JPH0459736B2 - - Google Patents
Info
- Publication number
- JPH0459736B2 JPH0459736B2 JP63072149A JP7214988A JPH0459736B2 JP H0459736 B2 JPH0459736 B2 JP H0459736B2 JP 63072149 A JP63072149 A JP 63072149A JP 7214988 A JP7214988 A JP 7214988A JP H0459736 B2 JPH0459736 B2 JP H0459736B2
- Authority
- JP
- Japan
- Prior art keywords
- secondary electrons
- foil
- chamber
- cathode
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011888 foil Substances 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 28
- 150000002500 ions Chemical class 0.000 claims description 27
- 238000010894 electron beam technology Methods 0.000 claims description 17
- 238000000605 extraction Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 5
- 230000005686 electrostatic field Effects 0.000 claims description 3
- 230000008093 supporting effect Effects 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims 1
- 239000003990 capacitor Substances 0.000 description 21
- 230000002459 sustained effect Effects 0.000 description 13
- 238000004804 winding Methods 0.000 description 13
- 230000010354 integration Effects 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 239000001307 helium Substances 0.000 description 7
- 229910052734 helium Inorganic materials 0.000 description 7
- 230000005684 electric field Effects 0.000 description 5
- -1 helium ions Chemical class 0.000 description 5
- 230000007704 transition Effects 0.000 description 5
- 238000012544 monitoring process Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/024—Electron guns using thermionic emission of cathode heated by electron or ion bombardment or by irradiation by other energetic beams, e.g. by laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/031,618 US4786844A (en) | 1987-03-30 | 1987-03-30 | Wire ion plasma gun |
| US31618 | 1987-03-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63279542A JPS63279542A (ja) | 1988-11-16 |
| JPH0459736B2 true JPH0459736B2 (sv) | 1992-09-24 |
Family
ID=21860468
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63072149A Granted JPS63279542A (ja) | 1987-03-30 | 1988-03-28 | イオンプラズマ電子銃組立体 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4786844A (sv) |
| JP (1) | JPS63279542A (sv) |
| DE (1) | DE3810293A1 (sv) |
| FR (1) | FR2615324B1 (sv) |
| GB (1) | GB2203889B (sv) |
| SE (1) | SE469810B (sv) |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5594446A (en) * | 1988-01-28 | 1997-01-14 | Sri International | Broadband electromagnetic absorption via a collisional helium plasma |
| US5003178A (en) * | 1988-11-14 | 1991-03-26 | Electron Vision Corporation | Large-area uniform electron source |
| DE4127504A1 (de) * | 1991-08-20 | 1993-02-25 | Leybold Ag | Einrichtung zur unterdrueckung von lichtboegen |
| US5801387A (en) * | 1996-03-28 | 1998-09-01 | Electron Processing Systems, Inc. | Method of and apparatus for the electron beam treatment of powders and aggregates in pneumatic transfer |
| DE19621874C2 (de) * | 1996-05-31 | 2000-10-12 | Karlsruhe Forschzent | Quelle zur Erzeugung von großflächigen, gepulsten Ionen- und Elektronenstrahlen |
| US5962995A (en) † | 1997-01-02 | 1999-10-05 | Applied Advanced Technologies, Inc. | Electron beam accelerator |
| US20020127156A1 (en) * | 1998-11-05 | 2002-09-12 | Taylor Charles E. | Electro-kinetic air transporter-conditioner devices with enhanced collector electrode |
| US6176977B1 (en) | 1998-11-05 | 2001-01-23 | Sharper Image Corporation | Electro-kinetic air transporter-conditioner |
| US6632407B1 (en) | 1998-11-05 | 2003-10-14 | Sharper Image Corporation | Personal electro-kinetic air transporter-conditioner |
| US6911186B2 (en) * | 1998-11-05 | 2005-06-28 | Sharper Image Corporation | Electro-kinetic air transporter and conditioner device with enhanced housing configuration and enhanced anti-microorganism capability |
| US6544485B1 (en) * | 2001-01-29 | 2003-04-08 | Sharper Image Corporation | Electro-kinetic device with enhanced anti-microorganism capability |
