JPH0471008B2 - - Google Patents
Info
- Publication number
- JPH0471008B2 JPH0471008B2 JP3122885A JP3122885A JPH0471008B2 JP H0471008 B2 JPH0471008 B2 JP H0471008B2 JP 3122885 A JP3122885 A JP 3122885A JP 3122885 A JP3122885 A JP 3122885A JP H0471008 B2 JPH0471008 B2 JP H0471008B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- silane compound
- raw material
- disproportionation
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000006243 chemical reaction Methods 0.000 claims description 28
- 239000003054 catalyst Substances 0.000 claims description 13
- 238000007323 disproportionation reaction Methods 0.000 claims description 13
- 239000002994 raw material Substances 0.000 claims description 11
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 9
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims description 9
- 238000000926 separation method Methods 0.000 claims description 8
- DESGIDRJCLIWRS-UHFFFAOYSA-N [SiH]Cl Chemical compound [SiH]Cl DESGIDRJCLIWRS-UHFFFAOYSA-N 0.000 claims description 6
- 150000004756 silanes Chemical class 0.000 claims description 6
- 238000004821 distillation Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 238000011437 continuous method Methods 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims 6
- -1 silane compound Chemical class 0.000 claims 6
- 239000006227 byproduct Substances 0.000 claims 2
- 125000001309 chloro group Chemical group Cl* 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 238000000066 reactive distillation Methods 0.000 claims 2
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical class Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 11
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 10
- 239000005052 trichlorosilane Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 6
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 4
- 239000005046 Chlorosilane Substances 0.000 description 4
- 238000004817 gas chromatography Methods 0.000 description 4
- 239000005049 silicon tetrachloride Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 150000003512 tertiary amines Chemical class 0.000 description 3
- 239000003957 anion exchange resin Substances 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- 238000003541 multi-stage reaction Methods 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- ICSWLKDKQBNKAY-UHFFFAOYSA-N 1,1,3,3,5,5-hexamethyl-1,3,5-trisilinane Chemical compound C[Si]1(C)C[Si](C)(C)C[Si](C)(C)C1 ICSWLKDKQBNKAY-UHFFFAOYSA-N 0.000 description 1
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- YKFRUJSEPGHZFJ-UHFFFAOYSA-N N-trimethylsilylimidazole Chemical compound C[Si](C)(C)N1C=CN=C1 YKFRUJSEPGHZFJ-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- OAGOUCJGXNLJNL-UHFFFAOYSA-N dimethylcyanamide Chemical compound CN(C)C#N OAGOUCJGXNLJNL-UHFFFAOYSA-N 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N methylimidazole Natural products CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3122885A JPS61191513A (ja) | 1985-02-19 | 1985-02-19 | シラン化合物の連続的製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3122885A JPS61191513A (ja) | 1985-02-19 | 1985-02-19 | シラン化合物の連続的製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61191513A JPS61191513A (ja) | 1986-08-26 |
| JPH0471008B2 true JPH0471008B2 (de) | 1992-11-12 |
Family
ID=12325555
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3122885A Granted JPS61191513A (ja) | 1985-02-19 | 1985-02-19 | シラン化合物の連続的製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61191513A (de) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19860146A1 (de) | 1998-12-24 | 2000-06-29 | Bayer Ag | Verfahren und Anlage zur Herstellung von Silan |
| DE10017168A1 (de) * | 2000-04-07 | 2001-10-11 | Bayer Ag | Verfahren und Anlage zur Herstellung von Silan |
| DE102004045245B4 (de) * | 2004-09-17 | 2007-11-15 | Degussa Gmbh | Vorrichtung und Verfahren zur Herstellung von Silanen |
| DE102005046105B3 (de) * | 2005-09-27 | 2007-04-26 | Degussa Gmbh | Verfahren zur Herstellung von Monosilan |
| JP5419456B2 (ja) * | 2006-09-27 | 2014-02-19 | 電気化学工業株式会社 | モノシランの連続的製造方法 |
| CN101798085B (zh) * | 2010-04-21 | 2012-10-17 | 江苏扬农化工集团有限公司 | 硅化镁法硅烷的制备工艺 |
| EP2426089A1 (de) | 2010-09-03 | 2012-03-07 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Verfahren zur Spaltung von Monosilan aus einer chlorsilanreichen Mischung |
| EP2426088A1 (de) * | 2010-09-03 | 2012-03-07 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Verfahren zur Herstellung von Monosilan aus Dichlorsilan |
-
1985
- 1985-02-19 JP JP3122885A patent/JPS61191513A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61191513A (ja) | 1986-08-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| RU2368568C2 (ru) | Способ получения кремния | |
| US4610858A (en) | Chlorosilane disproportionation catalyst and method for producing a silane compound by means of the catalyst | |
| RU2503616C2 (ru) | Способ и система для получения чистого кремния | |
| US20100150809A1 (en) | enhancements for a chlorosilane redistribution reactor | |
| US20100296994A1 (en) | Catalyst and method for dismutation of halosilanes containing hydrogen | |
| JPH01283817A (ja) | Ｃｖｄ法による半導体シリコンの蒸着法 | |
| CN102264642B (zh) | 氯硅烷的制造方法 | |
| TWI755148B (zh) | 從氯矽烷混合物中除去雜質的方法 | |
| KR20150119084A (ko) | 트리클로로실란의 제조 방법 | |
| JPH0471008B2 (de) | ||
| CN102481491A (zh) | 用于制备甲硅烷的方法和设备 | |
| US8404205B2 (en) | Apparatus and method for producing polycrystalline silicon having a reduced amount of boron compounds by forming phosphorus-boron compounds | |
| JPS641406B2 (de) | ||
| CN209522583U (zh) | 乙硅烷制备装置 | |
| CN108862282A (zh) | 乙硅烷的制备方法 | |
| JPS643804B2 (de) | ||
| CN115023407A (zh) | 用于从氯硅烷混合物中除去杂质的方法 | |
| US3980686A (en) | Process for the preparation of chlorosilane | |
| US20240182497A1 (en) | Method and system for selective recovery of monochlorosilane and dichlorosilane in polysilicon production process | |
| JPH0472764B2 (de) | ||
| JPH0470249B2 (de) | ||
| JPS6333422B2 (de) | ||
| TWI853194B (zh) | 從氯矽烷混合物中除去雜質的方法 | |
| EP0213215B2 (de) | Katalysator zur Disproportionierung von Chlorosilanen und Verfahren zur Herstellung von Silanverbindungen mittels des Katalysators | |
| JPS59121110A (ja) | シラン化合物の連続的製法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |