JPH0512033B2 - - Google Patents
Info
- Publication number
- JPH0512033B2 JPH0512033B2 JP59085789A JP8578984A JPH0512033B2 JP H0512033 B2 JPH0512033 B2 JP H0512033B2 JP 59085789 A JP59085789 A JP 59085789A JP 8578984 A JP8578984 A JP 8578984A JP H0512033 B2 JPH0512033 B2 JP H0512033B2
- Authority
- JP
- Japan
- Prior art keywords
- thermal spraying
- low
- pressure
- chamber
- atmosphere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Nozzles (AREA)
- Coating By Spraying Or Casting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP59085789A JPS60227856A (ja) | 1984-04-27 | 1984-04-27 | 低圧溶射装置 | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP59085789A JPS60227856A (ja) | 1984-04-27 | 1984-04-27 | 低圧溶射装置 | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| JPS60227856A JPS60227856A (ja) | 1985-11-13 | 
| JPH0512033B2 true JPH0512033B2 (OSRAM) | 1993-02-17 | 
Family
ID=13868652
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP59085789A Granted JPS60227856A (ja) | 1984-04-27 | 1984-04-27 | 低圧溶射装置 | 
Country Status (1)
| Country | Link | 
|---|---|
| JP (1) | JPS60227856A (OSRAM) | 
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| US5143139A (en) * | 1988-06-06 | 1992-09-01 | Osprey Metals Limited | Spray deposition method and apparatus thereof | 
| JP4649126B2 (ja) * | 2004-06-11 | 2011-03-09 | 学校法人 中央大学 | 密着性に優れた溶射皮膜を形成する溶射方法 | 
| EP2061629B1 (en) * | 2006-09-11 | 2011-05-18 | Enbio Limited | Method of doping surfaces | 
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS58116066U (ja) * | 1982-02-01 | 1983-08-08 | 三菱重工業株式会社 | 溶射装置 | 
- 
        1984
        - 1984-04-27 JP JP59085789A patent/JPS60227856A/ja active Granted
 
Also Published As
| Publication number | Publication date | 
|---|---|
| JPS60227856A (ja) | 1985-11-13 | 
Similar Documents
| Publication | Publication Date | Title | 
|---|---|---|
| US4596718A (en) | Vacuum plasma coating apparatus | |
| JP2589033B2 (ja) | レーザ補助による化学蒸着法 | |
| JPH0969554A (ja) | 静電チャック部材およびその製造方法 | |
| US3012904A (en) | Oxidizable oxide-free metal coated with metal | |
| JPH0512033B2 (OSRAM) | ||
| JPS6021382A (ja) | プラズマcvd装置 | |
| JPWO2020090164A1 (ja) | 真空処理装置 | |
| EP0730266A3 (en) | Apparatus for plasma-processing a disk substrate and method of manufacturing a magnetic disk | |
| JP2002105618A (ja) | 真空処理室用表面構造 | |
| JPS60184676A (ja) | 有被覆基材または有被覆部材の製造法 | |
| JPH05326471A (ja) | 半導体製造装置のクリーニング方法 | |
| TW202342789A (zh) | 純金屬主體的擴散接合 | |
| JPH0524959A (ja) | セラミツク回路基板の製造方法 | |
| JP2007530788A (ja) | 半導体被覆基板の製造方法 | |
| JPH028357A (ja) | 溶射方法 | |
| JP4766821B2 (ja) | 基板にコーティングを施すための真空モジュール(及びその変形)とモジュールシステム | |
| RU2179345C1 (ru) | СПОСОБ ИЗГОТОВЛЕНИЯ ТРИТИЕВОГО ИСТОЧНИКА β-ИЗЛУЧЕНИЯ | |
| JPS5852473A (ja) | 金属材料の表面処理法 | |
| JPH0242308B2 (OSRAM) | ||
| JPH01205085A (ja) | 金属の清浄化方法 | |
| JPH0445252A (ja) | エキソ電子放出を利用したコーティング方法 | |
| SU1475973A1 (ru) | Способ получени покрытий | |
| JP2678298B2 (ja) | 回転体の表面処理装置 | |
| JPS6040598Y2 (ja) | Pvd装置 | |
| JPS6063722A (ja) | 磁気デイスクの製造法 |