JPS63172988A - Moving mechanism - Google Patents

Moving mechanism

Info

Publication number
JPS63172988A
JPS63172988A JP62005826A JP582687A JPS63172988A JP S63172988 A JPS63172988 A JP S63172988A JP 62005826 A JP62005826 A JP 62005826A JP 582687 A JP582687 A JP 582687A JP S63172988 A JPS63172988 A JP S63172988A
Authority
JP
Japan
Prior art keywords
sliding surface
bearing
sliding
fluid supply
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62005826A
Other languages
Japanese (ja)
Inventor
崎野 茂夫
真人 根岸
肥後村 誠
松下 光一
堀越 康夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62005826A priority Critical patent/JPS63172988A/en
Priority to US07/003,769 priority patent/US4744675A/en
Publication of JPS63172988A publication Critical patent/JPS63172988A/en
Pending legal-status Critical Current

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  • Details Of Measuring And Other Instruments (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の属する分野〕 本発明は移動案内装置に関し、更に詳しくは、支持基台
等の第1部材上に設定された軌道に沿って試料搬送ステ
ージ等の第2部材を相対移動させるための移動案内装置
に関する。本発明は特に集積回路等の半導体装置の製造
に際して高速かつ高精度の移動と停止を繰り返すステッ
プアンドリピート方式の縮小投影露光装置における半導
体ウェハ等の試料撤退装置に好適な移動案内装置を提供
するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field to which the invention pertains] The present invention relates to a movement guide device, and more particularly, the present invention relates to a movement guide device, and more specifically, a movement guide device that moves a second member such as a sample transport stage along a trajectory set on a first member such as a support base. The present invention relates to a movement guide device for relatively moving an object. The present invention provides a movement guide device suitable for a sample withdrawal device for semiconductor wafers, etc., in a step-and-repeat reduction projection exposure apparatus that repeatedly moves and stops at high speed and with high precision, especially when manufacturing semiconductor devices such as integrated circuits. It is.

〔従来の技術〕[Conventional technology]

LSI等の半導体装置の製造に用いられる縮小投影形露
光装置では、半導体ウェハ上にマスクまたはレチクルパ
ターンを枡目状に規則正しく露光し、前回の焼付パター
ンに対する位置精度を高くすることは勿論、その作業能
率の向上のためにステップアンドリピート動作の高速化
を図る必要がある。このためウェハをXY二次元座標平
面内で移動させるウェハステージの搬送系には、高速起
動停止と高い停止位置精度とが要求され、そのため従来
からステージの移動案内装置に種々の工夫がなされてい
る。
Reduction projection exposure equipment used in the manufacture of semiconductor devices such as LSIs regularly exposes a mask or reticle pattern on a semiconductor wafer in a grid pattern, and of course improves the positional accuracy with respect to the previously printed pattern. In order to improve efficiency, it is necessary to speed up the step-and-repeat operation. For this reason, the transport system of the wafer stage that moves the wafer within the XY two-dimensional coordinate plane is required to start and stop at high speed and to have high accuracy in stopping position.To this end, various improvements have been made to stage movement guide devices. .

一般にXYステージと呼ばれるこの種の搬送系において
、その移動案内装置の基本方式として、従来より第9図
に示すようなものが使用されている。
In this type of transport system, which is generally called an XY stage, the basic system of the movement guide device shown in FIG. 9 has conventionally been used.

