JPH0450699B2 - - Google Patents
Info
- Publication number
- JPH0450699B2 JPH0450699B2 JP62184633A JP18463387A JPH0450699B2 JP H0450699 B2 JPH0450699 B2 JP H0450699B2 JP 62184633 A JP62184633 A JP 62184633A JP 18463387 A JP18463387 A JP 18463387A JP H0450699 B2 JPH0450699 B2 JP H0450699B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- primary
- electrode
- emitted
- accelerating electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000002500 ions Chemical class 0.000 claims description 50
- 150000001768 cations Chemical group 0.000 claims description 25
- 239000011810 insulating material Substances 0.000 claims description 19
- 238000004458 analytical method Methods 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 17
- 238000007689 inspection Methods 0.000 claims description 15
- 239000002245 particle Substances 0.000 claims description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- 230000001133 acceleration Effects 0.000 claims description 7
- 238000012360 testing method Methods 0.000 claims description 6
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 230000007935 neutral effect Effects 0.000 claims description 4
- 230000005686 electrostatic field Effects 0.000 claims description 3
- 230000005684 electric field Effects 0.000 claims 1
- 230000003068 static effect Effects 0.000 claims 1
- 239000010408 film Substances 0.000 description 13
- 238000010884 ion-beam technique Methods 0.000 description 12
- 238000010849 ion bombardment Methods 0.000 description 7
- 238000010894 electron beam technology Methods 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 238000005421 electrostatic potential Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- -1 oxygen ions Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8610681 | 1986-07-23 | ||
| FR8610681A FR2602051B1 (fr) | 1986-07-23 | 1986-07-23 | Procede et dispositif pour la decharge d'echantillons isolants lors d'une analyse ionique |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6334844A JPS6334844A (ja) | 1988-02-15 |
| JPH0450699B2 true JPH0450699B2 (en, 2012) | 1992-08-17 |
Family
ID=9337664
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62184633A Granted JPS6334844A (ja) | 1986-07-23 | 1987-07-23 | 絶縁材料のイオン分析方法および装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4748325A (en, 2012) |
| EP (1) | EP0254625B1 (en, 2012) |
| JP (1) | JPS6334844A (en, 2012) |
| DE (1) | DE3762472D1 (en, 2012) |
| FR (1) | FR2602051B1 (en, 2012) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8703012D0 (en) * | 1987-02-10 | 1987-03-18 | Vg Instr Group | Secondary ion mass spectrometer |
| US4992661A (en) * | 1987-08-20 | 1991-02-12 | Hitachi, Ltd. | Method and apparatus for neutralizing an accumulated charge on a specimen by means of a conductive lattice deposited on the specimen |
| JPH01220350A (ja) * | 1988-02-26 | 1989-09-04 | Hitachi Ltd | 帯電抑制方法及びその装置を用いた粒子線照射装置 |
| US5059785A (en) * | 1990-05-30 | 1991-10-22 | The United States Of America As Represented By The United States Department Of Energy | Backscattering spectrometry device for identifying unknown elements present in a workpiece |
| GB9122161D0 (en) * | 1991-10-18 | 1991-11-27 | Kratos Analytical Ltd | Charged particle energy analysers |
| DE19724265A1 (de) * | 1997-06-09 | 1998-12-10 | Atomika Instr Gmbh | Sekundärionen-Massenspektrometer mit Lochmaske |
| JP3260663B2 (ja) * | 1997-07-23 | 2002-02-25 | 沖電気工業株式会社 | ホール内表面の組成分布検出方法 |
| FR2806527B1 (fr) * | 2000-03-20 | 2002-10-25 | Schlumberger Technologies Inc | Colonne a focalisation simultanee d'un faisceau de particules et d'un faisceau optique |
| US6683320B2 (en) | 2000-05-18 | 2004-01-27 | Fei Company | Through-the-lens neutralization for charged particle beam system |
| DE10358182B4 (de) * | 2003-12-12 | 2012-01-05 | 3D-Micromac Ag | Vorrichtung zur Beschichtung einer Probe |
| WO2022003678A1 (en) * | 2020-06-28 | 2022-01-06 | Cozai Ltd | Work function measurements for surface analysis |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5871546A (ja) * | 1981-10-23 | 1983-04-28 | Fujitsu Ltd | イオン注入装置 |
| JPS58131731A (ja) * | 1982-01-29 | 1983-08-05 | Fujitsu Ltd | エネルギ−線照射方法 |
| EP0104818A3 (en) * | 1982-09-29 | 1985-10-23 | Eaton Corporation | Ion implantation device |
| JPS60117532A (ja) * | 1983-11-29 | 1985-06-25 | Shimadzu Corp | イオン照射装置 |
-
1986
- 1986-07-23 FR FR8610681A patent/FR2602051B1/fr not_active Expired
-
1987
- 1987-07-07 DE DE8787401592T patent/DE3762472D1/de not_active Expired - Lifetime
- 1987-07-07 EP EP87401592A patent/EP0254625B1/fr not_active Expired - Lifetime
- 1987-07-14 US US07/072,867 patent/US4748325A/en not_active Expired - Lifetime
- 1987-07-23 JP JP62184633A patent/JPS6334844A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| EP0254625A1 (fr) | 1988-01-27 |
| FR2602051B1 (fr) | 1988-09-16 |
| DE3762472D1 (de) | 1990-05-31 |
| US4748325A (en) | 1988-05-31 |
| JPS6334844A (ja) | 1988-02-15 |
| EP0254625B1 (fr) | 1990-04-25 |
| FR2602051A1 (fr) | 1988-01-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |