JPH01188241A - Shift guiding device - Google Patents
Shift guiding deviceInfo
- Publication number
- JPH01188241A JPH01188241A JP63012137A JP1213788A JPH01188241A JP H01188241 A JPH01188241 A JP H01188241A JP 63012137 A JP63012137 A JP 63012137A JP 1213788 A JP1213788 A JP 1213788A JP H01188241 A JPH01188241 A JP H01188241A
- Authority
- JP
- Japan
- Prior art keywords
- stage
- surface plate
- shift
- moving
- guide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003068 static effect Effects 0.000 claims abstract description 21
- 230000002706 hydrostatic effect Effects 0.000 claims description 5
- 230000005484 gravity Effects 0.000 claims description 4
- 230000036316 preload Effects 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 description 6
- 238000005096 rolling process Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Machine Tool Units (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は移動案内装置に関し、特に半導体製造装置や蹟
密工作機械等において、例えばＸステージやＹステージ
等の移動体を高速にしかも高精度に所定位置に位置決め
することのできる移動案内装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a movement guide device, and is particularly used in semiconductor manufacturing equipment, high-traffic machine tools, etc. to move moving objects such as an X stage or a Y stage at high speed and with high accuracy. The present invention relates to a movement guide device that can be positioned at a predetermined position.
（従来の技術）
従来より移動体を所定の案内に沿って移動させ、所定位
置に高精度に位置決めを行うようにした移動案内装置が
種々と提案されている。(Prior Art) Various movement guide devices have been proposed in the past that move a movable body along a predetermined guide and position it at a predetermined position with high precision.
第８図は従来のＸ、Ｙ移動機構を有する移動案内装置の
要部斜視図である。FIG. 8 is a perspective view of a main part of a movement guide device having a conventional X and Y movement mechanism.
同図において８１は定盤であり、該定盤８１上にＸ方向
の移動機構としてのＸステージ８４が載置されている。In the figure, 81 is a surface plate, and an X stage 84 as a moving mechanism in the X direction is placed on the surface plate 81.
又、Ｘステージ８４上にはＸ方向の移動機構としてのＸ
ステージ８５がａ置されている。Also, on the X stage 84, there is an X as a moving mechanism in the X direction.
A stage 85 is placed a.
Ｘステージ８５及びＸステージ８４は不図示のリニアモ
ーター等の駆動手段により所定方向に各々移動され位置
決めされている。The X stage 85 and the X stage 84 are each moved and positioned in a predetermined direction by a driving means such as a linear motor (not shown).
同図に示す移動案内装置は定盤８１、Ｘステージ８４、
モしてＸステージ８５と順に積み重ねた構成を採ってい
る為、上下方向に高くなる傾向があった。The movement guide device shown in the figure includes a surface plate 81, an X stage 84,
Since the stage 85 and the X stage 85 are stacked one after another, there is a tendency for the height to rise in the vertical direction.
又、Ｘステージ８５が移動する際、Ｘステージ８４に偏
荷重が発生し、Ｘステージ８４が例えば第９図（Ａ）、
（Ｂ）の点線で示すように変形し、この結果Ｘステージ
８５の静的な姿勢精度が劣化してくる欠点があった。Further, when the X stage 85 moves, an unbalanced load is generated on the X stage 84, and the X stage 84 moves as shown in FIG. 9(A), for example.
The deformation occurs as shown by the dotted line in (B), and as a result, the static posture accuracy of the X stage 85 deteriorates.
更にＸステージ８５及びＸステージ８４を剛体より構成
するとＸステージ８５、Ｘステージ８４が第１０図に示
すように６つの自由度を持つようになる為、例えばＸス
テージ８４がピッチングを起こすとＸステージ８５のロ
ーリングとなる等、６つの自由度が互いに全て連成し、
動的にも姿勢精度が劣化してくる等の問題点があった。Furthermore, if the X stage 85 and the X stage 84 are made of rigid bodies, the X stage 85 and the X stage 84 will have six degrees of freedom as shown in FIG. All six degrees of freedom are coupled to each other, such as 85 rolling,
There were also problems with dynamic posture, such as deterioration of posture accuracy.
