JPH0461072B2 - - Google Patents
Info
- Publication number
- JPH0461072B2 JPH0461072B2 JP57158625A JP15862582A JPH0461072B2 JP H0461072 B2 JPH0461072 B2 JP H0461072B2 JP 57158625 A JP57158625 A JP 57158625A JP 15862582 A JP15862582 A JP 15862582A JP H0461072 B2 JPH0461072 B2 JP H0461072B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- ions
- sheet
- discharge
- sheet plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma Technology (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57158625A JPS5947381A (ja) | 1982-09-10 | 1982-09-10 | シートプラズマを利用したイオン打込み方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57158625A JPS5947381A (ja) | 1982-09-10 | 1982-09-10 | シートプラズマを利用したイオン打込み方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5947381A JPS5947381A (ja) | 1984-03-17 |
JPH0461072B2 true JPH0461072B2 (enrdf_load_stackoverflow) | 1992-09-29 |
Family
ID=15675793
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57158625A Granted JPS5947381A (ja) | 1982-09-10 | 1982-09-10 | シートプラズマを利用したイオン打込み方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5947381A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2545369B2 (ja) * | 1986-08-19 | 1996-10-16 | 株式会社 ト−ビ | シ−トプラズマ・イオンプレ−テイング方法とその装置 |
JPH0762244B2 (ja) * | 1991-03-19 | 1995-07-05 | 株式会社ライムズ | イオンプレーティングによる成膜方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS493847A (enrdf_load_stackoverflow) * | 1972-05-04 | 1974-01-14 | ||
JPS55100975A (en) * | 1979-01-23 | 1980-08-01 | Citizen Watch Co Ltd | Hcd type ion plating device |
-
1982
- 1982-09-10 JP JP57158625A patent/JPS5947381A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5947381A (ja) | 1984-03-17 |
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