JPH0450926B2 - - Google Patents

Info

Publication number
JPH0450926B2
JPH0450926B2 JP21535484A JP21535484A JPH0450926B2 JP H0450926 B2 JPH0450926 B2 JP H0450926B2 JP 21535484 A JP21535484 A JP 21535484A JP 21535484 A JP21535484 A JP 21535484A JP H0450926 B2 JPH0450926 B2 JP H0450926B2
Authority
JP
Japan
Prior art keywords
formula
resistant material
organic group
photosensitive heat
polyquinazolone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP21535484A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6195027A (ja
Inventor
Shigeru Kubota
Satoshi Yanagiura
Norimoto Moriwaki
Torahiko Ando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP21535484A priority Critical patent/JPS6195027A/ja
Publication of JPS6195027A publication Critical patent/JPS6195027A/ja
Publication of JPH0450926B2 publication Critical patent/JPH0450926B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP21535484A 1984-10-15 1984-10-15 感光性耐熱材料の製造方法 Granted JPS6195027A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21535484A JPS6195027A (ja) 1984-10-15 1984-10-15 感光性耐熱材料の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21535484A JPS6195027A (ja) 1984-10-15 1984-10-15 感光性耐熱材料の製造方法

Publications (2)

Publication Number Publication Date
JPS6195027A JPS6195027A (ja) 1986-05-13
JPH0450926B2 true JPH0450926B2 (cs) 1992-08-17

Family

ID=16670904

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21535484A Granted JPS6195027A (ja) 1984-10-15 1984-10-15 感光性耐熱材料の製造方法

Country Status (1)

Country Link
JP (1) JPS6195027A (cs)

Also Published As

Publication number Publication date
JPS6195027A (ja) 1986-05-13

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