（発明が解決しようとする問題点）
本発明はＸステージとＹステージの各々の移動に際して
、ＸステージとＹステージの案内機構な適切に設定する
ことにより、例えばＹステージの移動荷重を無くし、Ｘ
ステージの静的な姿勢精度の劣化を防止し、高精度な位
置決めを可能とした移動案内装置の提供を目的とする。(Problems to be Solved by the Invention) The present invention eliminates the moving load of the Y stage, for example, by appropriately setting the guide mechanism of the X stage and the Y stage when each of the X stage and the Y stage moves.
The purpose of the present invention is to provide a movement guide device that prevents deterioration of the static posture accuracy of a stage and enables highly accurate positioning.
又、本発明は例えばＹステージの移動に対して直交する
方向、垂直方向、そしてローリングの３成分における振
動の速成を無くし、更にＹステージのピッチングを静圧
空気軸受の間隙を介してＸステージのみに伝達するよう
にし、これにより高精度な位置決めを可能とした移動案
内装置の提供を目的としてし）る。In addition, the present invention eliminates the rapid formation of vibrations in three components, for example, in the direction orthogonal to the movement of the Y stage, in the vertical direction, and in the rolling direction, and furthermore, the pitching of the Y stage is reduced only to the X stage through the gap between the hydrostatic air bearings. The purpose of the present invention is to provide a movement guide device that enables highly accurate positioning.
（問題点を解決するための手段）
定盤上に２つの固定ガイドを平行配置し、該固定ガイド
と定盤との間を静圧空気軸受により第１の移動体を該固
定ガイドと平行に移動するように支持し、該第１の移動
体と該定盤との間を静圧空気軸受により第２の移動体を
該第１の移動体の移動方向と直角方向に移動するように
支持した移動案内機構において、前記第１の移動体の横
方向の案内を該定盤上に設けた２つの固定ガイドより行
うと共に垂直方向の案内を該定盤により行い、訂記第２
の移動体の横方向の案内を該第１の移動体より行うと共
に垂直方向の案内を該定盤により行ったことである。(Means for solving the problem) Two fixed guides are arranged in parallel on a surface plate, and a first movable body is moved parallel to the fixed guide using a static air bearing between the fixed guide and the surface plate. a second movable body is supported to move in a direction perpendicular to the moving direction of the first movable body by a static air bearing between the first movable body and the surface plate; In the movement guide mechanism, the first moving body is guided in the lateral direction by two fixed guides provided on the surface plate, and the vertical direction is guided by the surface plate,
The first moving body is guided in the lateral direction by the first moving body, and the surface plate is guided in the vertical direction.
（実施例）
第１図〜第４図は本発明の第１の実施例の概略図である
。(Embodiment) FIGS. 1 to 4 are schematic diagrams of a first embodiment of the present invention.
第１図は斜視図、第２図は第１図のＡ−Ａ ’断面図、
第３図は第１１図のＢ−Ｂ’断面図、第４図は第１図の
裏面図である。Figure 1 is a perspective view, Figure 2 is a sectional view taken along line A-A' in Figure 1,
3 is a sectional view taken along line BB' in FIG. 11, and FIG. 4 is a back view of FIG. 1.
同図において１は定盤であり、上面が滑らかな基準面と
なっている。４は移動体としてのＹステージ、５は移動
体としてのＸステージ、２はＹステージ４の横方向（Ｙ
軸方向）の固定ガイド、３ （３ａ、３ｂ、３ｃ、３ｄ
）は多孔質の静圧空気軸受であり、このうち３ａはＸス
テージ５の横方向（Ｙ軸方向）、３ｂはＸステージ５の
垂直方向、３ＣはＹステージ４の横方向、３ｄはＹステ
ージ４の垂直方向を各々案内しているＪ４ａはＹステー
ジ４の横方向の静圧空気軸受取付板、４ｂはＹステージ
４の垂直方向の静圧空気軸受取付板であり、Ｘステージ
５の横方向の案内を兼ねている。４ｃはＹステージ用の
駆動アクチュエータ、４ｄはＹステージ用の駆動アクチ
ュエータ４ｃの連結板であり静圧空気軸受取付板４ａに
連結されている。５ａはＸステージ５の移動板、５ｂは
Ｘステージ５の垂直方向と横方向の軸受取付板、５ｃは
Ｘステージ５の駆動アクチュエータである。６は予圧用
磁石ユニットであり、特願昭６２−６２７３５号で提案
しているように例えば磁力手段として永久磁石とその両
側に設けたヨークとを有した予圧機構により静圧軸受に
加圧流体を給気し、移動体を浮上させる際、軸受けの特
性のバラツキにより移動体が傾くのを防止し、常に一定
の姿勢を保つようにしている。In the figure, 1 is a surface plate whose upper surface serves as a smooth reference surface. 4 is a Y stage as a moving body, 5 is an X stage as a moving body, 2 is a lateral direction of Y stage 4 (Y
axial direction) fixed guides, 3 (3a, 3b, 3c, 3d
