JPH0438131B2 - - Google Patents
Info
- Publication number
- JPH0438131B2 JPH0438131B2 JP59004111A JP411184A JPH0438131B2 JP H0438131 B2 JPH0438131 B2 JP H0438131B2 JP 59004111 A JP59004111 A JP 59004111A JP 411184 A JP411184 A JP 411184A JP H0438131 B2 JPH0438131 B2 JP H0438131B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- pattern
- film
- processed
- resist pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010408 film Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 9
- 239000010409 thin film Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 230000009477 glass transition Effects 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 9
- 229910052804 chromium Inorganic materials 0.000 description 9
- 239000011651 chromium Substances 0.000 description 9
- 230000018109 developmental process Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000008034 disappearance Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59004111A JPS60148116A (ja) | 1984-01-12 | 1984-01-12 | パタ−ン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59004111A JPS60148116A (ja) | 1984-01-12 | 1984-01-12 | パタ−ン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60148116A JPS60148116A (ja) | 1985-08-05 |
| JPH0438131B2 true JPH0438131B2 (enrdf_load_stackoverflow) | 1992-06-23 |
Family
ID=11575671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59004111A Granted JPS60148116A (ja) | 1984-01-12 | 1984-01-12 | パタ−ン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60148116A (enrdf_load_stackoverflow) |
-
1984
- 1984-01-12 JP JP59004111A patent/JPS60148116A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60148116A (ja) | 1985-08-05 |
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