同図において、101は天板(スライダ)、102はス
テージ面、103は軸受取付板、104は軸受取付板1
03に取付けられた上下および左右の方向のガイドのた
めの静圧軸受、105はガイドレールである。これらに
より天板101は図面垂直方向の軌道に沿って滑らかに
移動案内される。106は樹脂性の制御相半浮上軸受、
107は軸受106と摺接する摺動板、108は押付は
ローラユニットである。押付はローラユニット108は
、そのローラによって制御用軸受106との間に摺動板
107を挾みつけ、その押付力を調節あるいは制御する
ことで、制動用軸受106と摺動板107との間の摩擦
摺動部の移動方向の見かけの摩擦係数を所望値に設定な
いし可変制御する。109はステージ部分の重心を示す
In the figure, 101 is a top plate (slider), 102 is a stage surface, 103 is a bearing mounting plate, and 104 is a bearing mounting plate 1.
03 is a static pressure bearing for guiding in the vertical and horizontal directions, and 105 is a guide rail. Due to these, the top plate 101 is guided to move smoothly along a trajectory perpendicular to the drawing. 106 is a resin control phase semi-floating bearing;
107 is a sliding plate that comes into sliding contact with the bearing 106, and 108 is a pressing roller unit. For pressing, the roller unit 108 uses its rollers to sandwich the sliding plate 107 between it and the control bearing 106, and adjusts or controls the pressing force, thereby controlling the pressure between the braking bearing 106 and the sliding plate 107. The apparent friction coefficient in the moving direction of the friction sliding part is set to a desired value or variably controlled. 109 indicates the center of gravity of the stage portion.

露光装置のステージ搬送系は、この第10図に示したよ
うな移動案内装置を配設した移動テーブル(ステージ)
に駆動機構および運動伝達機構を付加し、これらを複数
組み合わせてXY直角座標系のX方向およびY方向に移
動できるようにしである。
The stage conveyance system of the exposure apparatus is a moving table (stage) equipped with a movement guide device as shown in FIG.
A drive mechanism and a motion transmission mechanism are added to the , and by combining a plurality of these, it is possible to move in the X direction and the Y direction of the XY orthogonal coordinate system.

ところでこのような装置では、制御用軸受106と摺動
板107との間の摩擦力は移動時も停止制御時も一定で
あり、停止制御時充分な振動減衰を得る程の摩擦力を与
えると移動時に高速移動が困難になる為、摩擦力をあま
り大きくできず、充分な振動減衰が得られないという欠
点があった。又、両者の間の摩擦力は押し付はローラユ
ニット108を取り除いて、両者の間に隙き間を設けな
い限り0にする事はできず、移動中には必ず摩擦力が働
いて高速移動を阻害するという欠点もあった。
By the way, in such a device, the frictional force between the control bearing 106 and the sliding plate 107 is constant both during movement and during stop control, and it is necessary to apply enough friction force to obtain sufficient vibration damping during stop control. Since it becomes difficult to move at high speed when moving, the frictional force cannot be increased very much, and there is a drawback that sufficient vibration damping cannot be obtained. Furthermore, the frictional force between the two cannot be reduced to zero unless the pressing roller unit 108 is removed and a gap is created between the two, and the frictional force will always work during movement, resulting in high-speed movement. It also had the disadvantage of inhibiting the

〔発明の目的〕[Purpose of the invention]

本発明の目的は、上述の従来形における問題点を解決し
、又振動に対し有効な減衰力が得られるようにすること
にある。
An object of the present invention is to solve the above-mentioned problems of the conventional type and also to provide an effective damping force against vibrations.

(実施例の説明) 以下、図面を用いて本発明の詳細な説明する。(Explanation of Examples) Hereinafter, the present invention will be explained in detail using the drawings.

第1−A図は本発明の一実施例に係る移動案内装置の全
体構成を示す外観図、第1−8図は同断面図である。ま
た第2〜5図は装置を構成する各ユニットの構成を示す
FIG. 1-A is an external view showing the overall configuration of a movement guide device according to an embodiment of the present invention, and FIG. 1-8 is a sectional view thereof. Further, FIGS. 2 to 5 show the configuration of each unit that constitutes the apparatus.

第1−A図において、1は天板(スライダ)、2は静圧
軸受取付ユニット、3はガイドユニット、4は送り機構
ユニット、5は摺動ユニットである。Mは逸り橢・礪ユ
ニ・ノド4占勤も−9で°ある。
In FIG. 1-A, 1 is a top plate (slider), 2 is a hydrostatic bearing mounting unit, 3 is a guide unit, 4 is a feed mechanism unit, and 5 is a sliding unit. M is also -9 for yiri-kun, tsubo-yuni, and nodo 4-setsu.

