JPH0471475B2 - - Google Patents
Info
- Publication number
- JPH0471475B2 JPH0471475B2 JP61008925A JP892586A JPH0471475B2 JP H0471475 B2 JPH0471475 B2 JP H0471475B2 JP 61008925 A JP61008925 A JP 61008925A JP 892586 A JP892586 A JP 892586A JP H0471475 B2 JPH0471475 B2 JP H0471475B2
- Authority
- JP
- Japan
- Prior art keywords
- bearing
- guide
- sliding
- unit
- movement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000033001 locomotion Effects 0.000 claims description 18
- 230000002706 hydrostatic effect Effects 0.000 claims description 17
- 239000000919 ceramic Substances 0.000 claims description 13
- 230000003068 static effect Effects 0.000 claims description 9
- 238000006073 displacement reaction Methods 0.000 claims description 3
- 238000003825 pressing Methods 0.000 description 9
- 235000012431 wafers Nutrition 0.000 description 7
- 239000000428 dust Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 230000036316 preload Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 238000013016 damping Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
【発明の詳細な説明】
[発明の属する分野]
本発明は、移動案内装置に関し、更に詳しく
は、支持基台等の第1部材上に設定された軌道に
沿つて試料搬送ステージ等の第2部材を相対移動
させるための移動案内装置に関する。本発明は特
に集積回路等の半導体装置の製造に際して高速か
つ高精度の移動と停止を繰り返すステツプアンド
リピード方式の縮小投影露光装置における半導体
ウエハ等の試料搬送装置に好適な移動案内装置を
提供するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to a movement guide device, and more particularly, the present invention relates to a movement guide device, and more specifically, it moves a second member such as a sample transport stage along a trajectory set on a first member such as a support base. The present invention relates to a movement guide device for relatively moving members. The present invention provides a movement guide device suitable for a sample transport device for semiconductor wafers, etc., in a step-and-repeat reduction projection exposure apparatus that repeats high-speed and high-precision movement and stopping, especially when manufacturing semiconductor devices such as integrated circuits. It is.
[従来の技術]
LSI等の半導体装置の製造に用いられる縮小投
影形露光装置では、半導体ウエハ上にマスクまた
はレチクルパターンを枡目状に規則正しく露光
し、前回の焼付パターンに対する位置精度を高く
することは勿論、その作業能率の向上のためにス
テツプアンドリピード動作の高速化を図る必要が
ある。このためウエハをXY二次元座標平面内で
移動させるウエハステージの搬送系には、高速起
動停止と高い停止位置精度とが要求され、そのた
め従来からステージの移動案内装置に種々の工夫
がなされている。[Prior Art] A reduction projection exposure apparatus used for manufacturing semiconductor devices such as LSIs regularly exposes a mask or reticle pattern on a semiconductor wafer in a grid pattern to improve positional accuracy with respect to the previously printed pattern. Of course, it is necessary to increase the speed of the step-and-repeat operation in order to improve the work efficiency. For this reason, the transport system of the wafer stage that moves the wafer within the XY two-dimensional coordinate plane is required to start and stop at high speed and to have high accuracy in stopping position.To this end, various improvements have been made to stage movement guide devices. .
一般にXYステージと呼ばれるこの種の搬送系
において、その移動案内装置の基本方式として、
従来より第10図に示すようなものが使用されて
いる。 In this type of transport system, generally called an XY stage, the basic method of the movement guide device is as follows:
Conventionally, the type shown in FIG. 10 has been used.
同図において、101は天板(スライダ)、1
02はステージ面、103は軸受取付板、104
は軸受取付板103に取付けられた上下および左
右の方向のガイドのための静圧軸受、105はガ
イドレールである。これらにより、天板101は
図面垂直方向の軌道に沿つて滑らかに移動案内さ
れる。106は樹脂性の制動用半浮上軸受、10
7は軸受106と摺接する摺動板、108は押付
けローラユニツトである。押付けローラユニツト
108は、そのローラによつて制動用軸受106
との間に摺動板104を挾みつけ、その押付力を
調節あるいは制御することで、制動用軸受106
と摺動板107との間の摩擦摺動部の移動方向の
見かけの摩擦係数を所望値に設定ないし可変制御
する。109はステージ部分の重心を示す。 In the same figure, 101 is a top plate (slider), 1
02 is the stage surface, 103 is the bearing mounting plate, 104
105 is a static pressure bearing for guiding in the vertical and horizontal directions, which is attached to the bearing mounting plate 103, and 105 is a guide rail. As a result, the top plate 101 is guided to move smoothly along a trajectory perpendicular to the drawing. 106 is a resin semi-floating bearing for braking, 10
7 is a sliding plate that comes into sliding contact with the bearing 106, and 108 is a pressing roller unit. The pressing roller unit 108 uses its roller to support the braking bearing 106.
By sandwiching the sliding plate 104 between the brake bearing 106 and adjusting or controlling its pressing force,
The apparent coefficient of friction in the moving direction of the friction sliding portion between and the sliding plate 107 is set to a desired value or variably controlled. 109 indicates the center of gravity of the stage portion.
露光装置のステージ搬送系は、この第10図に
示したような移動案内装置を配設した移動テーブ
ル(ステージ)に、駆動機構および運動伝達機構
を付加し、これらを複数組み合めてXY直角座標
系のX方向およびY方向に移動できるようにして
ある。 The stage transport system of an exposure apparatus consists of a moving table (stage) equipped with a movement guide device as shown in Fig. 10, a drive mechanism and a motion transmission mechanism, and multiple combinations of these to move at an XY right angle. It is designed to be movable in the X and Y directions of the coordinate system.
ところで、このような装置では以下のような欠
点があつた。 However, such a device has the following drawbacks.
上下方向に高さが高くなり装置が大型とな
る。 As the height increases in the vertical direction, the device becomes larger.
装置が高くなつたことにより重心109とウ
エハ面との距離が長くなり、重心回りの微小な
回転振動もウエハ面では拡大されて現れる。 As the height of the apparatus increases, the distance between the center of gravity 109 and the wafer surface becomes longer, and minute rotational vibrations around the center of gravity appear magnified on the wafer surface.
静圧軸受104にエアーを流すことにより軸
受取付板103に力が加わり、取付板103が
第11図に示すように変形する。そのため、軸
受面とガイド間の傾きおよびすきまの拡大が生
じ、軸受104の特性が劣化して所定の剛性が
得られない。 By flowing air through the hydrostatic bearing 104, force is applied to the bearing mounting plate 103, causing the mounting plate 103 to deform as shown in FIG. As a result, the inclination and clearance between the bearing surface and the guide are increased, the characteristics of the bearing 104 are deteriorated, and a predetermined rigidity cannot be obtained.
半浮上軸受106の摺動により発生したゴミ
が静圧軸受に入り込み軸受の劣化や破損が生じ
る。また、ゴミがウエハに付着することにより
焼付不良が発生する。 Dust generated by the sliding of the semi-floating bearing 106 enters the hydrostatic bearing, causing deterioration or damage to the bearing. Furthermore, dust adhering to the wafer causes printing defects.
ガイド構成が全拘束であるためガイド105
および静圧軸受取付板103の平行度および直
角度の両方を調整する必要があり、調整に時間
がかかる。 Since the guide configuration is fully constrained, the guide 105
It is also necessary to adjust both the parallelism and perpendicularity of the hydrostatic bearing mounting plate 103, which takes time.
[発明の目的]
本発明の目的は、上述の従来形における問題点
を解決するとともに、装置をより薄型化可能な
構造とすること、軸受の剛性をより高めて負荷
や外力変動に対して姿勢変動量を少なくするこ
と、姿勢精度(進行方向、水平方向、垂直方
向、ローリング、ピツチング、ヨーイング)の劣
化を最小限に押えると同時に各姿勢の振動に対し
有効な減衰力が得られるようにすることにある。[Objective of the Invention] The object of the present invention is to solve the above-mentioned problems with the conventional type, to provide a structure that allows the device to be made thinner, and to further increase the rigidity of the bearing to improve posture against load and external force fluctuations. To reduce the amount of fluctuation and to minimize the deterioration of posture accuracy (progressing direction, horizontal direction, vertical direction, rolling, pitching, yawing), and at the same time to obtain effective damping force against vibrations in each posture. There is a particular thing.
[実施例の説明]
以下、図面を用いて本発明の実施例を説明す
る。[Description of Examples] Examples of the present invention will be described below with reference to the drawings.
第1図は本発明の一実施例に係る移動案内装置
の全体構成を示す外観図である。また、第2〜5
図は装置を構成する各ユニツトの構成を示す。 FIG. 1 is an external view showing the overall configuration of a movement guide device according to an embodiment of the present invention. Also, 2nd to 5th
The figure shows the configuration of each unit that makes up the device.
第1図において、1は天板(スライダ)、2は
静圧軸受取付ユニツト、3はガイドユニツト、4
は送り機構ユニツト、5は摺動ユニツトである。 In Fig. 1, 1 is the top plate (slider), 2 is the hydrostatic bearing mounting unit, 3 is the guide unit, and 4 is the top plate (slider).
5 is a feeding mechanism unit, and 5 is a sliding unit.
第2図は天板1に固着する軸受取付ユニツト2
の配置を示し、21は上下支持用静圧軸受取付
板、22は左右支持用静圧軸受取付板、6は静圧
多孔質軸受である。 Figure 2 shows the bearing mounting unit 2 fixed to the top plate 1.
21 is a hydrostatic bearing mounting plate for vertical support, 22 is a hydrostatic bearing mounting plate for left and right support, and 6 is a hydrostatic porous bearing.
第3図はガイドユニツト3のガイドレールの配
置を示し、31は上下方向ガイド、32は左右方
向ガイドである。 FIG. 3 shows the arrangement of guide rails of the guide unit 3, where 31 is a vertical guide and 32 is a horizontal guide.
第4図はステージの送り機構ユニツト4を示
し、41,43はボールベアリングハウジング、
42はボールネジ、44はボールネジの振れ回り
吸収用板バネである。 FIG. 4 shows the stage feed mechanism unit 4, and 41 and 43 are ball bearing housings,
42 is a ball screw, and 44 is a leaf spring for absorbing whirling of the ball screw.
第5図は摺動ユニツト5で、51は摺動駒固定
ブロツク、52はセラミツク製半浮上軸受である
摺動駒、53は予圧用ローラユニツト、54はセ
ラミツク製摺動板、55は摺動板54を支持しそ
の変位を吸収するための板バネである。 Fig. 5 shows the sliding unit 5, 51 is a sliding piece fixing block, 52 is a sliding piece that is a ceramic semi-floating bearing, 53 is a preload roller unit, 54 is a ceramic sliding plate, and 55 is a sliding piece. This is a plate spring for supporting the plate 54 and absorbing its displacement.
また、第6図は上下方向の変位を阻止するため
の上下支持用静圧軸受の配置を示す軸受配置図で
あり、第7図は第5図の摺動ユニツトの断面図で
ある。 Further, FIG. 6 is a bearing arrangement diagram showing the arrangement of vertically supporting hydrostatic bearings for preventing displacement in the vertical direction, and FIG. 7 is a sectional view of the sliding unit of FIG. 5.
次に、第1〜7図を参照して本実施例の動作を
説明する。 Next, the operation of this embodiment will be explained with reference to FIGS. 1 to 7.
まず、天板1は静圧軸受6により上下ガイド3
1より浮上する。この際、軸受は第6図に示すよ
うに3段構成としているため、従来例に比べ剛性
がより高まり、また第11図に示すように取付板
変形による軸受特性の劣化を防ぐことができる。
また、横方向は左右支持用静圧軸受取付板22と
ガイド32との間に静圧軸受6を配置することに
より剛性を持たせている。なお、軸受6は第6図
に示すように取付板21に埋め込むことにより、
装置をより薄型化することができる。また、静圧
軸受6にセラミツク多孔質軸受を用いることによ
り、さらに剛性も高め、負荷、外力変動に対して
姿勢変動量を少なくすることができる。 First, the top plate 1 is moved to the upper and lower guides 3 by the hydrostatic bearings 6.
It floats higher than 1. At this time, since the bearing has a three-stage structure as shown in FIG. 6, the rigidity is increased compared to the conventional example, and deterioration of bearing characteristics due to deformation of the mounting plate can be prevented as shown in FIG. 11.
Further, in the lateral direction, rigidity is provided by disposing a hydrostatic bearing 6 between the left and right supporting hydrostatic bearing mounting plate 22 and the guide 32. Note that by embedding the bearing 6 in the mounting plate 21 as shown in FIG.
The device can be made thinner. Furthermore, by using a ceramic porous bearing for the static pressure bearing 6, the rigidity can be further increased and the amount of posture fluctuation can be reduced in response to load and external force fluctuations.
静圧軸受6により浮上した天板1は駆動ユニツ
ト4により駆動される。駆動は、両端をボールベ
アリングにより支持されたボールネジ42により
行なわれる。ボールネジの振れ回りを吸収するた
めに上下左右に板バネ44を配置し、天板1への
接続は振動を減少させるため重心9付近に推力が
加わるようにしている。 The top plate 1 floated by the hydrostatic bearing 6 is driven by the drive unit 4. The drive is performed by a ball screw 42 whose both ends are supported by ball bearings. Leaf springs 44 are arranged vertically and horizontally to absorb the swinging of the ball screw, and the connection to the top plate 1 applies thrust near the center of gravity 9 to reduce vibration.
また、発生した振動を効率よく減衰させるため
に第5,7図に示すような摩擦力発生用半浮上ユ
ニツト(摺動ユニツト)5が配置されている。こ
の半浮上ユニツト5の摺動駒52は発塵を防ぐた
めセラミツクで作られており、取付ブロツク51
を通じて吸気されるようになつている。摩擦力は
押付けローラ53に加える予圧および摺動駒への
吸気圧によりコントロールされる。セラミツク製
摺動板54は摺動板の変形、ガイドの真直度等に
より予圧の大きさが変化し、摩擦力が変動するの
を防ぐため板バネ55で支えられている。 Further, in order to efficiently damp the generated vibrations, a semi-floating unit (sliding unit) 5 for generating frictional force as shown in FIGS. 5 and 7 is arranged. The sliding piece 52 of this semi-floating unit 5 is made of ceramic to prevent dust generation, and the sliding piece 52 of the semi-floating unit 5 is
Air is now being taken in through the air. The frictional force is controlled by the preload applied to the pressing roller 53 and the suction pressure applied to the sliding piece. The ceramic sliding plate 54 is supported by a leaf spring 55 in order to prevent the magnitude of the preload from changing due to deformation of the sliding plate, the straightness of the guide, etc. and the fluctuation of the frictional force.
なお、摺動駒52は第7図では1つしか現われ
ていないが、これに限ることなく複数設定しても
よい。例えば、手前と奥との二箇所に1つずつ、
合計2つを設けて天板1に固定し、その摺動面を
摺動板54の右側面のガイド面に摺接させること
もできる。さらに、摺動駒52は一体に構成した
ものに複数の摺動面を設けるようにしてもよい。
いずれにしても、複数の摺動面をガイド面に摺動
するように構成するのが好ましい。 Although only one sliding piece 52 is shown in FIG. 7, the present invention is not limited to this, and a plurality of sliding pieces 52 may be set. For example, one in the front and one in the back,
It is also possible to provide a total of two and fix them to the top plate 1, and have their sliding surfaces come into sliding contact with the guide surface on the right side of the sliding plate 54. Furthermore, the sliding piece 52 may be integrally configured with a plurality of sliding surfaces.
In any case, it is preferable to configure the plurality of sliding surfaces to slide on the guide surface.
また、押付けローラユニツト53も第7図では
1つしか現われていないが、これに限らず図の手
前と奥の二箇所に1つずつ合計2つを設けるよう
にできる。なお、変形例として、2つの摺動駒5
2の中間位置に対応する個所に1つのみの押付け
ローラユニツト53を配置した構成にしてもよ
い。また、押付けローラユニツト53を3個以上
設置するようにしてもよい。 Further, although only one pressing roller unit 53 is shown in FIG. 7, the present invention is not limited to this, and a total of two pressing roller units 53 may be provided, one at the front and one at the back of the figure. In addition, as a modified example, two sliding pieces 5
It is also possible to adopt a configuration in which only one pressing roller unit 53 is disposed at a location corresponding to an intermediate position between the two. Further, three or more pressing roller units 53 may be installed.
さらに、第8図は摺動ユニツトの押付けローラ
53を静圧軸受56にしたものである。これによ
り、ローラ部からのゴミの発生、またローラのす
べり(上下)方向の摩擦力の発生を防ぐことがで
きる。 Furthermore, in FIG. 8, the pressing roller 53 of the sliding unit is provided with a hydrostatic bearing 56. This can prevent the generation of dust from the roller portion and the generation of frictional force in the sliding (up and down) direction of the roller.
また、横方向の軸受構成は第9図のような構成
としてもよい。同図のように、横方向の静圧軸受
も2層構造にすることにより、取付板の変形を防
ぎ、また剛性を増すことができる。 Further, the lateral bearing structure may be as shown in FIG. 9. As shown in the figure, by making the horizontal static pressure bearing also have a two-layer structure, deformation of the mounting plate can be prevented and rigidity can be increased.
[発明の効果]
以上説明したように本発明によれば、上下ガイ
ドと左右ガイドとを分離してすべて静圧構成と
し、上下ガイドの軸受構成を3段構成とし、さら
にセラミツク製半浮上静圧軸受を備えているので
以下のような効果がある。[Effects of the Invention] As explained above, according to the present invention, the upper and lower guides and the left and right guides are separated and all have a static pressure structure, the bearing structure of the upper and lower guides is a three-stage structure, and the semi-floating static pressure structure made of ceramic is used. Since it is equipped with bearings, it has the following effects.
(1) 静圧ガイドにしたことにより、摺動、転動等
接触によるゴミの発生を防ぐことができる。(1) By using a static pressure guide, it is possible to prevent the generation of dust due to contact such as sliding or rolling.
(2) 上下、左右ガイドを分離したことによりステ
ージの高さを低くすることができる。また、直
角方向の調整が不要となる。(2) The height of the stage can be lowered by separating the upper and lower and left and right guides. Further, adjustment in the orthogonal direction is not required.
(3) 上下ガイドの軸受構成を3段構造にしたこと
により軸受取付板の変形を防ぐことができる。(3) The three-stage bearing structure of the upper and lower guides prevents deformation of the bearing mounting plate.
(4) セラミツク製半浮上軸受による摩擦力で適切
な振動減衰力が得られる。(4) Appropriate vibration damping force can be obtained by the friction force generated by the ceramic semi-floating bearing.
(5) セラミツク製半浮上軸受により摺動時のゴミ
の発生を防ぐことができる。(5) Ceramic semi-floated bearings prevent dust from being generated during sliding.
(6) 静圧軸受に多孔質材料を用いることにより従
来より高剛性(約1.5倍)、低流量(約1/10)
を実現した。(6) By using porous material for the hydrostatic bearing, it has higher rigidity (approximately 1.5 times) and lower flow rate (approximately 1/10) than conventional bearings.
realized.
第1図は、本発明の一実施例に係る移動案内装
置の全体構成を示す外観図、第2図は、天板に固
着する軸受取付ユニツトの配置図、第3図は、ガ
イドレールの配置図、第4図は、ステージの送り
機構ユニツトの外観図、第5図は、摺動ユニツト
の外観図、第6図は、上下方向の軸受の配置図、
第7図は、摺動ユニツトの断面図、第8図は、摺
動ユニツトの変形例を示す断面図、第9図は、横
方向の軸受の構成の変形例を示す断面図、第10
図は、従来の移動案内装置の全体構成を示す断面
図、第11図は、従来の軸受取付板の変形の様子
を示す図である。
1…天板(スライダ)、2…静圧軸受取付ユニ
ツト、3…ガイドユニツト、4…送り機構ユニツ
ト、5…摺動ユニツト、6…静圧軸受、21…上
下方向軸受取付板、22…左右方向軸受取付板、
31…上下ガイド、32…左右ガイド、41,4
2…ベアリングユニツト、42…ボールネジ、4
4…板バネ、51…セラミツク製半浮上軸受取付
板、52…セラミツク製半浮上軸受、53…予圧
ローラ、54…セラミツク製摺動板、55…摺動
板支持用板バネ。
FIG. 1 is an external view showing the overall configuration of a movement guide device according to an embodiment of the present invention, FIG. 2 is a layout diagram of a bearing mounting unit fixed to a top plate, and FIG. 3 is a layout diagram of a guide rail. 4 is an external view of the stage feed mechanism unit, FIG. 5 is an external view of the sliding unit, and FIG. 6 is an arrangement view of the bearings in the vertical direction.
