JPH0470335B2 - - Google Patents
Info
- Publication number
- JPH0470335B2 JPH0470335B2 JP61221520A JP22152086A JPH0470335B2 JP H0470335 B2 JPH0470335 B2 JP H0470335B2 JP 61221520 A JP61221520 A JP 61221520A JP 22152086 A JP22152086 A JP 22152086A JP H0470335 B2 JPH0470335 B2 JP H0470335B2
- Authority
- JP
- Japan
- Prior art keywords
- ammonia
- methyltrialkoxysilane
- prepolymer
- layer
- partially hydrolyzed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 40
- 238000003756 stirring Methods 0.000 claims description 31
- 239000000843 powder Substances 0.000 claims description 28
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 claims description 24
- 239000007864 aqueous solution Substances 0.000 claims description 22
- 150000001412 amines Chemical class 0.000 claims description 20
- 229910021529 ammonia Inorganic materials 0.000 claims description 19
- 239000002245 particle Substances 0.000 claims description 18
- 239000003960 organic solvent Substances 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000000243 solution Substances 0.000 claims description 6
- 238000009826 distribution Methods 0.000 claims description 4
- 239000011259 mixed solution Substances 0.000 claims description 4
- 239000012046 mixed solvent Substances 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 3
- 239000002244 precipitate Substances 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- 238000001556 precipitation Methods 0.000 claims 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 13
- 238000006460 hydrolysis reaction Methods 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 12
- 238000006482 condensation reaction Methods 0.000 description 11
- 230000007062 hydrolysis Effects 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000012670 alkaline solution Substances 0.000 description 8
- 125000001309 chloro group Chemical group Cl* 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000005055 methyl trichlorosilane Substances 0.000 description 4
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 230000003301 hydrolyzing effect Effects 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010406 interfacial reaction Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- RJMRIDVWCWSWFR-UHFFFAOYSA-N methyl(tripropoxy)silane Chemical compound CCCO[Si](C)(OCCC)OCCC RJMRIDVWCWSWFR-UHFFFAOYSA-N 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- GYZQBXUDWTVJDF-UHFFFAOYSA-N tributoxy(methyl)silane Chemical compound CCCCO[Si](C)(OCCCC)OCCCC GYZQBXUDWTVJDF-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Silicon Polymers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22152086A JPS6377940A (ja) | 1986-09-19 | 1986-09-19 | 真球状ポリメチルシルセスキオキサン粉末およびその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22152086A JPS6377940A (ja) | 1986-09-19 | 1986-09-19 | 真球状ポリメチルシルセスキオキサン粉末およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6377940A JPS6377940A (ja) | 1988-04-08 |
| JPH0470335B2 true JPH0470335B2 (zh) | 1992-11-10 |
Family
ID=16767996
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22152086A Granted JPS6377940A (ja) | 1986-09-19 | 1986-09-19 | 真球状ポリメチルシルセスキオキサン粉末およびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6377940A (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008147072A1 (en) | 2007-05-28 | 2008-12-04 | Kolon Industries, Inc. | Polyalkylsilsesquioxane particulates and a preparation method thereof |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0618879B2 (ja) * | 1988-02-26 | 1994-03-16 | 東芝シリコーン株式会社 | ポリオルガノシルセスキオキサン微粒子 |
| JP2562656B2 (ja) * | 1988-04-14 | 1996-12-11 | 日本化学工業株式会社 | 化粧料 |
| JP2532124B2 (ja) * | 1988-04-19 | 1996-09-11 | 東芝シリコーン株式会社 | 海棲生物付着防止剤 |
| JP2607118B2 (ja) * | 1988-04-19 | 1997-05-07 | 日本化学工業株式会社 | 球状有機珪酸および球状シリカ粉末の製造法 |
| JPH0725727A (ja) * | 1993-07-12 | 1995-01-27 | Toshiba Silicone Co Ltd | 複合球状粉体およびそれを含む化粧料 |
| US5683501A (en) * | 1993-11-09 | 1997-11-04 | Nippon Shokubai Co., Ltd. | Compound fine particles and composition for forming film |
| JP3970453B2 (ja) * | 1998-12-14 | 2007-09-05 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | シリコーン微粒子の製造方法 |
| JP3970449B2 (ja) * | 1998-12-21 | 2007-09-05 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | 球状ポリメチルシルセスキオキサン微粒子の製造方法 |
| JP2003002973A (ja) * | 2001-04-18 | 2003-01-08 | Ge Toshiba Silicones Co Ltd | 球状シリコーン微粒子の製造方法 |
| JP2003183395A (ja) * | 2001-12-21 | 2003-07-03 | Ge Toshiba Silicones Co Ltd | 球状シリコーン微粒子の製造方法 |
| DE10320318A1 (de) | 2003-05-06 | 2004-12-02 | Röhm GmbH & Co. KG | Verfahren zur Herstellung von lichtstreuenden Formteilen mit hervorragenden optischen Eigenschaften |
| DE10336130A1 (de) | 2003-08-04 | 2005-02-24 | Röhm GmbH & Co. KG | Streuscheibe für LCD-Anwendungen, Verfahren zu deren Herstellung und Verwendung |
| DE10336129A1 (de) | 2003-08-04 | 2005-02-24 | Röhm GmbH & Co. KG | Kratzunempfindlicher Rückprojektionsschirm und Verfahren zu dessen Herstellung |
| JP4883967B2 (ja) * | 2005-09-26 | 2012-02-22 | 日揮触媒化成株式会社 | 多孔質シリカ系粒子の製造方法および該方法から得られる多孔質シリカ系粒子 |
| KR100756676B1 (ko) * | 2006-11-23 | 2007-09-07 | 제일모직주식회사 | 실리콘계 미립자, 그 제조 방법, 및 그 미립자가 함유된열가소성 수지 조성물 |
| JP5273941B2 (ja) * | 2007-04-24 | 2013-08-28 | コルコート株式会社 | ポリヘドラルシルセスキオキサンの製造方法 |
| JP4936563B2 (ja) * | 2008-11-26 | 2012-05-23 | 竹本油脂株式会社 | 高分子材料用表面改質剤 |
| JP5582734B2 (ja) * | 2009-06-26 | 2014-09-03 | 日揮触媒化成株式会社 | ポリオルガノシロキサン粒子の製造方法 |
| EP2311844A1 (en) * | 2009-10-15 | 2011-04-20 | Interquim, S.A. | Silyl polymeric benzoic acid ester compounds, uses, and compositions thereof |
| EP2537899B1 (en) | 2010-02-19 | 2014-11-26 | Toray Industries, Inc. | Phosphor-containing cured silicone, process for production of same, phosphor-containing silicone composition, precursor of the composition, sheet-shaped moldings, led package, light -emitting device, and process for production of led-mounted substrate |
| EP2943046A1 (en) | 2010-12-13 | 2015-11-11 | Toray Industries, Inc. | Phosphor sheet, led and light emitting device using same and method for producing led |
| DE102012216081A1 (de) | 2012-09-11 | 2013-03-14 | Evonik Industries Ag | Verfahren zur Herstellung von lichtstreuenden Formteilen mit hervorragenden optischen Eigenschaften und deren Verwendung |
| JP5804568B2 (ja) | 2012-09-27 | 2015-11-04 | 信越化学工業株式会社 | シリコーンミスト抑制剤 |
| WO2014065358A1 (ja) | 2012-10-25 | 2014-05-01 | 東レ株式会社 | 蛍光体含有樹脂シートおよび発光装置 |
| EP2941453B1 (en) | 2013-01-03 | 2019-07-17 | Shin-Etsu Chemical Co., Ltd. | Hydrophilized silicone particles and making method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6013813A (ja) * | 1983-07-05 | 1985-01-24 | Toshiba Silicone Co Ltd | ポリメチルシルセスキオキサンの製造方法 |
| JPS61108628A (ja) * | 1984-11-01 | 1986-05-27 | Fujitsu Ltd | 低級アルキルポリシルセスキオキサンの製法 |
-
1986
- 1986-09-19 JP JP22152086A patent/JPS6377940A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6013813A (ja) * | 1983-07-05 | 1985-01-24 | Toshiba Silicone Co Ltd | ポリメチルシルセスキオキサンの製造方法 |
| JPS61108628A (ja) * | 1984-11-01 | 1986-05-27 | Fujitsu Ltd | 低級アルキルポリシルセスキオキサンの製法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008147072A1 (en) | 2007-05-28 | 2008-12-04 | Kolon Industries, Inc. | Polyalkylsilsesquioxane particulates and a preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6377940A (ja) | 1988-04-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |