JPH0510354Y2 - - Google Patents
Info
- Publication number
- JPH0510354Y2 JPH0510354Y2 JP1985104367U JP10436785U JPH0510354Y2 JP H0510354 Y2 JPH0510354 Y2 JP H0510354Y2 JP 1985104367 U JP1985104367 U JP 1985104367U JP 10436785 U JP10436785 U JP 10436785U JP H0510354 Y2 JPH0510354 Y2 JP H0510354Y2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- heat treatment
- treatment chamber
- convection
- convection prevention
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010438 heat treatment Methods 0.000 claims description 44
- 230000002265 prevention Effects 0.000 claims description 27
- 239000004065 semiconductor Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000011521 glass Substances 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 54
- 239000005357 flat glass Substances 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 7
- 239000010453 quartz Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000000137 annealing Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985104367U JPH0510354Y2 (US20090163788A1-20090625-C00002.png) | 1985-07-08 | 1985-07-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985104367U JPH0510354Y2 (US20090163788A1-20090625-C00002.png) | 1985-07-08 | 1985-07-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6212947U JPS6212947U (US20090163788A1-20090625-C00002.png) | 1987-01-26 |
| JPH0510354Y2 true JPH0510354Y2 (US20090163788A1-20090625-C00002.png) | 1993-03-15 |
Family
ID=30977798
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985104367U Expired - Lifetime JPH0510354Y2 (US20090163788A1-20090625-C00002.png) | 1985-07-08 | 1985-07-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0510354Y2 (US20090163788A1-20090625-C00002.png) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001060565A (ja) * | 1999-08-20 | 2001-03-06 | Lintec Corp | 光照射装置及びこれを用いたピックアップ装置 |
| WO2006087777A1 (ja) * | 2005-02-16 | 2006-08-24 | Youtec Co., Ltd. | 加圧式ランプアニール装置、加圧式ランプアニール処理方法、薄膜及び電子部品 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS567436A (en) * | 1979-06-29 | 1981-01-26 | Sony Corp | High pressure treating device |
| JPS58143520A (ja) * | 1982-02-22 | 1983-08-26 | Toshiba Corp | 半導体結晶の熱処理方法 |
| JPS59178718A (ja) * | 1983-03-29 | 1984-10-11 | Sony Corp | 半導体基体の処理装置 |
| JPS60104366A (ja) * | 1983-10-24 | 1985-06-08 | Yokogawa Hewlett Packard Ltd | プリンタにおけるトラクタ駆動装置 |
-
1985
- 1985-07-08 JP JP1985104367U patent/JPH0510354Y2/ja not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS567436A (en) * | 1979-06-29 | 1981-01-26 | Sony Corp | High pressure treating device |
| JPS58143520A (ja) * | 1982-02-22 | 1983-08-26 | Toshiba Corp | 半導体結晶の熱処理方法 |
| JPS59178718A (ja) * | 1983-03-29 | 1984-10-11 | Sony Corp | 半導体基体の処理装置 |
| JPS60104366A (ja) * | 1983-10-24 | 1985-06-08 | Yokogawa Hewlett Packard Ltd | プリンタにおけるトラクタ駆動装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6212947U (US20090163788A1-20090625-C00002.png) | 1987-01-26 |
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