第2図は天板1に固着する軸受取付ユニット2の配置を
示し、21は上下支持用静圧軸受取付板、22は左右支
持用静圧軸受取付板、6は静圧多孔質軸受である。
Figure 2 shows the arrangement of the bearing mounting unit 2 fixed to the top plate 1, 21 is a hydrostatic bearing mounting plate for vertical support, 22 is a hydrostatic bearing mounting plate for left and right support, and 6 is a hydrostatic porous bearing. .

第3図はガイドユニット3のガイドレールの配置を示し
、31は上下方向ガイド、32は左右方向ガイドである
FIG. 3 shows the arrangement of the guide rails of the guide unit 3, where 31 is a vertical guide and 32 is a horizontal guide.

第4図はステージの送り機構ユニット4を示し、41.
43はボールベアリングハウジング、42はボールネジ
、44はボールネジの振れ回り吸収用板バネである。
FIG. 4 shows the stage feeding mechanism unit 4, 41.
43 is a ball bearing housing, 42 is a ball screw, and 44 is a leaf spring for absorbing whirling of the ball screw.

第5図は摺動ユニット5で、51は摺動駒固定ブロック
、52はセラミック製半浮上軸受である摺動駒、53は
予圧用静圧軸受ユニット、54はセラミック製摺動板、
55は摺動板54を支持しその変位を吸収するための板
バネである。
FIG. 5 shows the sliding unit 5, 51 is a sliding piece fixing block, 52 is a sliding piece that is a semi-floated ceramic bearing, 53 is a preloading static pressure bearing unit, 54 is a ceramic sliding plate,
55 is a leaf spring for supporting the sliding plate 54 and absorbing its displacement.

また第6図は上下方向の変位を阻止するための上下支持
用静圧軸受の配置を示す軸受配置図であり、第7図は第
5図の摺動ユニットの断面図である。
Further, FIG. 6 is a bearing arrangement diagram showing the arrangement of vertically supporting static pressure bearings for preventing displacement in the vertical direction, and FIG. 7 is a sectional view of the sliding unit of FIG. 5.

次に第1−A〜7図を参照して本実施例の動作を説明す
る。
Next, the operation of this embodiment will be explained with reference to FIGS. 1-A to 7.

まず天板1は静圧軸受6により上下ガイド31より浮上
する。静圧軸受6はほぼ対向表面方向にエアを噴出する
よろ設けられている。この際、軸受は第6図に示すよう
に3段構成としているため、従来例に比べ剛性がより高
まり、また1番下の静圧軸受6が他の静圧軸受が原因で
発生する取付板変形を防ぐ方向に拘束するので、この変
形による軸受特性の劣化を防ぐことができる。
First, the top plate 1 is lifted up from the upper and lower guides 31 by the hydrostatic bearings 6. The hydrostatic bearing 6 is provided with a bulge that blows out air substantially in the direction of the opposing surface. At this time, since the bearing has a three-stage structure as shown in Figure 6, the rigidity is higher than that of the conventional example, and the bottom static pressure bearing 6 is attached to the mounting plate, which is caused by other static pressure bearings. Since the bearing is restrained in a direction that prevents deformation, deterioration of bearing characteristics due to this deformation can be prevented.

また横方向は左右支持用静圧軸受取付板22とガイド3
2との間に静圧軸受6を配置することにより剛性を持た
せている。
In addition, in the lateral direction, the left and right support hydrostatic bearing mounting plates 22 and guides 3
Rigidity is provided by arranging a static pressure bearing 6 between the two.

上下ガイドと左右ガイドは分離した構成をとっている。The upper and lower guides and the left and right guides have separate configurations.

縦方向の拘束用めガイドは上下方向に移動体が安定する
為に充分なガイド剛性を有していなければならず、上下
ガイド31と軸受取付板103はある程度の肉厚を高さ
方向に有していなければならない。しかし横方向拘束用
のガイドは上下方向に力を受けないので、それほどガイ
ド剛性を必要とせず、必要給気を与えるのに充分な大き
さの静圧軸受6の長さ分の高さしか必要としない。又こ
の高さは上下ガイドの必要肉厚より大きい。上下ガイド
と左右ガイドを分離し、上下ガイi呪=必要な肉厚内の
高さに°左右ガイド用の静圧軸受6を位置させているの
で全拘束用のガイドを用いた時よりステージ全体の高さ
を低くできる。
The vertical restraint guide must have sufficient guide rigidity to stabilize the moving body in the vertical direction, and the vertical guide 31 and bearing mounting plate 103 must have a certain degree of wall thickness in the height direction. Must be. However, since the guide for lateral restraint does not receive force in the vertical direction, it does not require much guide rigidity, and only needs a height equal to the length of the hydrostatic bearing 6, which is large enough to provide the necessary air supply. I don't. Also, this height is greater than the required wall thickness of the upper and lower guides. The upper and lower guides and the left and right guides are separated, and the static pressure bearings 6 for the left and right guides are positioned at a height within the required wall thickness for the upper and lower guides, so the entire stage can be fixed better than when using a guide for full restraint. The height of the can be lowered.

又、取付板の変形を防ぐ方向に拘束する静圧軸受を設け
ているので、取付板21の剛性をそれ程大きくせずにす
み、取付板の厚みを小さくでき、この点でもステージ全
体の高さを低くできる。なお軸受6は第6図に示すよう
に取付板21に埋め込むことにより、装置をより薄型化
することができる。また静圧軸受6にセラミック多孔質
軸受を用いることにより、さらに剛性を高め、負荷、外
力変動に対して姿勢変動量を少なくすることができる。
In addition, since a static pressure bearing is provided that restrains the mounting plate in a direction that prevents it from deforming, the rigidity of the mounting plate 21 does not need to be increased so much, and the thickness of the mounting plate can be reduced, which also reduces the overall height of the stage. can be lowered. Note that by embedding the bearing 6 in the mounting plate 21 as shown in FIG. 6, the device can be made thinner. Further, by using a ceramic porous bearing as the hydrostatic bearing 6, the rigidity can be further increased and the amount of posture fluctuation can be reduced in response to changes in load and external force.

静圧軸受6により浮上した天板lは駆動ユニット4によ
り駆動される。駆動は両端をボールベアリングにより支
持されたボールネジ42により行われる。ボールネジの
振れ回りを吸収するために上下左右に板バネ44を配置
し、天板1への接続は振動を減少させるため重心9付近
に推力が加わる、即ちボールネジが重心9近くを通るよ
うにしている。天板1と重心9が近いので振動が発生し
にくくなっている。
The top plate 1 floated by the hydrostatic bearing 6 is driven by the drive unit 4. The drive is performed by a ball screw 42 whose both ends are supported by ball bearings. In order to absorb the whirling of the ball screw, leaf springs 44 are arranged on the top, bottom, left and right sides, and the connection to the top plate 1 is such that a thrust is applied near the center of gravity 9 to reduce vibrations, that is, the ball screw passes near the center of gravity 9. There is. Since the top plate 1 and the center of gravity 9 are close to each other, vibrations are less likely to occur.

またボールネジの軸方向の弾性振動等により発生した振
動を効率よく減衰させるために第5゜7図に示すような
摩擦力発生用半浮上ユニット(摺動ユニット)5が配置
されている。この半浮上ユニット5の摺動駒52は発塵
を防ぐためセラミックで作られており、摺動面に穴が開
いていて摺動板54の摺動面に取付ブロック51内の給
気道51aを通じて給気されるようになっている。摩擦
力はセラミック多孔質静圧軸受56への給気圧および摺
動駒への給気圧によりコントロールされる。
Further, in order to efficiently damp vibrations generated by elastic vibrations in the axial direction of the ball screw, etc., a semi-floating unit (sliding unit) 5 for generating frictional force is arranged as shown in FIG. 5-7. The sliding piece 52 of this semi-floating unit 5 is made of ceramic to prevent dust generation, and has a hole in its sliding surface so that the air supply passage 51a in the mounting block 51 is passed through the sliding surface of the sliding plate 54. Air is supplied. The frictional force is controlled by the supply pressure to the ceramic porous hydrostatic bearing 56 and the supply pressure to the sliding piece.

CPU73はステージの移動開始時には、給気道51a
を介して摺動駒52への給気圧を上げるよう給気ポンプ
72を、あるいは給気道56aを介して静圧軸受56へ
の給気圧を下げるよう給気ポンプ75を制御し、摺動駒
52への圧力流体によって摺動駒52と摺動板54とを
非接触状態にさせる。この時、静圧軸受56と摺動板5
4とが接触しないのに充分な給気圧を給気ポンプ72が
供給するようにしておく。
When the stage starts moving, the CPU 73 controls the air supply path 51a.
The air supply pump 72 is controlled to increase the supply pressure to the sliding piece 52 through the air supply path 56a, or the air supply pump 75 is controlled to decrease the supply pressure to the static pressure bearing 56 through the air supply path 56a. The sliding piece 52 and the sliding plate 54 are brought into a non-contact state by the pressurized fluid. At this time, the static pressure bearing 56 and the sliding plate 5
The air supply pump 72 is configured to supply sufficient air supply pressure to prevent contact between the air supply and the air supply pump 72.

ステージは摩擦による抵抗力を受けなくなるので高速移
動が可能になる。又、停止制御開始時、例えばステージ
が目標停止位置近傍に到達し、ステージの制御を速度サ
ーボ制御から位置サーボ制御に切り換える時には同時に
摺動駒52への給気圧を下げるよう給気ボンブフ2を、
あるいは静圧軸受56への給気圧を上げるよう給気ボン
ブ75を制御し、摺動駒52と摺動板54とを接触状態
にし、両者の間に充分な摩擦力が発生するようにする。
Since the stage is no longer subject to frictional resistance, high-speed movement becomes possible. Furthermore, at the start of the stop control, for example, when the stage reaches the vicinity of the target stop position and the stage control is switched from speed servo control to position servo control, the air supply bomb 2 is simultaneously operated to lower the supply pressure to the sliding piece 52.
Alternatively, the air supply bomb 75 is controlled to increase the supply pressure to the static pressure bearing 56, and the sliding piece 52 and the sliding plate 54 are brought into contact with each other so that sufficient frictional force is generated between them.

ステージを効率よく振動を減衰させて停止にかかる時間
を減少させることが可能になる。セラミック製摺動板5
4は摺動板の変形。
It becomes possible to efficiently damp the vibrations of the stage and reduce the time it takes for the stage to stop. Ceramic sliding plate 5
4 is the deformation of the sliding plate.

ガイドの真直度等により予圧の大きさが変化し摩擦力が
変動するのを防ぐため、進行方向に垂直でほぼ水平方向
に移動可能なように板バネ55で支えられている。
In order to prevent the friction force from fluctuating due to changes in the magnitude of preload due to the straightness of the guide, etc., the guide is supported by a leaf spring 55 so as to be movable in a substantially horizontal direction perpendicular to the direction of travel.

なね摺動駒52は第7図では1つしか現れていないが、
これに限ることなく複数設定してもよい。例えば手前と
奥の三箇所に1つずつ合計2つを設けて天板1に固定し
、その摺動面を摺動板54の右側面のガイド面に摺接さ
せることもできる。さらに摺動駒52は一体に構成した
ものに複数の摺動面を設けるようにしてもよい。
Although only one sliding piece 52 appears in Fig. 7,
It is not limited to this, and multiple settings may be made. For example, it is also possible to provide two in total, one in the front and one in the back, and fix them to the top plate 1, so that the sliding surface thereof can be brought into sliding contact with the guide surface on the right side of the sliding plate 54. Furthermore, the sliding piece 52 may be constructed integrally and provided with a plurality of sliding surfaces.

いずれにしても複数の摺動面をガイド面に摺動するよう
に構成するのが好ましい。
In any case, it is preferable to configure a plurality of sliding surfaces to slide on the guide surface.

押付は力を与える部材をローラでなく静圧軸受にした事
により、ローラ部からのゴミの発生、またローラのすべ
り(上下)方向の摩擦力の発生を防ぐことができる。
For pressing, by using a static pressure bearing instead of a roller as the member that applies force, it is possible to prevent the generation of dust from the roller part and the generation of frictional force in the sliding (up and down) direction of the roller.

横方向の軸受構成は第8図のような構成としてもよい。The lateral bearing arrangement may be as shown in FIG.

同図のように、横方向の静圧軸受も2層構造にすること
により取付板の変形を防ぎ、また剛性を増すことができ
る。
As shown in the figure, the lateral static pressure bearing can also be formed into a two-layer structure to prevent deformation of the mounting plate and increase rigidity.

(発明の効果) 以上説明した様に、本発明によりステージの移動時には
高速移動を可能にし、ステージの停止制御時には充分な
振動減衰で高速停止を可能にし、更に停止時には大きな
停止安定性を得る事が可能になった。
(Effects of the Invention) As explained above, the present invention enables high-speed movement when moving the stage, enables high-speed stopping with sufficient vibration damping when controlling the stage to stop, and furthermore provides great stopping stability when stopping. is now possible.

【図面の簡単な説明】[Brief explanation of the drawing]

第1−A図は本発明の一実施例に係る移動案内装置の全
体構成を示す外観図、 第1−B図は同断面図、 第2図は天板に固着する軸受取付ユニットの配置図、 第3図はガイドレールの配置図、 第4図はステージの送り機構ユニットの外観図、 第5図は摺動ユニットの外観図、 第6図は上下方向の軸受の配置図、 第7図は摺動ユニットの断面図、 第8図は横方向の軸受の構成の変形例を示す断面図、 第9図は従来の移動案内装置の全体構成を示す断面図、 1・・・天板(スライダ)、 2・・・静圧軸受取付ユニット、 3・・・ガイドユニット、4・・・送り機構ユニット、
5・・・摺動ユニット、6・・・静圧軸受、21・・・
上下方向軸受取付板、 22・・・左右方向軸受取付板、31・・・上下ガイド
、32・・・左右ガイド、 41.42・・・ベアリングユニット、42・・・ボー
ルネジ、44・・・板バネ、51・・・セラミック製半
浮上軸受取付板、52・・・セラミック製半浮上軸受、 54・・・セラミック製摺動板、 55・・・摺動板支持用板バネ、 56・・・セラミック製静圧軸受。
Figure 1-A is an external view showing the overall configuration of a movement guide device according to an embodiment of the present invention, Figure 1-B is a cross-sectional view of the same, and Figure 2 is a layout diagram of a bearing mounting unit fixed to a top plate. , Fig. 3 is a guide rail layout, Fig. 4 is an external view of the stage feed mechanism unit, Fig. 5 is an external view of the sliding unit, Fig. 6 is a vertical bearing arrangement, and Fig. 7 is a sectional view of the sliding unit, FIG. 8 is a sectional view showing a modified example of the configuration of the lateral bearing, FIG. 9 is a sectional view showing the overall configuration of the conventional movement guide device, 1... Top plate ( slider), 2... hydrostatic bearing mounting unit, 3... guide unit, 4... feed mechanism unit,
5...Sliding unit, 6...Static pressure bearing, 21...
Vertical bearing mounting plate, 22... Horizontal bearing mounting plate, 31... Vertical guide, 32... Left and right guide, 41.42... Bearing unit, 42... Ball screw, 44... Board Spring, 51... Ceramic semi-floating bearing mounting plate, 52... Ceramic semi-floating bearing, 54... Ceramic sliding plate, 55... Leaf spring for supporting sliding plate, 56... Ceramic hydrostatic bearing.

