JPH0444323A - 基板の水切り乾燥装置 - Google Patents

基板の水切り乾燥装置

Info

Publication number
JPH0444323A
JPH0444323A JP2152413A JP15241390A JPH0444323A JP H0444323 A JPH0444323 A JP H0444323A JP 2152413 A JP2152413 A JP 2152413A JP 15241390 A JP15241390 A JP 15241390A JP H0444323 A JPH0444323 A JP H0444323A
Authority
JP
Japan
Prior art keywords
substrate
water
tank
cleaning
water surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2152413A
Other languages
English (en)
Japanese (ja)
Inventor
Kiyoto Sato
清人 佐藤
Takeo Takahashi
高橋　武男
Tatsuo Yamamoto
山本　達雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP2152413A priority Critical patent/JPH0444323A/ja
Priority to KR1019910009697A priority patent/KR930011433B1/ko
Publication of JPH0444323A publication Critical patent/JPH0444323A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)
JP2152413A 1990-06-11 1990-06-11 基板の水切り乾燥装置 Pending JPH0444323A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2152413A JPH0444323A (ja) 1990-06-11 1990-06-11 基板の水切り乾燥装置
KR1019910009697A KR930011433B1 (ko) 1990-06-11 1991-06-11 기판의 물빼기 건조장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2152413A JPH0444323A (ja) 1990-06-11 1990-06-11 基板の水切り乾燥装置

Publications (1)

Publication Number Publication Date
JPH0444323A true JPH0444323A (ja) 1992-02-14

Family

ID=15539974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2152413A Pending JPH0444323A (ja) 1990-06-11 1990-06-11 基板の水切り乾燥装置

Country Status (2)

Country Link
JP (1) JPH0444323A (ko)
KR (1) KR930011433B1 (ko)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995002473A1 (en) * 1993-07-16 1995-01-26 Cfmt, Inc. Static megasonic cleaning system for cleaning objects
WO1997048129A1 (fr) * 1996-06-14 1997-12-18 Seiko Epson Corporation Procede de sechage par chauffage et appareil de sechage
JP2014103149A (ja) * 2012-11-16 2014-06-05 Tokyo Electron Ltd 基板処理装置及び基板処理方法並びに基板処理プログラムを記録したコンピュータ読み取り可能な記録媒体

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995002473A1 (en) * 1993-07-16 1995-01-26 Cfmt, Inc. Static megasonic cleaning system for cleaning objects
WO1997048129A1 (fr) * 1996-06-14 1997-12-18 Seiko Epson Corporation Procede de sechage par chauffage et appareil de sechage
US6179930B1 (en) 1996-06-14 2001-01-30 Seiko Epson Corporation Pull-up drying method and apparatus
JP2014103149A (ja) * 2012-11-16 2014-06-05 Tokyo Electron Ltd 基板処理装置及び基板処理方法並びに基板処理プログラムを記録したコンピュータ読み取り可能な記録媒体

Also Published As

Publication number Publication date
KR920001642A (ko) 1992-01-30
KR930011433B1 (ko) 1993-12-06

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