JPS5947381A - シートプラズマを利用したイオン打込み方法 - Google Patents

シートプラズマを利用したイオン打込み方法

Info

Publication number
JPS5947381A
JPS5947381A JP57158625A JP15862582A JPS5947381A JP S5947381 A JPS5947381 A JP S5947381A JP 57158625 A JP57158625 A JP 57158625A JP 15862582 A JP15862582 A JP 15862582A JP S5947381 A JPS5947381 A JP S5947381A
Authority
JP
Japan
Prior art keywords
ions
implantation
substrate
large area
sheet plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57158625A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0461072B2 (enrdf_load_stackoverflow
Inventor
Joshin Uramoto
上進 浦本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP57158625A priority Critical patent/JPS5947381A/ja
Publication of JPS5947381A publication Critical patent/JPS5947381A/ja
Publication of JPH0461072B2 publication Critical patent/JPH0461072B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
JP57158625A 1982-09-10 1982-09-10 シートプラズマを利用したイオン打込み方法 Granted JPS5947381A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57158625A JPS5947381A (ja) 1982-09-10 1982-09-10 シートプラズマを利用したイオン打込み方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57158625A JPS5947381A (ja) 1982-09-10 1982-09-10 シートプラズマを利用したイオン打込み方法

Publications (2)

Publication Number Publication Date
JPS5947381A true JPS5947381A (ja) 1984-03-17
JPH0461072B2 JPH0461072B2 (enrdf_load_stackoverflow) 1992-09-29

Family

ID=15675793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57158625A Granted JPS5947381A (ja) 1982-09-10 1982-09-10 シートプラズマを利用したイオン打込み方法

Country Status (1)

Country Link
JP (1) JPS5947381A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6350464A (ja) * 1986-08-19 1988-03-03 Toobi:Kk シ−トプラズマ・イオンプレ−テイング方法とその装置
JPH04289164A (ja) * 1991-03-19 1992-10-14 Limes:Kk イオンプレーティングによる成膜方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS493847A (enrdf_load_stackoverflow) * 1972-05-04 1974-01-14
JPS55100975A (en) * 1979-01-23 1980-08-01 Citizen Watch Co Ltd Hcd type ion plating device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS493847A (enrdf_load_stackoverflow) * 1972-05-04 1974-01-14
JPS55100975A (en) * 1979-01-23 1980-08-01 Citizen Watch Co Ltd Hcd type ion plating device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6350464A (ja) * 1986-08-19 1988-03-03 Toobi:Kk シ−トプラズマ・イオンプレ−テイング方法とその装置
JPH04289164A (ja) * 1991-03-19 1992-10-14 Limes:Kk イオンプレーティングによる成膜方法

Also Published As

Publication number Publication date
JPH0461072B2 (enrdf_load_stackoverflow) 1992-09-29

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