JPH0435062B2 - - Google Patents

Info

Publication number
JPH0435062B2
JPH0435062B2 JP60041699A JP4169985A JPH0435062B2 JP H0435062 B2 JPH0435062 B2 JP H0435062B2 JP 60041699 A JP60041699 A JP 60041699A JP 4169985 A JP4169985 A JP 4169985A JP H0435062 B2 JPH0435062 B2 JP H0435062B2
Authority
JP
Japan
Prior art keywords
compound
photosensitive composition
vinyl
molecule
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60041699A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61200536A (ja
Inventor
Noboru Sugasawa
Nobuyuki Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP4169985A priority Critical patent/JPS61200536A/ja
Publication of JPS61200536A publication Critical patent/JPS61200536A/ja
Publication of JPH0435062B2 publication Critical patent/JPH0435062B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP4169985A 1985-03-01 1985-03-01 感光性組成物 Granted JPS61200536A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4169985A JPS61200536A (ja) 1985-03-01 1985-03-01 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4169985A JPS61200536A (ja) 1985-03-01 1985-03-01 感光性組成物

Publications (2)

Publication Number Publication Date
JPS61200536A JPS61200536A (ja) 1986-09-05
JPH0435062B2 true JPH0435062B2 (enrdf_load_stackoverflow) 1992-06-09

Family

ID=12615662

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4169985A Granted JPS61200536A (ja) 1985-03-01 1985-03-01 感光性組成物

Country Status (1)

Country Link
JP (1) JPS61200536A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61264341A (ja) * 1985-05-20 1986-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS61264340A (ja) * 1985-05-20 1986-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物
DE3619130A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2557408C2 (de) * 1975-12-19 1983-08-25 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung eines in organischen Lösungsmitteln löslichen, vernetzbaren Acryloyl- und/oder Methacryloylgruppen und Carboxylgruppen enthaltenden Urethanharzes und seine Verwendung
JPS5923723B2 (ja) * 1980-09-19 1984-06-04 日立化成工業株式会社 感光性樹脂組成物および感光性エレメント
JPS60188413A (ja) * 1984-03-09 1985-09-25 Toyobo Co Ltd 光重合性樹脂組成物
JPS60195171A (ja) * 1984-03-19 1985-10-03 Mitsubishi Rayon Co Ltd 紫外線硬化型インキ組成物
JPS61130946A (ja) * 1984-11-29 1986-06-18 Hitachi Chem Co Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
JPS61200536A (ja) 1986-09-05

Similar Documents

Publication Publication Date Title
US5296334A (en) Radiation-curable composition useful for preparation of solder masks
US20090042126A1 (en) Photosensitive resin composition and cured article thereof
JPS61243869A (ja) レジストインキ組成物
KR100325670B1 (ko) 수지조성물
US5443672A (en) Process for coating circuit boards
JPH01229242A (ja) 感光性樹脂組成物
CN108255014B (zh) 一种含有改性聚氨酯和光固化单体的干膜光阻剂
CN112159639B (zh) 一种改性高分子粘合剂及含有该粘合剂的干膜光阻剂
JP2898143B2 (ja) 感光液組成物、感光性フィルム及び積層板
JPH0435062B2 (enrdf_load_stackoverflow)
JPS61201237A (ja) 感光性樹脂組成物
JP2001159817A (ja) 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
CN113126434B (zh) 一种干膜抗蚀剂
JPS63184744A (ja) 光重合性積層体
JPH0122312B2 (enrdf_load_stackoverflow)
JPH04270345A (ja) 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JPS62160440A (ja) 液状感光性樹脂組成物
JPS5824035B2 (ja) 感光性エレメント
CN112578633B (zh) 一种光致抗蚀剂
JP3859934B2 (ja) 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JPH0659448A (ja) 感光性樹脂組成物
DE69221072T2 (de) Erhöhung der Haftung von photopolymerisierbaren Trockenfilmzusammensetzungen auf Trägern
JPH09235348A (ja) エポキシ樹脂、エポキシ樹脂組成物及びフォトソルダーレジストインク並びにプリント配線板及びその製造方法
CN114815508B (zh) 感光干膜抗蚀剂层压体和线路板
JP2000047389A (ja) 感光性フィルム