| US7695690B2 (en) | 1998-11-05 | 2010-04-13 | Tessera, Inc. | Air treatment apparatus having multiple downstream electrodes |
| US20030206837A1 (en) | 1998-11-05 | 2003-11-06 | Taylor Charles E. | Electro-kinetic air transporter and conditioner device with enhanced maintenance features and enhanced anti-microorganism capability |
| US6350417B1 (en) | 1998-11-05 | 2002-02-26 | Sharper Image Corporation | Electrode self-cleaning mechanism for electro-kinetic air transporter-conditioner devices |
| US20050210902A1 (en) | 2004-02-18 | 2005-09-29 | Sharper Image Corporation | Electro-kinetic air transporter and/or conditioner devices with features for cleaning emitter electrodes |
| US20020146356A1 (en) * | 1998-11-05 | 2002-10-10 | Sinaiko Robert J. | Dual input and outlet electrostatic air transporter-conditioner |
| US6974560B2 (en) | 1998-11-05 | 2005-12-13 | Sharper Image Corporation | Electro-kinetic air transporter and conditioner device with enhanced anti-microorganism capability |
| US20020155041A1 (en) * | 1998-11-05 | 2002-10-24 | Mckinney Edward C. | Electro-kinetic air transporter-conditioner with non-equidistant collector electrodes |
| CA2395517C (en) * | 1999-12-24 | 2009-09-22 | Zenion Industries, Inc. | Method and apparatus for reducing ozone output from ion wind devices |
| US6496529B1 (en) | 2000-11-15 | 2002-12-17 | Ati Properties, Inc. | Refining and casting apparatus and method |
| US8891583B2 (en) | 2000-11-15 | 2014-11-18 | Ati Properties, Inc. | Refining and casting apparatus and method |
| US7056370B2 (en) | 2002-06-20 | 2006-06-06 | Sharper Image Corporation | Electrode self-cleaning mechanism for air conditioner devices |
| US6749667B2 (en) | 2002-06-20 | 2004-06-15 | Sharper Image Corporation | Electrode self-cleaning mechanism for electro-kinetic air transporter-conditioner devices |
| US6984987B2 (en) | 2003-06-12 | 2006-01-10 | Sharper Image Corporation | Electro-kinetic air transporter and conditioner devices with enhanced arching detection and suppression features |
| US7724492B2 (en) | 2003-09-05 | 2010-05-25 | Tessera, Inc. | Emitter electrode having a strip shape |
| US7906080B1 (en) | 2003-09-05 | 2011-03-15 | Sharper Image Acquisition Llc | Air treatment apparatus having a liquid holder and a bipolar ionization device |
| US7767169B2 (en) | 2003-12-11 | 2010-08-03 | Sharper Image Acquisition Llc | Electro-kinetic air transporter-conditioner system and method to oxidize volatile organic compounds |
| US7695590B2 (en) | 2004-03-26 | 2010-04-13 | Applied Materials, Inc. | Chemical vapor deposition plasma reactor having plural ion shower grids |
| US8058156B2 (en) * | 2004-07-20 | 2011-11-15 | Applied Materials, Inc. | Plasma immersion ion implantation reactor having multiple ion shower grids |
| US7767561B2 (en) | 2004-07-20 | 2010-08-03 | Applied Materials, Inc. | Plasma immersion ion implantation reactor having an ion shower grid |
| US20060018809A1 (en) | 2004-07-23 | 2006-01-26 | Sharper Image Corporation | Air conditioner device with removable driver electrodes |
| US7578960B2 (en) * | 2005-09-22 | 2009-08-25 | Ati Properties, Inc. | Apparatus and method for clean, rapidly solidified alloys |
| US7803212B2 (en) | 2005-09-22 | 2010-09-28 | Ati Properties, Inc. | Apparatus and method for clean, rapidly solidified alloys |
| US7803211B2 (en) | 2005-09-22 | 2010-09-28 | Ati Properties, Inc. | Method and apparatus for producing large diameter superalloy ingots |
| US7833322B2 (en) | 2006-02-28 | 2010-11-16 | Sharper Image Acquisition Llc | Air treatment apparatus having a voltage control device responsive to current sensing |
| KR101520241B1 (ko) * | 2007-03-30 | 2015-05-21 | 에이티아이 프로퍼티즈, 인코퍼레이티드 | 와이어방전 이온 플라즈마 전자 방출기를 포함하는 용융 퍼니스 |
| US8748773B2 (en) * | 2007-03-30 | 2014-06-10 | Ati Properties, Inc. | Ion plasma electron emitters for a melting furnace |
| US7798199B2 (en) | 2007-12-04 | 2010-09-21 | Ati Properties, Inc. | Casting apparatus and method |
| FR2926395B1 (fr) * | 2008-01-11 | 2010-05-14 | Excico Group | Source pulsee d'electrons, procede d'alimentation electrique pour source pulsee d'electrons et procede de commande d'une source pulsee d'electrons |
| DE602008002138D1 (de) * | 2008-01-11 | 2010-09-23 | Excico Group N V | Vorrichtung und Verfahren zur Stromversorgung einer Elektronenquelle und Elektronenquelle mit Sekundäremission unter Ionenbombardierung |
| US8747956B2 (en) | 2011-08-11 | 2014-06-10 | Ati Properties, Inc. | Processes, systems, and apparatus for forming products from atomized metals and alloys |
| US9978568B2 (en) | 2013-08-12 | 2018-05-22 | Tokyo Electron Limited | Self-sustained non-ambipolar direct current (DC) plasma at low power |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3243570A (en) * | 1963-04-30 | 1966-03-29 | Gen Electric | Automatic gas pressure control for electron beam apparatus |
| US3411035A (en) * | 1966-05-31 | 1968-11-12 | Gen Electric | Multi-chamber hollow cathode low voltage electron beam apparatus |
| US3903891A (en) * | 1968-01-12 | 1975-09-09 | Hogle Kearns Int | Method and apparatus for generating plasma |
| DE2246300A1 (de) * | 1972-08-16 | 1974-02-28 | Lonza Ag | Plasmabrenner |
| JPS49112565A (sv) * | 1973-02-23 | 1974-10-26 | ||
| US3863163A (en) * | 1973-04-20 | 1975-01-28 | Sherman R Farrell | Broad beam electron gun |
| US4019091A (en) * | 1974-05-30 | 1977-04-19 | U.S. Philips Corporation | Gas discharge electron gun for generating an electron beam by means of a glow discharge |
| US3970892A (en) * | 1975-05-19 | 1976-07-20 | Hughes Aircraft Company | Ion plasma electron gun |
| US4061944A (en) * | 1975-06-25 | 1977-12-06 | Avco Everett Research Laboratory, Inc. | Electron beam window structure for broad area electron beam generators |
| US4025818A (en) * | 1976-04-20 | 1977-05-24 | Hughes Aircraft Company | Wire ion plasma electron gun |
| DE2656314A1 (de) * | 1976-12-11 | 1978-06-15 | Leybold Heraeus Gmbh & Co Kg | Stromversorgungseinrichtung fuer elektronenstrahlkanonen |
| US4359667A (en) * | 1980-11-10 | 1982-11-16 | The United States Of America As Represented By The Department Of Energy | Convectively cooled electrical grid structure |
| US4458180A (en) * | 1982-02-18 | 1984-07-03 | Elscint Ltd. | Plasma electron source for cold-cathode discharge device or the like |
| US4570106A (en) * | 1982-02-18 | 1986-02-11 | Elscint, Inc. | Plasma electron source for cold-cathode discharge device or the like |
| DE3376921D1 (en) * | 1982-09-10 | 1988-07-07 | Nippon Telegraph & Telephone | Ion shower apparatus |
| US4694222A (en) * | 1984-04-02 | 1987-09-15 | Rpc Industries | Ion plasma electron gun |
| US4645978A (en) * | 1984-06-18 | 1987-02-24 | Hughes Aircraft Company | Radial geometry electron beam controlled switch utilizing wire-ion-plasma electron source |
| US4642522A (en) * | 1984-06-18 | 1987-02-10 | Hughes Aircraft Company | Wire-ion-plasma electron gun employing auxiliary grid |
| FR2591035B1 (fr) * | 1985-11-29 | 1988-02-26 | Onera (Off Nat Aerospatiale) | Canon a electrons operant par emission secondaire sous bombardement ionique |
-
1987
- 1987-03-30 US US07/031,618 patent/US4786844A/en not_active Expired - Fee Related
-
1988
- 1988-03-23 GB GB8806912A patent/GB2203889B/en not_active Expired - Fee Related
- 1988-03-25 DE DE3810293A patent/DE3810293A1/de not_active Withdrawn
- 1988-03-28 SE SE8801144A patent/SE469810B/sv not_active IP Right Cessation
- 1988-03-28 JP JP63072149A patent/JPS63279542A/ja active Granted
- 1988-03-29 FR FR888804080A patent/FR2615324B1/fr not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| SE8801144L (sv) | 1988-10-01 |
| SE469810B (sv) | 1993-09-13 |
| GB2203889A (en) | 1988-10-26 |
| JPS63279542A (ja) | 1988-11-16 |
| US4786844A (en) | 1988-11-22 |
| GB8806912D0 (en) | 1988-04-27 |
| SE8801144D0 (sv) | 1988-03-28 |
| FR2615324B1 (fr) | 1991-01-04 |
| GB2203889B (en) | 1991-12-04 |
| FR2615324A1 (fr) | 1988-11-18 |
| DE3810293A1 (de) | 1988-10-13 |
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