JPH0468625B2 - - Google Patents

Info

Publication number
JPH0468625B2
JPH0468625B2 JP61056699A JP5669986A JPH0468625B2 JP H0468625 B2 JPH0468625 B2 JP H0468625B2 JP 61056699 A JP61056699 A JP 61056699A JP 5669986 A JP5669986 A JP 5669986A JP H0468625 B2 JPH0468625 B2 JP H0468625B2
Authority
JP
Japan
Prior art keywords
film
positioning pin
exposure
base
printed wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61056699A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62212658A (ja
Inventor
Hiromi Umeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tamura Corp
Original Assignee
Tamura Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tamura Corp filed Critical Tamura Corp
Priority to JP61056699A priority Critical patent/JPS62212658A/ja
Publication of JPS62212658A publication Critical patent/JPS62212658A/ja
Publication of JPH0468625B2 publication Critical patent/JPH0468625B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61056699A 1986-03-14 1986-03-14 基板露光用フイルムの位置決めピン穴形成方法 Granted JPS62212658A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61056699A JPS62212658A (ja) 1986-03-14 1986-03-14 基板露光用フイルムの位置決めピン穴形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61056699A JPS62212658A (ja) 1986-03-14 1986-03-14 基板露光用フイルムの位置決めピン穴形成方法

Publications (2)

Publication Number Publication Date
JPS62212658A JPS62212658A (ja) 1987-09-18
JPH0468625B2 true JPH0468625B2 (enrdf_load_html_response) 1992-11-02

Family

ID=13034712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61056699A Granted JPS62212658A (ja) 1986-03-14 1986-03-14 基板露光用フイルムの位置決めピン穴形成方法

Country Status (1)

Country Link
JP (1) JPS62212658A (enrdf_load_html_response)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56168650A (en) * 1980-05-30 1981-12-24 Dainippon Printing Co Ltd Method for affixing of film negative

Also Published As

Publication number Publication date
JPS62212658A (ja) 1987-09-18

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