7 is a cross-sectional view of the sliding unit, FIG. 8 is a cross-sectional view showing a modified example of the sliding unit, FIG. 9 is a cross-sectional view showing a modified example of the configuration of the lateral bearing, and FIG.
This figure is a sectional view showing the overall configuration of a conventional movement guide device, and FIG. 11 is a diagram showing a state of deformation of a conventional bearing mounting plate. 1... Top plate (slider), 2... Hydrostatic bearing mounting unit, 3... Guide unit, 4... Feeding mechanism unit, 5... Sliding unit, 6... Static pressure bearing, 21... Vertical direction bearing mounting plate, 22... Left and right directional bearing mounting plate,
31...Upper and lower guide, 32...Left and right guide, 41,4
2...Bearing unit, 42...Ball screw, 4
4... Leaf spring, 51... Ceramic semi-floating bearing mounting plate, 52... Ceramic semi-floating bearing, 53... Preload roller, 54... Ceramic sliding plate, 55... Leaf spring for supporting sliding plate.
Claims (1)
を相対移動させるための移動案内装置であつて、 第1および第2部材間に3つの軸受面を設け該
軸受面にそれぞれ静圧構成のガイドを有し、移動
面に垂直な方向の第1および第2部材の相対変位
を阻止する第1ガイド手段と、 上記第1ガイド手段とは分離した静圧構成のガ
イドであつて移動面内で移動方向に直角な方向の
第1および第2部材の相対変化を阻止する第2ガ
イド手段と、 移動方向に関して第1および第2部材間で摺動
するセラミツク製半浮上静圧軸受と を備えたことを特徴とする移動案内装置。 2 前記第1ガイド手段および第2ガイド手段
が、静圧軸受にセラミツク多孔質軸受を用いた特
許請求の範囲第1項記載の移動案内装置。[Scope of Claims] 1. A movement guide device for relatively moving a second member along a trajectory set on a first member, comprising: three bearing surfaces provided between the first and second members; a first guide means having a guide having a static pressure structure on each surface and preventing relative displacement of the first and second members in a direction perpendicular to the moving surface; and a first guide means having a static pressure structure separated from the first guide means. a second guide means which is a guide and prevents relative change of the first and second members in a direction perpendicular to the direction of movement in the plane of movement; and a ceramic half that slides between the first and second members in the direction of movement. A movement guide device comprising a floating hydrostatic bearing. 2. The movement guide device according to claim 1, wherein the first guide means and the second guide means use ceramic porous bearings as hydrostatic bearings.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61008925A JPS62168089A (en) | 1986-01-21 | 1986-01-21 | Movement guide apparatus |
US07/003,769 US4744675A (en) | 1986-01-21 | 1987-01-16 | Moving mechanism |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61008925A JPS62168089A (en) | 1986-01-21 | 1986-01-21 | Movement guide apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62168089A JPS62168089A (en) | 1987-07-24 |
JPH0471475B2 true JPH0471475B2 (en) | 1992-11-13 |
Family
ID=11706231
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61008925A Granted JPS62168089A (en) | 1986-01-21 | 1986-01-21 | Movement guide apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62168089A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000079574A1 (en) * | 1999-06-18 | 2000-12-28 | Nikon Corporation | Stage device and exposure system |
CN103846751A (en) * | 2012-12-04 | 2014-06-11 | 株式会社捷太格特 | Hydrostatic guide device and machine tool using the hydrostatic guide device |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04122013A (en) * | 1990-09-13 | 1992-04-22 | Canon Inc | Exposure device |
JP6183021B2 (en) * | 2013-07-16 | 2017-08-23 | 日立金属株式会社 | Stage equipment |
-
1986
- 1986-01-21 JP JP61008925A patent/JPS62168089A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000079574A1 (en) * | 1999-06-18 | 2000-12-28 | Nikon Corporation | Stage device and exposure system |
CN103846751A (en) * | 2012-12-04 | 2014-06-11 | 株式会社捷太格特 | Hydrostatic guide device and machine tool using the hydrostatic guide device |
Also Published As
Publication number | Publication date |
---|---|
JPS62168089A (en) | 1987-07-24 |
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EXPY | Cancellation because of completion of term |