JPH0492633U - - Google Patents
Info
- Publication number
- JPH0492633U JPH0492633U JP1990406312U JP40631290U JPH0492633U JP H0492633 U JPH0492633 U JP H0492633U JP 1990406312 U JP1990406312 U JP 1990406312U JP 40631290 U JP40631290 U JP 40631290U JP H0492633 U JPH0492633 U JP H0492633U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1990406312U JPH071796Y2 (ja) | 1990-12-28 | 1990-12-28 | 浸漬型基板処理装置 |
KR1019910023959A KR920013638A (ko) | 1990-12-28 | 1991-12-23 | 침지형 기판처리 장치 |
US07/815,323 US5191908A (en) | 1990-12-28 | 1991-12-27 | Dipping type surface treatment apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1990406312U JPH071796Y2 (ja) | 1990-12-28 | 1990-12-28 | 浸漬型基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0492633U true JPH0492633U (ja) | 1992-08-12 |
JPH071796Y2 JPH071796Y2 (ja) | 1995-01-18 |
Family
ID=18515925
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1990406312U Expired - Lifetime JPH071796Y2 (ja) | 1990-12-28 | 1990-12-28 | 浸漬型基板処理装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US5191908A (ja) |
JP (1) | JPH071796Y2 (ja) |
KR (1) | KR920013638A (ja) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3225441B2 (ja) * | 1991-04-23 | 2001-11-05 | 東京エレクトロン株式会社 | 処理装置 |
JP2804210B2 (ja) * | 1992-01-22 | 1998-09-24 | ジャパン・フィールド株式会社 | 洗浄装置 |
JP3110218B2 (ja) * | 1992-09-25 | 2000-11-20 | 三菱電機株式会社 | 半導体洗浄装置及び方法、ウエハカセット、専用グローブ並びにウエハ受け治具 |
JP3142195B2 (ja) * | 1993-07-20 | 2001-03-07 | 大日本スクリーン製造株式会社 | 薬液供給装置 |
US5402807A (en) * | 1993-07-21 | 1995-04-04 | Moore; David R. | Multi-modular device for wet-processing integrated circuits |
JP2894535B2 (ja) * | 1994-01-18 | 1999-05-24 | 信越半導体株式会社 | ウェーハホルダー |
US5531236A (en) * | 1994-06-01 | 1996-07-02 | Kempka; Steven N. | Directed flow fluid rinse trough |
US5772784A (en) * | 1994-11-14 | 1998-06-30 | Yieldup International | Ultra-low particle semiconductor cleaner |
US5746234A (en) * | 1994-11-18 | 1998-05-05 | Advanced Chemill Systems | Method and apparatus for cleaning thin substrates |
US5720813A (en) | 1995-06-07 | 1998-02-24 | Eamon P. McDonald | Thin sheet handling system |
TW333658B (en) * | 1996-05-30 | 1998-06-11 | Tokyo Electron Co Ltd | The substrate processing method and substrate processing system |
JPH10223585A (ja) | 1997-02-04 | 1998-08-21 | Canon Inc | ウェハ処理装置及びその方法並びにsoiウェハの製造方法 |
US6391067B2 (en) | 1997-02-04 | 2002-05-21 | Canon Kabushiki Kaisha | Wafer processing apparatus and method, wafer convey robot, semiconductor substrate fabrication method, and semiconductor fabrication apparatus |
US6068002A (en) | 1997-04-02 | 2000-05-30 | Tokyo Electron Limited | Cleaning and drying apparatus, wafer processing system and wafer processing method |
JPH1126423A (ja) * | 1997-07-09 | 1999-01-29 | Sugai:Kk | 半導体ウエハ等の処理方法並びにその処理装置 |
US6695926B1 (en) * | 1997-07-09 | 2004-02-24 | Ses Co., Ltd. | Treatment method of semiconductor wafers and the like and treatment system for the same |
KR100707107B1 (ko) * | 1997-07-17 | 2007-12-27 | 동경 엘렉트론 주식회사 | 세정.건조처리방법및장치 |
DE59908053D1 (de) * | 1998-04-06 | 2004-01-29 | Koerner Chemieanlagen | Eingehauste Beizanlage |
US6532975B1 (en) * | 1999-08-13 | 2003-03-18 | Tokyo Electron Limited | Substrate processing apparatus and substrate processing method |
JP3212981B1 (ja) * | 2000-05-01 | 2001-09-25 | 正則 茂木 | 弁の開閉位置出力装置 |
JP4100466B2 (ja) * | 2000-12-25 | 2008-06-11 | 東京エレクトロン株式会社 | 液処理装置 |