Claims (5)

【特許請求の範囲】[Claims] (1)第1部材に設けられた第1摺動面、第1部材に対
し相対的に移動可能な第2部材に設けられ前記第1摺動
面と摺動する第2摺動面、前記第1摺動面と第2摺動面
との間隔を可変制御する制御手段、を有する事を特徴と
する移動機構。
(1) a first sliding surface provided on a first member; a second sliding surface provided on a second member that is movable relative to the first member and sliding on the first sliding surface; A moving mechanism characterized by having a control means for variably controlling the distance between the first sliding surface and the second sliding surface.
(2)前記制御手段は前記第1摺動面と前記第2摺動面
とが接触状態及び非接触状態になるように間隔を制御す
ることを特徴とする特許請求の範囲第1項記載の移動機
構。
(2) The control means controls the distance between the first sliding surface and the second sliding surface so that they are in a contact state and a non-contact state. Moving mechanism.
(3)前記制御手段は前記第2摺動面に設けられた流体
供給孔と前記流体供給孔に流体を供給する流体供給手段
とを有する特許請求の範囲第2項記載の移動機構。
(3) The moving mechanism according to claim 2, wherein the control means includes a fluid supply hole provided in the second sliding surface and a fluid supply means for supplying fluid to the fluid supply hole.
(4)前記制御手段は更に前記第1摺動面と前記第2摺
動面とを接触させる方向に前記第1部材に圧力を加える
加圧手段と、前記加圧手段の圧力と前記流体供給手段の
流体供給圧力とのうち少なくとも一方を可変制御する圧
力制御手段とを有する事を特徴とする特許請求の範囲第
3項記載の移動機構。
(4) The control means further includes a pressurizing means for applying pressure to the first member in a direction to bring the first sliding surface and the second sliding surface into contact with each other, and the pressure of the pressurizing means and the fluid supply. 4. The moving mechanism according to claim 3, further comprising pressure control means for variably controlling at least one of the fluid supply pressures of the means.
(5)前記圧力制御手段は第2部材を移動させる時に前
記第1摺動面と第2摺動面とを非接触状態にし、第2部
材を停止させる時に前記第1摺動面と第2摺動面とを接
触状態にするよう前記流体供給手段の流体供給圧力と前
記加圧手段の圧力とのうち少なくとも一方を制御する事
を特徴とする特許請求の範囲第4項記載の移動機構。
(5) The pressure control means brings the first sliding surface and the second sliding surface into a non-contact state when moving the second member, and the pressure controlling means brings the first sliding surface and the second sliding surface into a non-contact state when the second member is stopped. 5. The moving mechanism according to claim 4, wherein at least one of the fluid supply pressure of the fluid supply means and the pressure of the pressurizing means is controlled so as to bring the sliding surface into contact with the sliding surface.
JP62005826A 1986-01-21 1987-01-12 Moving mechanism Pending JPS63172988A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP62005826A JPS63172988A (en) 1987-01-12 1987-01-12 Moving mechanism
US07/003,769 US4744675A (en) 1986-01-21 1987-01-16 Moving mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62005826A JPS63172988A (en) 1987-01-12 1987-01-12 Moving mechanism

Publications (1)

Publication Number Publication Date
JPS63172988A true JPS63172988A (en) 1988-07-16

Family

ID=11621864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62005826A Pending JPS63172988A (en) 1986-01-21 1987-01-12 Moving mechanism

Country Status (1)

Country Link
JP (1) JPS63172988A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010067949A (en) * 2008-06-27 2010-03-25 Asml Netherlands Bv Object support positioning device, and lithographic apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60140722A (en) * 1983-12-27 1985-07-25 Canon Inc Precision moving apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60140722A (en) * 1983-12-27 1985-07-25 Canon Inc Precision moving apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010067949A (en) * 2008-06-27 2010-03-25 Asml Netherlands Bv Object support positioning device, and lithographic apparatus

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