JPH0444613Y2 - - Google Patents
Info
- Publication number
- JPH0444613Y2 JPH0444613Y2 JP10076586U JP10076586U JPH0444613Y2 JP H0444613 Y2 JPH0444613 Y2 JP H0444613Y2 JP 10076586 U JP10076586 U JP 10076586U JP 10076586 U JP10076586 U JP 10076586U JP H0444613 Y2 JPH0444613 Y2 JP H0444613Y2
- Authority
- JP
- Japan
- Prior art keywords
- exhaust
- exhaust port
- vacuum chamber
- chamber
- reactive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005086 pumping Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 description 20
- 239000007789 gas Substances 0.000 description 18
- 238000007738 vacuum evaporation Methods 0.000 description 14
- 230000001105 regulatory effect Effects 0.000 description 8
- 230000000181 anti-adherent effect Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- 230000003373 anti-fouling effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000002265 prevention Effects 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10076586U JPH0444613Y2 (enrdf_load_stackoverflow) | 1986-06-28 | 1986-06-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10076586U JPH0444613Y2 (enrdf_load_stackoverflow) | 1986-06-28 | 1986-06-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS637163U JPS637163U (enrdf_load_stackoverflow) | 1988-01-18 |
| JPH0444613Y2 true JPH0444613Y2 (enrdf_load_stackoverflow) | 1992-10-21 |
Family
ID=30970893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10076586U Expired JPH0444613Y2 (enrdf_load_stackoverflow) | 1986-06-28 | 1986-06-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0444613Y2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2649693B2 (ja) * | 1988-05-23 | 1997-09-03 | 住友電気工業株式会社 | 気相成長装置 |
| JP2579588Y2 (ja) * | 1995-12-21 | 1998-08-27 | アネルバ株式会社 | スパッタリング装置 |
-
1986
- 1986-06-28 JP JP10076586U patent/JPH0444613Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS637163U (enrdf_load_stackoverflow) | 1988-01-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2682904B2 (ja) | スリット・バルブ装置と方法 | |
| JP3107275B2 (ja) | 半導体製造装置及び半導体製造装置のクリーニング方法 | |
| US6293306B1 (en) | Throttle gate valve | |
| JP2009200518A (ja) | 大面積基板を搬送するための方法 | |
| KR20110097663A (ko) | 진공 배기용의 볼 밸브 및 진공 배기 장치 | |
| JPH0444613Y2 (enrdf_load_stackoverflow) | ||
| US5379984A (en) | Gate valve for vacuum processing system | |
| JP2008166817A (ja) | 排気装置及び排気方法、並びにその排気装置を有する半導体製造設備 | |
| JPH06244125A (ja) | 減圧処理装置 | |
| WO2024045748A1 (zh) | 薄膜沉积装置及薄膜沉积方法 | |
| JPH06346235A (ja) | 真空被覆装置 | |
| JP2007131883A (ja) | 成膜装置 | |
| KR102557106B1 (ko) | 기재, 특히 안경 렌즈의 진공 코팅을 위한 박스 코팅 장치 | |
| JPH03264667A (ja) | カルーセル型スパッタリング装置 | |
| JPH06167275A (ja) | クライオポンプ | |
| JPH11317339A (ja) | 基板処理装置および基板処理方法 | |
| KR102149240B1 (ko) | 사이드 스토리지 | |
| JP2021068893A (ja) | 基板処理装置及び方法 | |
| JPH0342037Y2 (enrdf_load_stackoverflow) | ||
| JP3281810B2 (ja) | 真空処理装置 | |
| JP2870786B2 (ja) | レジスト塗布装置とレジスト塗布方法 | |
| JPH05136041A (ja) | 薬液塗布装置 | |
| JPH0586471A (ja) | スパツタリング装置 | |
| JP2000208429A (ja) | 基板処理装置および処理室の排気方法 | |
| KR20010018067A (ko) | 공정 쳄버의 압력 제어밸브 |