JPH0458170B2 - - Google Patents

Info

Publication number
JPH0458170B2
JPH0458170B2 JP58239295A JP23929583A JPH0458170B2 JP H0458170 B2 JPH0458170 B2 JP H0458170B2 JP 58239295 A JP58239295 A JP 58239295A JP 23929583 A JP23929583 A JP 23929583A JP H0458170 B2 JPH0458170 B2 JP H0458170B2
Authority
JP
Japan
Prior art keywords
resist
resist film
ultraviolet rays
pattern
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58239295A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60130828A (ja
Inventor
Yoshio Yamashita
Takaharu Kawazu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP58239295A priority Critical patent/JPS60130828A/ja
Priority to US06/594,481 priority patent/US4609615A/en
Priority to DE8484302145T priority patent/DE3466741D1/de
Priority to EP84302145A priority patent/EP0124265B1/en
Priority to CA000450963A priority patent/CA1214679A/en
Publication of JPS60130828A publication Critical patent/JPS60130828A/ja
Publication of JPH0458170B2 publication Critical patent/JPH0458170B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58239295A 1983-03-31 1983-12-19 レジストパタ−ンの形成方法 Granted JPS60130828A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP58239295A JPS60130828A (ja) 1983-12-19 1983-12-19 レジストパタ−ンの形成方法
US06/594,481 US4609615A (en) 1983-03-31 1984-03-27 Process for forming pattern with negative resist using quinone diazide compound
DE8484302145T DE3466741D1 (en) 1983-03-31 1984-03-29 Process for forming pattern with negative resist
EP84302145A EP0124265B1 (en) 1983-03-31 1984-03-29 Process for forming pattern with negative resist
CA000450963A CA1214679A (en) 1983-03-31 1984-03-30 Process for forming pattern with negative resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58239295A JPS60130828A (ja) 1983-12-19 1983-12-19 レジストパタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS60130828A JPS60130828A (ja) 1985-07-12
JPH0458170B2 true JPH0458170B2 (en, 2012) 1992-09-16

Family

ID=17042603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58239295A Granted JPS60130828A (ja) 1983-03-31 1983-12-19 レジストパタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS60130828A (en, 2012)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1285418C (en) * 1985-07-18 1991-07-02 Robert A. Owens Pre-exposure method for increased sensitivity in high contrast resist development
JPH0812840B2 (ja) * 1986-06-16 1996-02-07 ウシオ電機株式会社 レジスト処理方法
JP2768670B2 (ja) * 1987-02-13 1998-06-25 株式会社東芝 パターン形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6029936B2 (ja) * 1979-12-27 1985-07-13 富士通株式会社 パタ−ン形成法
JPS56140345A (en) * 1980-04-02 1981-11-02 Hitachi Ltd Formation of pattern
JPS57153435A (en) * 1981-03-18 1982-09-22 Hitachi Ltd Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS60130828A (ja) 1985-07-12

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term