) are porous static air bearings, of which 3a is in the lateral direction of the X stage 5 (Y-axis direction), 3b is in the vertical direction of the X stage 5, 3C is in the lateral direction of the Y stage 4, and 3d is in the Y stage J4a is a horizontal static pressure air bearing mounting plate of the Y stage 4, and 4b is a vertical static air bearing mounting plate of the Y stage 4, which guides the horizontal direction of the X stage 5. It also serves as a guide. 4c is a drive actuator for the Y stage, and 4d is a connection plate for the drive actuator 4c for the Y stage, which is connected to the hydrostatic air bearing mounting plate 4a. 5a is a moving plate of the X stage 5, 5b is a mounting plate for the vertical and lateral bearings of the X stage 5, and 5c is a drive actuator for the X stage 5. Reference numeral 6 denotes a preload magnet unit, which applies pressurized fluid to a hydrostatic bearing by means of a preload mechanism having a permanent magnet as a magnetic force means and yokes provided on both sides, as proposed in Japanese Patent Application No. 62-62735. When air is supplied and the moving object is levitated, this prevents the moving object from tilting due to variations in the characteristics of the bearings and maintains a constant posture at all times.
本実施例において駆動アクチュエータ４ｃ。In this embodiment, the drive actuator 4c.
５ｃとしては例えばリニアモーター、油圧直流モーター
等を用いている。As 5c, for example, a linear motor, a hydraulic DC motor, etc. are used.
第１図に示すように本実施例においてはＹステージ４は
静圧空気軸受３に給気することにより定盤１よりｌ￥上
させ、２つの駆動アクチュエータ４ｃにより固定カイト
２に沿ってＹ方向に移動させている。As shown in FIG. 1, in this embodiment, the Y stage 4 is raised above the surface plate 1 by supplying air to the static pressure air bearing 3, and moved in the Y direction along the fixed kite 2 by two drive actuators 4c. It is being moved to .
又、Ｘステージ５は静圧空気軸受３に給気することによ
りＹステージ４と同様に定盤１より浮上させ、Ｙステー
ジ４の側面を横方向の案内として駆動アクチュエーター
５０によりＸ方向に移動させている。このとき、Ｘステ
ージ５及びＹステージ４は複数の予圧用磁石ユニット６
により常に一定の姿勢となるように調整されている。In addition, the X stage 5 is made to float above the surface plate 1 by supplying air to the static pressure air bearing 3 in the same way as the Y stage 4, and is moved in the X direction by the drive actuator 50 using the side surface of the Y stage 4 as a lateral guide. ing. At this time, the X stage 5 and the Y stage 4 are provided with a plurality of preload magnet units 6.
It is adjusted so that it always maintains a constant posture.
本実施例の特徴としては、
（イ）Ｘステージ及びＹステージの垂直方向の案内をい
ずれも定盤より行い、ＸステージやＹステージが移動し
ても相手側のステージに移動荷重が発生しないようにし
て静的な姿勢を良好に維持している。The features of this embodiment are as follows: (a) Both the X stage and Y stage are guided in the vertical direction from a surface plate, so that even if the X stage or Y stage moves, no moving load is generated on the other stage. and maintains a good static posture.
（ロ）Ｙステージの縦方向（第１図においてＸ方向）、
垂直方向（第１図の２方向）そしてローリング（第１図
のＹ軸回りの回転）の振動の３成分について速成を全く
無くしている。(b) The vertical direction of the Y stage (X direction in Figure 1),
The three components of vibration in the vertical direction (two directions in FIG. 1) and rolling (rotation around the Y axis in FIG. 1) are completely eliminated from rapid formation.
（ハ）Ｙステージのピッチング（第１図のＸ軸回りの回
転）は静的空気軸受３ａを介してＸステージのみに伝わ
るようにしており、これにより速成を極力押えている。(c) Pitching of the Y stage (rotation around the X axis in FIG. 1) is transmitted only to the X stage via the static air bearing 3a, thereby suppressing speed generation as much as possible.
（ニ）第９図に示す従来の移動案内装置に比べ、Ｘステ
ージを固定ガイド２若しくはＹステージ用の駆動アクチ
ュエータ４Ｃにオーバーハングさせることにより定盤の
占有面積な略等しくしている。(d) Compared to the conventional movement guide device shown in FIG. 9, the X stage is made to overhang the fixed guide 2 or the drive actuator 4C for the Y stage, so that the surface plate occupies approximately the same area.
（ホ）移動案内装置全体の高さを定盤を含め従来に比べ
約％程度にしている。(e) The height of the entire movable guide device including the surface plate is reduced to approximately % of the conventional height.
（へ）連結板の高さを調整することによりＸステージと
Ｙステージの駆動点とＸステージ、Ｙステージの高さ方
向の重心点を略一致させ、これにより駆動時の振動の発
生を極力押えている。(f) By adjusting the height of the connecting plate, the drive point of the X stage and Y stage and the center of gravity in the height direction of the X stage and Y stage are approximately aligned, thereby minimizing the occurrence of vibration during drive. ing.
（ト）Ｙステージの横方向の静圧空気軸受取付板４ａを
垂直方向の静圧空気軸受取付板４ｂの幅より長くするこ
とにより、横方向の軸受取付板の面積を十分に確保して
いる。又、このとき横方向の静圧空気軸受取付板４ａの
長さをＸステージ５の移動板５ａの長さと一致させ、こ
れにより可動面積が拡大するのを防止している。(g) By making the width of the horizontal static air bearing mounting plate 4a of the Y stage longer than the width of the vertical static air bearing mounting plate 4b, a sufficient area is secured for the horizontal bearing mounting plate. . Further, at this time, the length of the horizontal static pressure air bearing mounting plate 4a is made to match the length of the movable plate 5a of the X stage 5, thereby preventing the movable area from expanding.
第５図〜第７図は本発明の第２の実施例の概略図である
。第５．第６．第７図は各々第１の実施例の第２．第３
．第４図に相当している。5 to 7 are schematic diagrams of a second embodiment of the present invention. Fifth. 6th. FIG. 7 shows the second embodiment of the first embodiment. Third
．． This corresponds to Figure 4.
本実施例において第１の実施例と同じ部材には同符番を
付している。In this embodiment, the same members as in the first embodiment are given the same reference numerals.
第５図〜第７図において４ｅは垂直方向と横方向の軸受
取付板、４ｆはＸステージ５の横方向の案内と軸受取付
板４ｅの連結板である。５ｅはＸステージ５の垂直方向
の軸受取付板、５ｆはＸステージ５の横方向の軸受取付
板である。In FIGS. 5 to 7, 4e is a vertical and lateral bearing mounting plate, and 4f is a connecting plate between the lateral guide of the X stage 5 and the bearing mounting plate 4e. 5e is a vertical bearing mounting plate of the X stage 5, and 5f is a horizontal bearing mounting plate of the X stage 5.
本実施例ではＸステージ５に垂直方向の軸受取付板５ｅ
を設けることにより、第１の実施例の特長に加えて例え
ばＸステージ５の横方向の静圧空気軸受３ａに給気した
際、軸受取付板５ｆ、移動板５ａがたわんで変形するの
を防止すると共に、移動板５ａ、軸受取付板５ｅ、５ｆ
等の部材の薄肉化を図っている。In this embodiment, the bearing mounting plate 5e is vertical to the X stage 5.
By providing this, in addition to the features of the first embodiment, for example, when air is supplied to the horizontal static pressure air bearing 3a of the X stage 5, the bearing mounting plate 5f and the moving plate 5a are prevented from being bent and deformed. At the same time, the moving plate 5a, the bearing mounting plates 5e, 5f
Efforts are being made to reduce the thickness of such members.
又、垂直方向の軸受取付板５ｅの厚さを適切に設定する
ことによりＸステージ５の重心位置の調整を可能として
おり、これによりＸステージ５に対する駆動点と重心位
置との一致を容易にすることができる等の特長を有して
いる。In addition, by appropriately setting the thickness of the vertical bearing mounting plate 5e, it is possible to adjust the center of gravity position of the X stage 5, thereby making it easier to match the drive point with respect to the X stage 5 and the center of gravity position. It has the following features:
（発明の効果）
本発明によれば前述の如く各要素を特定することにより
、特にＸステージとＹステージの垂直方向の案内を定盤
面のみとし、又、Ｙステージの横方向の案内を定盤上の
２木の固定ガイド、モしてＸステージの横方向の案内を
Ｙステージの側面とすることにより、Ｙステージの移動
荷重を無くし、又、Ｙステージの垂直方向、Ｘ軸方向、
そしてローリング等の振動がＸステージに全く伝わらな
いようにし、更にＹステージのピッチングのみが静圧空
気軸受を介して単にＸステージに伝わるようにし、速成
を極めて少なくし、これにより高精度の位置決めを可能
とした移動案内装置を達成している。(Effects of the Invention) According to the present invention, by specifying each element as described above, in particular, the vertical direction guidance of the X stage and the Y stage is made only by the surface plate surface, and the lateral direction guidance of the Y stage is made from the surface plate surface only. By using the above two wooden fixed guides and using the side of the Y stage to guide the X stage in the lateral direction, the moving load of the Y stage is eliminated, and the vertical direction, X axis direction,
In addition, vibrations such as rolling are not transmitted to the X stage at all, and only the pitching of the Y stage is transmitted to the X stage via the hydrostatic air bearing, thereby minimizing rapid build-up and achieving highly accurate positioning. We have achieved a moving guide device that makes it possible.
第１図〜第４図は本発明の第１の実施例の概略図であり
、第１図は斜視図、第２図は第１図のＡ−Ａ ’断面図
、第３図は第１図のＢ−Ｂ’断面図、第４図は裏面図、
第５図〜第７図は本発明の第２の実施例の概略図であり
、第５図、第６図は各々断面図、第７図は裏面図、第８
．第９図は従来の移動案内装置の要部概略図、第１０図
は振動モードの説明図である。
図中、１は定盤、２は横方向の固定ガイド、３ （３ａ
、３ｂ、３ｃ、３ｄ）は静圧空気軸受、４はＹステージ
、５はＸステージ、５ａは移動板、４ａ、４ｂは静圧空
気軸受取付板、４ｃ。
５Ｃは駆動アクチュエータ、４ｄは連結板、６は予圧用
磁石ユニットである。
特許出願人 キャノン株式会社1 to 4 are schematic diagrams of a first embodiment of the present invention, in which FIG. 1 is a perspective view, FIG. 2 is a sectional view taken along line A-A' in FIG. 1, and FIG. BB' sectional view in the figure, Figure 4 is a back view,
5 to 7 are schematic diagrams of a second embodiment of the present invention, in which FIGS. 5 and 6 are sectional views, FIG. 7 is a back view, and FIG.
．． FIG. 9 is a schematic diagram of the main parts of a conventional movement guide device, and FIG. 10 is an explanatory diagram of vibration modes. In the figure, 1 is a surface plate, 2 is a horizontal fixed guide, 3 (3a
, 3b, 3c, 3d) are static air bearings, 4 is a Y stage, 5 is an X stage, 5a is a moving plate, 4a, 4b is a static air bearing mounting plate, 4c. 5C is a drive actuator, 4d is a connecting plate, and 6 is a preload magnet unit. Patent applicant Canon Co., Ltd.
Claims (2)
ガイドと定盤との間を静圧空気軸受により第１の移動体
を該固定ガイドと平行に移動するように支持し、該第１
の移動体と該定盤との間を静圧空気軸受により第２の移
動体を該第１の移動体の移動方向と直角方向に移動する
ように支持した移動案内機構において、前記第１の移動
体の横方向の案内を該定盤上に設けた２つの固定ガイド
より行うと共に垂直方向の案内を該定盤により行い、前
記第２の移動体の横方向の案内を該第１の移動体より行
うと共に垂直方向の案内を該定盤により行ったことを特
徴とする移動案内装置。(1) Two fixed guides are arranged in parallel on a surface plate, and a first movable body is supported by a hydrostatic air bearing between the fixed guide and the surface plate so as to move parallel to the fixed guide; The first
In the movement guide mechanism, the second moving body is supported by a static air bearing between the moving body and the surface plate so as to move in a direction perpendicular to the moving direction of the first moving body. The movable body is guided in the lateral direction by two fixed guides provided on the surface plate, and the vertical direction is guided by the surface plate, and the lateral direction of the second movable body is guided by the first movement. 1. A moving guide device characterized in that guidance is performed from the body and in the vertical direction by the surface plate.
