JPH045940B2 - - Google Patents

Info

Publication number
JPH045940B2
JPH045940B2 JP57062435A JP6243582A JPH045940B2 JP H045940 B2 JPH045940 B2 JP H045940B2 JP 57062435 A JP57062435 A JP 57062435A JP 6243582 A JP6243582 A JP 6243582A JP H045940 B2 JPH045940 B2 JP H045940B2
Authority
JP
Japan
Prior art keywords
pattern
defect
signal
circuit
inspected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57062435A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58180933A (ja
Inventor
Haruo Yoda
Yutaka Sako
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57062435A priority Critical patent/JPS58180933A/ja
Publication of JPS58180933A publication Critical patent/JPS58180933A/ja
Publication of JPH045940B2 publication Critical patent/JPH045940B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Input (AREA)
JP57062435A 1982-04-16 1982-04-16 パタ−ン欠陥検査装置 Granted JPS58180933A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57062435A JPS58180933A (ja) 1982-04-16 1982-04-16 パタ−ン欠陥検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57062435A JPS58180933A (ja) 1982-04-16 1982-04-16 パタ−ン欠陥検査装置

Publications (2)

Publication Number Publication Date
JPS58180933A JPS58180933A (ja) 1983-10-22
JPH045940B2 true JPH045940B2 (enrdf_load_stackoverflow) 1992-02-04

Family

ID=13200099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57062435A Granted JPS58180933A (ja) 1982-04-16 1982-04-16 パタ−ン欠陥検査装置

Country Status (1)

Country Link
JP (1) JPS58180933A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01239439A (ja) * 1988-03-18 1989-09-25 Fuji Photo Film Co Ltd 表面検査装置
JP6408654B1 (ja) * 2017-06-16 2018-10-17 株式会社オプトン 検査装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS525543A (en) * 1975-07-02 1977-01-17 Canon Inc Optical scanning device
JPS5327477A (en) * 1976-08-26 1978-03-14 Agency Of Ind Science & Technol Defect detection of material su rface

Also Published As

Publication number Publication date
JPS58180933A (ja) 1983-10-22

Similar Documents

Publication Publication Date Title
US7853068B2 (en) Pattern defect inspection method and apparatus
JP3132565B2 (ja) 欠陥検査方法及びその装置
US6347150B1 (en) Method and system for inspecting a pattern
JP4776308B2 (ja) 画像欠陥検査装置、画像欠陥検査システム、欠陥分類装置及び画像欠陥検査方法
JPH0160767B2 (enrdf_load_stackoverflow)
JP4230880B2 (ja) 欠陥検査方法
JPH0526136B2 (enrdf_load_stackoverflow)
JP5357572B2 (ja) 外観検査方法および外観検査装置
JP2006138708A (ja) 画像欠陥検査方法、画像欠陥検査装置及び外観検査装置
JP2007147407A (ja) 外観検査方法
JPH10135287A (ja) ウエーハ検査装置および検査方法
JPH045940B2 (enrdf_load_stackoverflow)
JP2710527B2 (ja) 周期性パターンの検査装置
US6603875B1 (en) Pattern inspection method, pattern inspection apparatus, and recording medium which records pattern inspection program
JP2002303588A (ja) パターン欠陥検査装置
JP2003270168A (ja) 欠陥検査方法及び半導体装置の製造方法
JP3283866B2 (ja) 回路パターンの欠陥検査方法及びその装置
JP3391163B2 (ja) 円形容器内面検査装置
JP2765339B2 (ja) スルーホール検査装置
JP2003288583A (ja) 画像処理を用いた不良箇所検出方法
JP3400797B2 (ja) 回路パターンの欠陥検査方法及びその装置
JP2002032736A (ja) 欠陥検査方法及び装置
JPH0644281B2 (ja) パターン欠陥検査装置
JP2001351095A (ja) 欠陥検査方法
JPH02187652A (ja) 画像処理方法