US20050209721A1 (en) * | 2003-11-06 | 2005-09-22 | Applied Materials, Inc. | Methods and apparatus for enhanced operation of substrate carrier handlers |
US7720557B2 (en) | 2003-11-06 | 2010-05-18 | Applied Materials, Inc. | Methods and apparatus for enhanced operation of substrate carrier handlers |
US7218983B2 (en) * | 2003-11-06 | 2007-05-15 | Applied Materials, Inc. | Method and apparatus for integrating large and small lot electronic device fabrication facilities |
US8635784B2 (en) * | 2005-10-04 | 2014-01-28 | Applied Materials, Inc. | Methods and apparatus for drying a substrate |
JP5063138B2 (ja) * | 2007-02-23 | 2012-10-31 | 株式会社Sokudo | 基板現像方法および現像装置 |
JP5806811B2 (ja) * | 2010-10-01 | 2015-11-10 | 株式会社日立国際電気 | 基板処理装置、基板処理方法および半導体装置の製造方法 |
AT15316U1 (de) * | 2011-09-12 | 2017-06-15 | Tms Transport- Und Montagesysteme Gmbh | Reinigungsmaschine zum Reinigen industriell gefertigter Bauteile |
DE102018105966A1 (de) * | 2018-03-15 | 2019-09-19 | Schaeffler Technologies AG & Co. KG | Anlage und Verfahren zum Behandeln einer Oberfläche mindestens eines großformatigen Bauteils |
US11194259B2 (en) * | 2018-08-30 | 2021-12-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Equipment module with enhanced protection from airborne contaminants, and method of operation |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5181467A (ja) * | 1975-01-10 | 1976-07-16 | Hitachi Ltd | Senjoso |
JPS6085529A (ja) * | 1983-10-17 | 1985-05-15 | Mitsubishi Electric Corp | 半導体ウエ−ハ薬液処理装置 |
JPS62198122A (ja) * | 1986-02-26 | 1987-09-01 | Hitachi Ltd | 半導体処理装置 |
JPS63248449A (ja) * | 1987-04-03 | 1988-10-14 | Tadahiro Omi | ドラフトチヤンバ |
JPH01226157A (ja) * | 1988-03-07 | 1989-09-08 | Kyushu Electron Metal Co Ltd | 半導体基板の乾燥方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2181177A (en) * | 1937-05-26 | 1939-11-28 | Howard C Davis | Process of deposition |
US3893869A (en) * | 1974-05-31 | 1975-07-08 | Rca Corp | Megasonic cleaning system |
GB2018831A (en) * | 1978-03-30 | 1979-10-24 | Price Bros Ltd | Improvements in cleaning equipment |
JPS6014244A (ja) * | 1983-07-06 | 1985-01-24 | Fujitsu Ltd | マスク洗浄装置 |
US4520834A (en) * | 1983-11-08 | 1985-06-04 | Dicicco Paolo S | Apparatus for processing articles in a series of process solution containers |
US4839979A (en) * | 1987-07-13 | 1989-06-20 | Sea Search, Inc. | Spear gun tip assembly and method of use thereof |
JPH01238022A (ja) * | 1988-03-17 | 1989-09-22 | Marine Instr Co Ltd | 半導体処理装置 |
JPH01261829A (ja) * | 1988-04-13 | 1989-10-18 | Sumitomo Electric Ind Ltd | 有機金属気相エピタキシー用基板の前処理方法 |
-
1990
- 1990-12-28 JP JP1990406312U patent/JPH071796Y2/ja not_active Expired - Lifetime
-
1991
- 1991-12-23 KR KR1019910023959A patent/KR920013638A/ko not_active Application Discontinuation
- 1991-12-27 US US07/815,323 patent/US5191908A/en not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5181467A (ja) * | 1975-01-10 | 1976-07-16 | Hitachi Ltd | Senjoso |
JPS6085529A (ja) * | 1983-10-17 | 1985-05-15 | Mitsubishi Electric Corp | 半導体ウエ−ハ薬液処理装置 |
JPS62198122A (ja) * | 1986-02-26 | 1987-09-01 | Hitachi Ltd | 半導体処理装置 |
JPS63248449A (ja) * | 1987-04-03 | 1988-10-14 | Tadahiro Omi | ドラフトチヤンバ |
JPH01226157A (ja) * | 1988-03-07 | 1989-09-08 | Kyushu Electron Metal Co Ltd | 半導体基板の乾燥方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH071796Y2 (ja) | 1995-01-18 |
KR920013638A (ko) | 1992-07-29 |
US5191908A (en) | 1993-03-09 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |