japanese (ja)
Other versions
JPS6339093B2 (en
Inventor
Atsuo Nishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP7612879A priority Critical patent/JPS561526A/en
Publication of JPS561526A publication Critical patent/JPS561526A/en
Publication of JPS6339093B2 publication Critical patent/JPS6339093B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To protect a substrate holding plate from wear due to etching and enable the repeated use of the plate, by fitting substrate holding metal hooks in the holes of the substrate holding plate made of a metal oxide or Si carbide. CONSTITUTION:A plurality of through holes 3 are provided in a substrate holding plate 1 made of a metal oxide or Si carbide. Substrate holding hooks made of a metal are attached to the holding plate 1 by the through holes 3. The holding plate is made of such a chemically stable substance of high melting point as the metal oxide (Al2O3, Ta2O5, etc.) or Si carbide (SiC etc.). The hooks 2 are made of the metal such as Pt which can be easily worked and is chemically stable and has a high metling point. In gas-phase deposit treatment, the substrate holding plate is not etched even if a deposit on the jig is etched off by hydrofluoric acid or a mixed solution of nitric acid with hydrofluoric acid. Therefore, the jig does not suffer from wear such as surface roughening.
JP7612879A 1979-06-15 1979-06-15 Substrate holding jig for substrate treatment Granted JPS561526A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7612879A JPS561526A (en) 1979-06-15 1979-06-15 Substrate holding jig for substrate treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7612879A JPS561526A (en) 1979-06-15 1979-06-15 Substrate holding jig for substrate treatment

Publications (2)

Publication Number Publication Date
JPS561526A true JPS561526A (en) 1981-01-09
JPS6339093B2 JPS6339093B2 (en) 1988-08-03

Family

ID=13596287

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7612879A Granted JPS561526A (en) 1979-06-15 1979-06-15 Substrate holding jig for substrate treatment

Country Status (1)

Country Link
JP (1) JPS561526A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5230923A (en) * 1975-09-04 1977-03-09 Osaka Gas Co Ltd Burner with total use-hour indicator
JPS622240U (en) * 1985-06-20 1987-01-08

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0491583U (en) * 1990-12-26 1992-08-10
JPH0491584U (en) * 1990-12-26 1992-08-10
KR102581508B1 (en) * 2021-08-27 2023-09-22 주식회사 디오 manufacturing method of digital overdenture
KR102590346B1 (en) * 2021-08-27 2023-10-18 주식회사 디오 manufacturing method of digital overdenture

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5378765A (en) * 1976-12-23 1978-07-12 Toshiba Corp Semiconductor wafer heating stand for gas phase growth
JPS5464460U (en) * 1977-10-14 1979-05-08
JPS5475661U (en) * 1977-11-09 1979-05-29

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5378765A (en) * 1976-12-23 1978-07-12 Toshiba Corp Semiconductor wafer heating stand for gas phase growth
JPS5464460U (en) * 1977-10-14 1979-05-08
JPS5475661U (en) * 1977-11-09 1979-05-29

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5230923A (en) * 1975-09-04 1977-03-09 Osaka Gas Co Ltd Burner with total use-hour indicator
JPS5642805B2 (en) * 1975-09-04 1981-10-07
JPS622240U (en) * 1985-06-20 1987-01-08
JPH0513004Y2 (en) * 1985-06-20 1993-04-06

Also Published As

Publication number Publication date
JPS6339093B2 (en) 1988-08-03

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