JPH0471475B2 - - Google Patents

Info

Publication number
JPH0471475B2
JPH0471475B2 JP61008925A JP892586A JPH0471475B2 JP H0471475 B2 JPH0471475 B2 JP H0471475B2 JP 61008925 A JP61008925 A JP 61008925A JP 892586 A JP892586 A JP 892586A JP H0471475 B2 JPH0471475 B2 JP H0471475B2
Authority
JP
Japan
Prior art keywords
bearing
guide
sliding
unit
movement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61008925A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62168089A (ja
Inventor
Shigeo Sakino
Masato Negishi
Koichi Matsushita
Yasuo Horikoshi
Makoto Higomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61008925A priority Critical patent/JPS62168089A/ja
Priority to US07/003,769 priority patent/US4744675A/en
Publication of JPS62168089A publication Critical patent/JPS62168089A/ja
Publication of JPH0471475B2 publication Critical patent/JPH0471475B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61008925A 1986-01-21 1986-01-21 移動案内装置 Granted JPS62168089A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP61008925A JPS62168089A (ja) 1986-01-21 1986-01-21 移動案内装置
US07/003,769 US4744675A (en) 1986-01-21 1987-01-16 Moving mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61008925A JPS62168089A (ja) 1986-01-21 1986-01-21 移動案内装置

Publications (2)

Publication Number Publication Date
JPS62168089A JPS62168089A (ja) 1987-07-24
JPH0471475B2 true JPH0471475B2 (enrdf_load_html_response) 1992-11-13

Family

ID=11706231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61008925A Granted JPS62168089A (ja) 1986-01-21 1986-01-21 移動案内装置

Country Status (1)

Country Link
JP (1) JPS62168089A (enrdf_load_html_response)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000079574A1 (fr) * 1999-06-18 2000-12-28 Nikon Corporation Dispositif a etage et systeme d'exposition
CN103846751A (zh) * 2012-12-04 2014-06-11 株式会社捷太格特 静压流体引导装置以及使用了静压流体引导装置的机床

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04122013A (ja) * 1990-09-13 1992-04-22 Canon Inc 露光装置
JP6183021B2 (ja) * 2013-07-16 2017-08-23 日立金属株式会社 ステージ装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000079574A1 (fr) * 1999-06-18 2000-12-28 Nikon Corporation Dispositif a etage et systeme d'exposition
CN103846751A (zh) * 2012-12-04 2014-06-11 株式会社捷太格特 静压流体引导装置以及使用了静压流体引导装置的机床

Also Published As

Publication number Publication date
JPS62168089A (ja) 1987-07-24

Similar Documents

Publication Publication Date Title
US4744675A (en) Moving mechanism
US7152331B2 (en) Positioning apparatus
JP2960423B2 (ja) 試料移動装置及び半導体製造装置
US5228358A (en) Motion guiding device
US5760564A (en) Dual guide beam stage mechanism with yaw control
US4648725A (en) Guide mechanism
CN107633868B (zh) 一种二自由度气浮运动平台
EP0443831B1 (en) Motion guiding device
CN219574594U (zh) 一种一维运动装置
JP5673014B2 (ja) 位置決め装置、半導体露光装置、組立・検査装置及び精密工作機械
CN110658688B (zh) 一种工件台系统及光刻设备
JPH0471475B2 (enrdf_load_html_response)
JP2007247704A (ja) 流体軸受、流体ベアリング及びステージ装置並びに露光装置
CN216229283U (zh) 一种x/y两轴精密气浮运动平台
CN202421721U (zh) 长行程运动气浮模组及应用其的曝光台
TWI260646B (en) X-Y axis stage device
JPH05217874A (ja) 直線軸受構体およびリソグラフイ機
US20040183527A1 (en) XY stage, head carriage and tester of magnetic head or magnetic disk
JP2994072B2 (ja) 移動案内装置
JP2004317485A (ja) X−yステージ装置
JPH01188241A (ja) 移動案内装置
JPS63172988A (ja) 移動機構
CN108663797A (zh) 一种基于气浮导向的狭缝式可变光阑
JP7018193B2 (ja) アライメントステージ
JP4550494B2 (ja) Xyステージ装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term