とそれらの垂直方向の重心点とが略一致するように構成
したことを特徴とする請求項１記載の移動案内装置。(2) The movement guide device according to claim 1, wherein the driving point of each of the first moving body and the second moving body and the vertical center of gravity thereof substantially coincide with each other. .
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63012137A JPH01188241A (en) | 1988-01-22 | 1988-01-22 | Shift guiding device |
| US07/299,340 US5040431A (en) | 1988-01-22 | 1989-01-23 | Movement guiding mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63012137A JPH01188241A (en) | 1988-01-22 | 1988-01-22 | Shift guiding device |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17738196A Division JP2921750B2 (en) | 1996-06-17 | 1996-06-17 | Travel guide device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01188241A true JPH01188241A (en) | 1989-07-27 |
Family
ID=11797126
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63012137A Pending JPH01188241A (en) | 1988-01-22 | 1988-01-22 | Shift guiding device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01188241A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5839324A (en) * | 1995-06-15 | 1998-11-24 | Nikon Corporation | Stage apparatus and exposure apparatus provided with the stage apparatus |
| US6342942B1 (en) | 1998-06-30 | 2002-01-29 | Canon Kabushiki Kaisha | Exposure apparatus, exposure control method, and device fabrication method using the exposure apparatus |
| US6462828B1 (en) | 1998-07-23 | 2002-10-08 | Canon Kabushiki Kaisha | Exposure apparatus |
| US6493062B2 (en) | 1998-04-08 | 2002-12-10 | Canon Kabushiki Kaisha | Driving apparatus and exposure apparatus |
| US6512571B2 (en) | 1998-04-30 | 2003-01-28 | Canon Kabushiki Kaisha | Anti-vibration system for exposure apparatus |
| US7944546B2 (en) | 2008-02-04 | 2011-05-17 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
| JP2016209965A (en) * | 2015-05-11 | 2016-12-15 | 東芝機械株式会社 | Machine tool |
| CN116972075A (en) * | 2023-09-20 | 2023-10-31 | 无锡星微科技有限公司杭州分公司 | Magnetic preloading structure and linear platform with same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60127932A (en) * | 1983-12-13 | 1985-07-08 | Omron Tateisi Electronics Co | Xy stage |
-
1988
- 1988-01-22 JP JP63012137A patent/JPH01188241A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60127932A (en) * | 1983-12-13 | 1985-07-08 | Omron Tateisi Electronics Co | Xy stage |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5839324A (en) * | 1995-06-15 | 1998-11-24 | Nikon Corporation | Stage apparatus and exposure apparatus provided with the stage apparatus |
| US6158298A (en) * | 1995-06-15 | 2000-12-12 | Nikon Corporation | Stage apparatus and exposure apparatus provided with the stage apparatus |
| US6493062B2 (en) | 1998-04-08 | 2002-12-10 | Canon Kabushiki Kaisha | Driving apparatus and exposure apparatus |
| US6512571B2 (en) | 1998-04-30 | 2003-01-28 | Canon Kabushiki Kaisha | Anti-vibration system for exposure apparatus |
| US6862077B2 (en) | 1998-04-30 | 2005-03-01 | Canon Kabushiki Kaisha | Anti-vibration system for exposure apparatus |
| US6342942B1 (en) | 1998-06-30 | 2002-01-29 | Canon Kabushiki Kaisha | Exposure apparatus, exposure control method, and device fabrication method using the exposure apparatus |
| US6462828B1 (en) | 1998-07-23 | 2002-10-08 | Canon Kabushiki Kaisha | Exposure apparatus |
| US7944546B2 (en) | 2008-02-04 | 2011-05-17 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
| JP2016209965A (en) * | 2015-05-11 | 2016-12-15 | 東芝機械株式会社 | Machine tool |
| CN116972075A (en) * | 2023-09-20 | 2023-10-31 | 无锡星微科技有限公司杭州分公司 | Magnetic preloading structure and linear platform with same |
| CN116972075B (en) * | 2023-09-20 | 2023-12-19 | 无锡星微科技有限公司杭州分公司 | Magnetic preloading structure and linear platform with same |
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