JPH0443407B2 - - Google Patents

Info

Publication number
JPH0443407B2
JPH0443407B2 JP59015800A JP1580084A JPH0443407B2 JP H0443407 B2 JPH0443407 B2 JP H0443407B2 JP 59015800 A JP59015800 A JP 59015800A JP 1580084 A JP1580084 A JP 1580084A JP H0443407 B2 JPH0443407 B2 JP H0443407B2
Authority
JP
Japan
Prior art keywords
pattern
detection
detected
stage
transferred
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59015800A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60160613A (ja
Inventor
Hideji Sugyama
Shuji Shoda
Eiichi Yasukura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi Science Systems Ltd
Original Assignee
Hitachi Ltd
Hitachi Measurement Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Measurement Engineering Co Ltd filed Critical Hitachi Ltd
Priority to JP59015800A priority Critical patent/JPS60160613A/ja
Publication of JPS60160613A publication Critical patent/JPS60160613A/ja
Publication of JPH0443407B2 publication Critical patent/JPH0443407B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59015800A 1984-01-31 1984-01-31 投影露光方法 Granted JPS60160613A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59015800A JPS60160613A (ja) 1984-01-31 1984-01-31 投影露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59015800A JPS60160613A (ja) 1984-01-31 1984-01-31 投影露光方法

Publications (2)

Publication Number Publication Date
JPS60160613A JPS60160613A (ja) 1985-08-22
JPH0443407B2 true JPH0443407B2 (en, 2012) 1992-07-16

Family

ID=11898912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59015800A Granted JPS60160613A (ja) 1984-01-31 1984-01-31 投影露光方法

Country Status (1)

Country Link
JP (1) JPS60160613A (en, 2012)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2610815B2 (ja) * 1985-09-19 1997-05-14 株式会社ニコン 露光方法
JP2661015B2 (ja) * 1986-06-11 1997-10-08 株式会社ニコン 位置合わせ方法
JPS63250120A (ja) * 1987-04-07 1988-10-18 Mitsubishi Electric Corp アライメント補正装置
JP2711107B2 (ja) * 1988-06-27 1998-02-10 三菱電機株式会社 露光方法
JP2638528B2 (ja) * 1994-12-19 1997-08-06 株式会社ニコン 位置合わせ方法
JP2629659B2 (ja) * 1996-04-22 1997-07-09 株式会社ニコン 回路パターン形成方法

Also Published As

Publication number Publication date
JPS60160613A (ja) 1985-08-22

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term