JPH048506B2 - - Google Patents

Info

Publication number
JPH048506B2
JPH048506B2 JP58124862A JP12486283A JPH048506B2 JP H048506 B2 JPH048506 B2 JP H048506B2 JP 58124862 A JP58124862 A JP 58124862A JP 12486283 A JP12486283 A JP 12486283A JP H048506 B2 JPH048506 B2 JP H048506B2
Authority
JP
Japan
Prior art keywords
target
thin film
evaporation source
substrate
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58124862A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6017070A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12486283A priority Critical patent/JPS6017070A/ja
Publication of JPS6017070A publication Critical patent/JPS6017070A/ja
Publication of JPH048506B2 publication Critical patent/JPH048506B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP12486283A 1983-07-11 1983-07-11 薄膜形成方法及びその装置 Granted JPS6017070A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12486283A JPS6017070A (ja) 1983-07-11 1983-07-11 薄膜形成方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12486283A JPS6017070A (ja) 1983-07-11 1983-07-11 薄膜形成方法及びその装置

Publications (2)

Publication Number Publication Date
JPS6017070A JPS6017070A (ja) 1985-01-28
JPH048506B2 true JPH048506B2 (pm) 1992-02-17

Family

ID=14895933

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12486283A Granted JPS6017070A (ja) 1983-07-11 1983-07-11 薄膜形成方法及びその装置

Country Status (1)

Country Link
JP (1) JPS6017070A (pm)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01298153A (ja) * 1988-05-25 1989-12-01 Raimuzu:Kk 積層膜の形成方法
CH686253A5 (de) * 1992-08-28 1996-02-15 Balzers Hochvakuum Verfahren zur Regelung des Reaktionsgrades sowie Beschichtungsanlage.
KR100483426B1 (ko) * 2002-10-14 2005-04-20 주식회사 아세아프로텍 진공청소장치용 세정구

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57188676A (en) * 1981-05-14 1982-11-19 Toshiba Corp Forming device for thin film by vacuum
JPS58177463A (ja) * 1982-04-12 1983-10-18 Hitachi Ltd 積層薄膜成膜装置
JPS59134821A (ja) * 1983-01-21 1984-08-02 Hitachi Ltd 薄膜の製造方法及び製造装置

Also Published As

Publication number Publication date
JPS6017070A (ja) 1985-01-28

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