JPH0446607B2 - - Google Patents
Info
- Publication number
- JPH0446607B2 JPH0446607B2 JP60213691A JP21369185A JPH0446607B2 JP H0446607 B2 JPH0446607 B2 JP H0446607B2 JP 60213691 A JP60213691 A JP 60213691A JP 21369185 A JP21369185 A JP 21369185A JP H0446607 B2 JPH0446607 B2 JP H0446607B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- zeolite
- impurities
- laser gas
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000012535 impurity Substances 0.000 claims description 38
- 239000010457 zeolite Substances 0.000 claims description 35
- 229910021536 Zeolite Inorganic materials 0.000 claims description 32
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 32
- 239000007787 solid Substances 0.000 claims description 20
- 239000000126 substance Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 18
- 238000009835 boiling Methods 0.000 claims description 13
- 150000004820 halides Chemical class 0.000 claims description 10
- 229910052783 alkali metal Inorganic materials 0.000 claims description 6
- 150000001340 alkali metals Chemical class 0.000 claims description 6
- 150000001341 alkaline earth metal compounds Chemical class 0.000 claims description 5
- 238000000746 purification Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 description 50
- 239000003513 alkali Substances 0.000 description 14
- 150000001875 compounds Chemical class 0.000 description 9
- 238000001179 sorption measurement Methods 0.000 description 9
- 229910052724 xenon Inorganic materials 0.000 description 9
- 230000007423 decrease Effects 0.000 description 8
- 239000011575 calcium Substances 0.000 description 7
- 229910052734 helium Inorganic materials 0.000 description 7
- 229910052743 krypton Inorganic materials 0.000 description 7
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 6
- 239000013543 active substance Substances 0.000 description 6
- 229910052791 calcium Inorganic materials 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 239000002808 molecular sieve Substances 0.000 description 5
- 229910052754 neon Inorganic materials 0.000 description 5
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000003795 desorption Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003203 everyday effect Effects 0.000 description 2
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000003507 refrigerant Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 241000270281 Coluber constrictor Species 0.000 description 1
- -1 F 2 Substances 0.000 description 1
- 229910004014 SiF4 Inorganic materials 0.000 description 1
- OMOVVBIIQSXZSZ-UHFFFAOYSA-N [6-(4-acetyloxy-5,9a-dimethyl-2,7-dioxo-4,5a,6,9-tetrahydro-3h-pyrano[3,4-b]oxepin-5-yl)-5-formyloxy-3-(furan-3-yl)-3a-methyl-7-methylidene-1a,2,3,4,5,6-hexahydroindeno[1,7a-b]oxiren-4-yl] 2-hydroxy-3-methylpentanoate Chemical compound CC12C(OC(=O)C(O)C(C)CC)C(OC=O)C(C3(C)C(CC(=O)OC4(C)COC(=O)CC43)OC(C)=O)C(=C)C32OC3CC1C=1C=COC=1 OMOVVBIIQSXZSZ-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000000274 adsorptive effect Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229940043430 calcium compound Drugs 0.000 description 1
- 150000001674 calcium compounds Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- AFYPFACVUDMOHA-UHFFFAOYSA-N chlorotrifluoromethane Chemical compound FC(F)(F)Cl AFYPFACVUDMOHA-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002354 daily effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- PXBRQCKWGAHEHS-UHFFFAOYSA-N dichlorodifluoromethane Chemical compound FC(F)(Cl)Cl PXBRQCKWGAHEHS-UHFFFAOYSA-N 0.000 description 1
- 235000019404 dichlorodifluoromethane Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- OQZCSNDVOWYALR-UHFFFAOYSA-N flurochloridone Chemical compound FC(F)(F)C1=CC=CC(N2C(C(Cl)C(CCl)C2)=O)=C1 OQZCSNDVOWYALR-UHFFFAOYSA-N 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 150000002366 halogen compounds Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 1
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Separation Of Gases By Adsorption (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60213691A JPS6274430A (ja) | 1985-09-28 | 1985-09-28 | 希ガスハライドエキシマ−レ−ザ−ガスの精製法 |
| CA000518663A CA1298959C (en) | 1985-09-28 | 1986-09-19 | Method of refining rare gas halide excimer laser gas |
| GB8622799A GB2182484B (en) | 1985-09-28 | 1986-09-22 | Method of refining rare gas halide excimer laser gas |
| US06/909,702 US4740982A (en) | 1985-09-28 | 1986-09-22 | Method of refining rare gas halide excimer laser gas |
| FR868613476A FR2587914B1 (fr) | 1985-09-28 | 1986-09-26 | Procede d'epuration du gaz d'un laser excimeur a halogenure de gaz rare |
| DE19863632995 DE3632995A1 (de) | 1985-09-28 | 1986-09-29 | Verfahren zur reinigung von gasen fuer edelgashalogenidexcimerenlaser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60213691A JPS6274430A (ja) | 1985-09-28 | 1985-09-28 | 希ガスハライドエキシマ−レ−ザ−ガスの精製法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6274430A JPS6274430A (ja) | 1987-04-06 |
| JPH0446607B2 true JPH0446607B2 (de) | 1992-07-30 |
Family
ID=16643387
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60213691A Granted JPS6274430A (ja) | 1985-09-28 | 1985-09-28 | 希ガスハライドエキシマ−レ−ザ−ガスの精製法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6274430A (de) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6379665U (de) * | 1986-11-13 | 1988-05-26 | ||
| JPH0760914B2 (ja) * | 1989-01-30 | 1995-06-28 | セントラル硝子株式会社 | エキシマーレーザーガスの精製法並びにその装置 |
| JPH03256831A (ja) * | 1990-02-23 | 1991-11-15 | Toyo Kanetsu Kk | 段ボール箱の切断方法 |
| JP3891834B2 (ja) * | 2001-12-04 | 2007-03-14 | 大陽日酸株式会社 | ガス供給方法及び装置 |
| JP5216220B2 (ja) * | 2007-01-09 | 2013-06-19 | 岩谷産業株式会社 | ネオン回収方法 |
| JP5011013B2 (ja) * | 2007-07-24 | 2012-08-29 | 大陽日酸株式会社 | 二フッ化キセノンガス供給装置 |
| JP4891969B2 (ja) * | 2008-10-03 | 2012-03-07 | 株式会社荏原製作所 | 不純物を除去する不純物除去装置およびその運転方法 |
-
1985
- 1985-09-28 JP JP60213691A patent/JPS6274430A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6274430A (ja) | 1987-04-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |