JPH0526136B2 - - Google Patents

Info

Publication number
JPH0526136B2
JPH0526136B2 JP58065420A JP6542083A JPH0526136B2 JP H0526136 B2 JPH0526136 B2 JP H0526136B2 JP 58065420 A JP58065420 A JP 58065420A JP 6542083 A JP6542083 A JP 6542083A JP H0526136 B2 JPH0526136 B2 JP H0526136B2
Authority
JP
Japan
Prior art keywords
inspected
pattern
defect inspection
repeating pattern
digital signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58065420A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59192943A (ja
Inventor
Haruo Yoda
Yozo Oochi
Yutaka Sako
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58065420A priority Critical patent/JPS59192943A/ja
Publication of JPS59192943A publication Critical patent/JPS59192943A/ja
Publication of JPH0526136B2 publication Critical patent/JPH0526136B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Closed-Circuit Television Systems (AREA)
  • Image Analysis (AREA)
JP58065420A 1983-04-15 1983-04-15 繰返しパタ−ンの欠陥検査装置 Granted JPS59192943A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58065420A JPS59192943A (ja) 1983-04-15 1983-04-15 繰返しパタ−ンの欠陥検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58065420A JPS59192943A (ja) 1983-04-15 1983-04-15 繰返しパタ−ンの欠陥検査装置

Related Child Applications (5)

Application Number Title Priority Date Filing Date
JP4325193A Division JPH05264466A (ja) 1992-12-04 1992-12-04 繰返しパターンの欠陥検査装置
JP4325192A Division JPH0795041B2 (ja) 1992-12-04 1992-12-04 繰返しパターンの欠陥検査装置
JP4325194A Division JPH0795042B2 (ja) 1992-12-04 1992-12-04 繰返しパターンの欠陥検査装置
JP4325191A Division JPH05264464A (ja) 1992-12-04 1992-12-04 繰返しパターンの欠陥検査装置
JP7231022A Division JP2561050B2 (ja) 1995-09-08 1995-09-08 繰返しパターンの欠陥検査装置

Publications (2)

Publication Number Publication Date
JPS59192943A JPS59192943A (ja) 1984-11-01
JPH0526136B2 true JPH0526136B2 (enrdf_load_stackoverflow) 1993-04-15

Family

ID=13286543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58065420A Granted JPS59192943A (ja) 1983-04-15 1983-04-15 繰返しパタ−ンの欠陥検査装置

Country Status (1)

Country Link
JP (1) JPS59192943A (enrdf_load_stackoverflow)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0713598B2 (ja) * 1985-05-09 1995-02-15 大日本印刷株式会社 周期性パタ−ンの欠陥検査方法
JPH0781956B2 (ja) * 1985-10-16 1995-09-06 株式会社日立製作所 半導体用基板上の異物検出装置
JPS62220843A (ja) * 1986-03-20 1987-09-29 Nec Corp 印刷物の検査装置
JPH0678990B2 (ja) * 1987-11-16 1994-10-05 株式会社日立製作所 異物検出方法及びその装置
JP2667416B2 (ja) * 1987-12-28 1997-10-27 レーザーテック株式会社 パターン欠陥検査方法
JPH036982A (ja) * 1989-06-02 1991-01-14 Nireco Corp 走行体の静止画像位置決め方法および装置
JP3187827B2 (ja) * 1989-12-20 2001-07-16 株式会社日立製作所 パターン検査方法および装置
JP3148353B2 (ja) * 1991-05-30 2001-03-19 ケーエルエー・インストルメンツ・コーポレーション 電子ビーム検査方法とそのシステム
JPH09304040A (ja) * 1996-05-13 1997-11-28 Hitachi Ltd 電子ビームによるパターン検査方法とその装置
JP3808169B2 (ja) * 1997-05-23 2006-08-09 株式会社ルネサステクノロジ 検査方法およびその装置並びに半導体基板の製造方法
JP3534582B2 (ja) 1997-10-02 2004-06-07 株式会社日立製作所 パターン欠陥検査方法および検査装置
JP3409670B2 (ja) * 1997-11-28 2003-05-26 株式会社日立製作所 外観検査方法およびその装置
JP4002655B2 (ja) * 1998-01-06 2007-11-07 株式会社日立製作所 パターン検査方法およびその装置
US6509564B1 (en) 1998-04-20 2003-01-21 Hitachi, Ltd. Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application method
US6583413B1 (en) 1999-09-01 2003-06-24 Hitachi, Ltd. Method of inspecting a circuit pattern and inspecting instrument
JP3671822B2 (ja) 2000-07-26 2005-07-13 株式会社日立製作所 欠陥検査方法および欠陥検査システム
JP4761663B2 (ja) * 2001-07-27 2011-08-31 パナソニック株式会社 パターン検査における画像処理方法及びパターン検査装置
JP3996774B2 (ja) 2002-01-09 2007-10-24 株式会社日立ハイテクノロジーズ パターン欠陥検査方法及びパターン欠陥検査装置
JP4079841B2 (ja) * 2003-06-30 2008-04-23 オリンパス株式会社 欠陥表示装置
CN103630547B (zh) * 2013-11-26 2016-02-03 明基材料有限公司 具有周期性结构的光学薄膜的瑕疵检测方法及其检测装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5574409A (en) * 1978-11-30 1980-06-05 Fujitsu Ltd Defect inspection system of repetitive pattern
JPS56162037A (en) * 1980-05-19 1981-12-12 Nec Corp Detection for foreign matter on surface
CA1171065A (en) * 1981-01-06 1984-07-17 Vaclav G. Zboril Process for the preparation of polymers of alpha- olefins at high temperatures

Also Published As

Publication number Publication date
JPS59192943A (ja) 1984-11-01

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