JPH0475669B2 - - Google Patents
Info
- Publication number
- JPH0475669B2 JPH0475669B2 JP57009746A JP974682A JPH0475669B2 JP H0475669 B2 JPH0475669 B2 JP H0475669B2 JP 57009746 A JP57009746 A JP 57009746A JP 974682 A JP974682 A JP 974682A JP H0475669 B2 JPH0475669 B2 JP H0475669B2
- Authority
- JP
- Japan
- Prior art keywords
- active layer
- region
- gate
- anode
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D12/00—Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
- H10D12/211—Gated diodes
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57009746A JPS58127379A (ja) | 1982-01-25 | 1982-01-25 | 絶縁ゲ−ト形トランジスタ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57009746A JPS58127379A (ja) | 1982-01-25 | 1982-01-25 | 絶縁ゲ−ト形トランジスタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58127379A JPS58127379A (ja) | 1983-07-29 |
| JPH0475669B2 true JPH0475669B2 (cs) | 1992-12-01 |
Family
ID=11728865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57009746A Granted JPS58127379A (ja) | 1982-01-25 | 1982-01-25 | 絶縁ゲ−ト形トランジスタ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58127379A (cs) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02278771A (ja) * | 1989-04-20 | 1990-11-15 | Matsushita Electron Corp | 薄膜トランジスタ |
| JP3190057B2 (ja) * | 1990-07-02 | 2001-07-16 | 株式会社東芝 | 複合集積回路装置 |
| KR940022907A (ko) * | 1993-03-31 | 1994-10-21 | 이헌조 | 비대칭 엘디디(ldd) 접합 박막트랜지스터 |
-
1982
- 1982-01-25 JP JP57009746A patent/JPS58127379A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58127379A (ja) | 1983-07-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3339128A (en) | Insulated offset gate field effect transistor | |
| US4101922A (en) | Field effect transistor with a short channel length | |
| JP2585331B2 (ja) | 高耐圧プレーナ素子 | |
| US5289019A (en) | Insulated gate bipolar transistor | |
| Sah | A new semiconductor tetrode-the surface-potential controlled transistor | |
| KR890000587B1 (ko) | 절연 게이트형 트랜지스터 | |
| JPH0336311B2 (cs) | ||
| JPH07105496B2 (ja) | 絶縁ゲート型バイポーラトランジスタ | |
| JP2573736B2 (ja) | 高耐圧低抵抗半導体装置及びその製造方法 | |
| JPH0613621A (ja) | 半導体装置及びその製造方法 | |
| JP2003318410A (ja) | 炭化珪素半導体装置及びその製造方法 | |
| JPH08227900A (ja) | 半導体装置 | |
| US4651178A (en) | Dual inverse zener diode with buried junctions | |
| US3979766A (en) | Semiconductor device | |
| JPH0475669B2 (cs) | ||
| JP2739002B2 (ja) | 半導体装置及びその製造方法 | |
| EP0780905A1 (en) | Isolated gate bipolar transistor | |
| US4829349A (en) | Transistor having voltage-controlled thermionic emission | |
| JPH0888290A (ja) | 半導体装置およびその使用方法 | |
| JP2626198B2 (ja) | 電界効果トランジスタ | |
| JPS6241428B2 (cs) | ||
| JP3271972B2 (ja) | フェルミしきい値電界効果トランジスタ | |
| JPS5821866A (ja) | 半導体装置 | |
| JP2000058869A (ja) | 半導体装置 | |
| JP2000216381A (ja) | 電界効果トランジスタ |