JPH0458690B2 - - Google Patents
Info
- Publication number
- JPH0458690B2 JPH0458690B2 JP58023700A JP2370083A JPH0458690B2 JP H0458690 B2 JPH0458690 B2 JP H0458690B2 JP 58023700 A JP58023700 A JP 58023700A JP 2370083 A JP2370083 A JP 2370083A JP H0458690 B2 JPH0458690 B2 JP H0458690B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- film
- mol
- protective film
- polarizability
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 22
- 239000011521 glass Substances 0.000 description 16
- 230000001681 protective effect Effects 0.000 description 10
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 230000005669 field effect Effects 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 3
- 239000000203 mixture Substances 0.000 description 2
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
- Recrystallisation Techniques (AREA)
- Glass Compositions (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58023700A JPS59150430A (ja) | 1983-02-17 | 1983-02-17 | 半導体デバイス |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58023700A JPS59150430A (ja) | 1983-02-17 | 1983-02-17 | 半導体デバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59150430A JPS59150430A (ja) | 1984-08-28 |
| JPH0458690B2 true JPH0458690B2 (enrdf_load_stackoverflow) | 1992-09-18 |
Family
ID=12117659
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58023700A Granted JPS59150430A (ja) | 1983-02-17 | 1983-02-17 | 半導体デバイス |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59150430A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6015389B2 (ja) | 2012-11-30 | 2016-10-26 | 株式会社リコー | 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム |
| JP6394171B2 (ja) * | 2013-10-30 | 2018-09-26 | 株式会社リコー | 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム |
| JP6451875B2 (ja) * | 2018-01-04 | 2019-01-16 | 株式会社リコー | 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム |
| JP6787386B2 (ja) * | 2018-12-12 | 2020-11-18 | 株式会社リコー | 絶縁膜形成用塗布液 |
-
1983
- 1983-02-17 JP JP58023700A patent/JPS59150430A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59150430A (ja) | 1984-08-28 |
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