JPH0456850B2 - - Google Patents

Info

Publication number
JPH0456850B2
JPH0456850B2 JP60012241A JP1224185A JPH0456850B2 JP H0456850 B2 JPH0456850 B2 JP H0456850B2 JP 60012241 A JP60012241 A JP 60012241A JP 1224185 A JP1224185 A JP 1224185A JP H0456850 B2 JPH0456850 B2 JP H0456850B2
Authority
JP
Japan
Prior art keywords
group
formula
aliphatic
represented
halogen atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60012241A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61190524A (ja
Inventor
Hiroshi Tsucha
Kazuhiko Morio
Hisashi Murase
Kazuo Ookawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adeka Corp
Original Assignee
Asahi Denka Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Denka Kogyo KK filed Critical Asahi Denka Kogyo KK
Priority to JP60012241A priority Critical patent/JPS61190524A/ja
Priority to PCT/JP1986/000133 priority patent/WO1993013139A1/ja
Priority to US06/855,310 priority patent/US4684671A/en
Priority to EP86104743A priority patent/EP0240582B1/en
Publication of JPS61190524A publication Critical patent/JPS61190524A/ja
Publication of JPH0456850B2 publication Critical patent/JPH0456850B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/687—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Polymerization Catalysts (AREA)
  • Paints Or Removers (AREA)
JP60012241A 1985-01-25 1985-01-25 エネルギ−線硬化性組成物 Granted JPS61190524A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP60012241A JPS61190524A (ja) 1985-01-25 1985-01-25 エネルギ−線硬化性組成物
PCT/JP1986/000133 WO1993013139A1 (fr) 1985-01-25 1986-03-18 Composition durcissable par irradiation
US06/855,310 US4684671A (en) 1985-01-25 1986-03-18 Energy beam curable composition
EP86104743A EP0240582B1 (en) 1985-01-25 1986-04-07 Energy beam curable composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60012241A JPS61190524A (ja) 1985-01-25 1985-01-25 エネルギ−線硬化性組成物

Publications (2)

Publication Number Publication Date
JPS61190524A JPS61190524A (ja) 1986-08-25
JPH0456850B2 true JPH0456850B2 (enExample) 1992-09-09

Family

ID=11799872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60012241A Granted JPS61190524A (ja) 1985-01-25 1985-01-25 エネルギ−線硬化性組成物

Country Status (4)

Country Link
US (1) US4684671A (enExample)
EP (1) EP0240582B1 (enExample)
JP (1) JPS61190524A (enExample)
WO (1) WO1993013139A1 (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63200339A (ja) * 1987-02-12 1988-08-18 Canon Inc 情報記録媒体
US5047568A (en) * 1988-11-18 1991-09-10 International Business Machines Corporation Sulfonium salts and use and preparation thereof
US4954416A (en) * 1988-12-21 1990-09-04 Minnesota Mining And Manufacturing Company Tethered sulfonium salt photoinitiators for free radical polymerization
US5264325A (en) * 1988-12-30 1993-11-23 International Business Machines Corporation Composition for photo imaging
US6180317B1 (en) 1988-12-30 2001-01-30 International Business Machines Corporation Composition for photoimaging
US5026624A (en) * 1989-03-03 1991-06-25 International Business Machines Corporation Composition for photo imaging
US5747223A (en) * 1988-12-30 1998-05-05 International Business Machines Corporation Composition for photoimaging
US5439766A (en) * 1988-12-30 1995-08-08 International Business Machines Corporation Composition for photo imaging
US4940651A (en) * 1988-12-30 1990-07-10 International Business Machines Corporation Method for patterning cationic curable photoresist
US5278010A (en) * 1989-03-03 1994-01-11 International Business Machines Corporation Composition for photo imaging
US5304457A (en) * 1989-03-03 1994-04-19 International Business Machines Corporation Composition for photo imaging
JPH03160071A (ja) * 1989-11-18 1991-07-10 Somar Corp 光硬化性無電解メッキレジストインキ組成物
DE4007924A1 (de) * 1990-03-13 1991-09-19 Basf Ag Strahlungsempfindliches gemisch
JP2632069B2 (ja) * 1990-04-17 1997-07-16 富士写真フイルム株式会社 光重合性組成物
US5166126A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Color filter array element with protective overcoat layer and method of forming same
US5166125A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Method of forming color filter array element with patternable overcoat layer
US5439779A (en) * 1993-02-22 1995-08-08 International Business Machines Corporation Aqueous soldermask
US5502083A (en) * 1993-06-18 1996-03-26 Nippon Kayaku Kabushiki Kaisha Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product
JPH08239623A (ja) * 1995-02-28 1996-09-17 Toagosei Co Ltd 木材用活性エネルギー線硬化型塗料組成物
US5550171A (en) * 1995-05-31 1996-08-27 International Business Machines Corporation Polymeric sulfonium salt photoinitiators
US5877229A (en) * 1995-07-26 1999-03-02 Lockheed Martin Energy Systems, Inc. High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators
BR0205767B1 (pt) * 2001-07-19 2013-10-15 Sais de sulfônio, composições curáveis por radiação, formulações líquidas, e, método para a preparação dos sais de sulfônio
US20050148679A1 (en) * 2003-12-29 2005-07-07 Chingfan Chiu Aryl sulfonium salt, polymerizable composition and polymerization method of the same
US8617787B2 (en) * 2009-02-20 2013-12-31 San-Apro, Ltd. Sulfonium salt, photo-acid generator, and photosensitive resin composition
KR101630938B1 (ko) * 2013-09-30 2016-06-15 주식회사 엘지화학 편광판, 그 제조 방법 및 이를 포함하는 화상표시장치
JP2019137727A (ja) * 2018-02-06 2019-08-22 株式会社Adeka コーティング組成物
CN114402260A (zh) 2020-08-05 2022-04-26 三亚普罗股份有限公司 光产酸剂

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2807648A (en) * 1955-09-16 1957-09-24 Stauffer Chemical Co Process for making sulfonium compounds
GB1516511A (en) * 1974-05-02 1978-07-05 Gen Electric Curable epoxide compositions
GB1516352A (en) * 1974-05-02 1978-07-05 Gen Electric Halonium salts
US4026705A (en) * 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4193799A (en) * 1976-07-09 1980-03-18 General Electric Company Method of making printing plates and printed circuit
US4166478A (en) * 1977-12-21 1979-09-04 Kazuo Sugimura Accumulator having a bladder to be filled with liquid
US4231951A (en) * 1978-02-08 1980-11-04 Minnesota Mining And Manufacturing Company Complex salt photoinitiator
US4173476A (en) * 1978-02-08 1979-11-06 Minnesota Mining And Manufacturing Company Complex salt photoinitiator
US4291114A (en) * 1978-10-18 1981-09-22 Minnesota Mining And Manufacturing Co. Imageable, composite-dry transfer sheet and process of using same
ZA805273B (en) * 1979-09-28 1981-11-25 Gen Electric Process of deep section curing photocurable compositions
US4374066A (en) * 1979-09-28 1983-02-15 General Electric Company Method for making triarylsulfonium salts
GB8330692D0 (en) * 1983-11-17 1983-12-29 Sericol Group Ltd Preparation of photoinitiators
US4544732A (en) * 1984-12-24 1985-10-01 Shell Oil Company Heat-curable composition

Also Published As

Publication number Publication date
EP0240582A1 (en) 1987-10-14
WO1993013139A1 (fr) 1993-07-08
US4684671A (en) 1987-08-04
EP0240582B1 (en) 1990-07-04
JPS61190524A (ja) 1986-08-25

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Legal Events

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LAPS Cancellation because of no payment of annual fees