JP5216220B2 - ネオン回収方法 - Google Patents
ネオン回収方法 Download PDFInfo
- Publication number
- JP5216220B2 JP5216220B2 JP2007000921A JP2007000921A JP5216220B2 JP 5216220 B2 JP5216220 B2 JP 5216220B2 JP 2007000921 A JP2007000921 A JP 2007000921A JP 2007000921 A JP2007000921 A JP 2007000921A JP 5216220 B2 JP5216220 B2 JP 5216220B2
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- JP
- Japan
- Prior art keywords
- gas
- excimer laser
- xenon
- neon
- exhausted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229910052754 neon Inorganic materials 0.000 title claims description 23
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 title claims description 22
- 238000000034 method Methods 0.000 title claims description 11
- 238000011084 recovery Methods 0.000 title claims description 8
- 239000007789 gas Substances 0.000 claims description 105
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 17
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 17
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 17
- 229910052724 xenon Inorganic materials 0.000 claims description 14
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 12
- JGRGMDZIEXDEQT-UHFFFAOYSA-N [Cl].[Xe] Chemical compound [Cl].[Xe] JGRGMDZIEXDEQT-UHFFFAOYSA-N 0.000 claims description 12
- 238000001179 sorption measurement Methods 0.000 claims description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 11
- 239000003054 catalyst Substances 0.000 claims description 11
- 238000009835 boiling Methods 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 4
- 229910001882 dioxygen Inorganic materials 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 238000005224 laser annealing Methods 0.000 description 8
- 230000010355 oscillation Effects 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- VFQHLZMKZVVGFQ-UHFFFAOYSA-N [F].[Kr] Chemical compound [F].[Kr] VFQHLZMKZVVGFQ-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052756 noble gas Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001784 detoxification Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 150000002806 neon Chemical class 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
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- Treating Waste Gases (AREA)
- Separation By Low-Temperature Treatments (AREA)
Description
Claims (1)
- エキシマレーザ装置から排出されたエキシマレーザガスからネオンを回収する方法であって、
キセノン−塩素系エキシマレーザガスを使用したエキシマレーザ装置(1)からの排出エキシマレーザガスを塩化水素除害装置(5)を通過させることで排出エキシマレーザガスから塩化水素成分を除去する第1ステップと、第1ステップでのスルーガスを触媒装置(8)に通過させることで排出エキシマレーザガスから水素成分を除去する第2ステップと、第2ステップでのスルーガスをキセノン沸点温度で第1次低温吸着処理し排出エキシマレーザガスからキセノンガスを液化除去する第3ステップと、第3ステップでのスルーガスを窒素沸点温度で第2次低温吸着処理し排出エキシマレーザガスから酸素ガスと窒素ガスを液化除去する第4ステップと
を含む処理工程で、エキシマレーザガス中のネオンガスを精製回収するようにしたことを特徴とするネオン回収方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007000921A JP5216220B2 (ja) | 2007-01-09 | 2007-01-09 | ネオン回収方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007000921A JP5216220B2 (ja) | 2007-01-09 | 2007-01-09 | ネオン回収方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008168169A JP2008168169A (ja) | 2008-07-24 |
JP5216220B2 true JP5216220B2 (ja) | 2013-06-19 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007000921A Active JP5216220B2 (ja) | 2007-01-09 | 2007-01-09 | ネオン回収方法 |
Country Status (1)
Country | Link |
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JP (1) | JP5216220B2 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010076972A (ja) * | 2008-09-25 | 2010-04-08 | Taiyo Nippon Sanso Corp | 不純希ガスの処理方法 |
JP6175471B2 (ja) * | 2015-10-30 | 2017-08-02 | 日本エア・リキード株式会社 | ネオン回収精製システムおよびネオン回収精製方法 |
KR101888550B1 (ko) * | 2017-03-31 | 2018-08-14 | 대성산업가스 주식회사 | 고순도 네온(Ne) 생산 장치 |
JP6457013B2 (ja) | 2017-05-17 | 2019-01-23 | 日本エア・リキード株式会社 | ガスリサイクル機能を有するエキシマレーザ発振装置 |
KR101912348B1 (ko) | 2017-07-06 | 2018-12-28 | 대성산업가스 주식회사 | 희가스 생산 장치 |
KR102018690B1 (ko) * | 2018-06-21 | 2019-09-05 | 대성산업가스 주식회사 | 네온 헬륨 분리 장치 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6274430A (ja) * | 1985-09-28 | 1987-04-06 | Central Glass Co Ltd | 希ガスハライドエキシマ−レ−ザ−ガスの精製法 |
JP3805073B2 (ja) * | 1997-08-07 | 2006-08-02 | 大陽日酸株式会社 | エキシマレーザーガスの回収装置 |
JP2000072419A (ja) * | 1998-08-20 | 2000-03-07 | Japan Pionics Co Ltd | 希ガスの回収方法 |
JP4276354B2 (ja) * | 2000-02-28 | 2009-06-10 | 日本エア・リキード株式会社 | ネオン回収方法及び装置 |
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- 2007-01-09 JP JP2007000921A patent/JP5216220B2/ja active Active
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