JPH04330388A - 真空ポンプ装置 - Google Patents
真空ポンプ装置Info
- Publication number
- JPH04330388A JPH04330388A JP9784491A JP9784491A JPH04330388A JP H04330388 A JPH04330388 A JP H04330388A JP 9784491 A JP9784491 A JP 9784491A JP 9784491 A JP9784491 A JP 9784491A JP H04330388 A JPH04330388 A JP H04330388A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum pump
- phase
- gas
- process gas
- piping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012071 phase Substances 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims abstract description 28
- 239000007791 liquid phase Substances 0.000 claims abstract description 10
- 239000007790 solid phase Substances 0.000 claims abstract description 10
- 239000007789 gas Substances 0.000 claims description 42
- 239000011261 inert gas Substances 0.000 claims description 9
- 238000005260 corrosion Methods 0.000 abstract description 3
- 230000007797 corrosion Effects 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Landscapes
- Compressor (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9784491A JPH04330388A (ja) | 1991-04-30 | 1991-04-30 | 真空ポンプ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9784491A JPH04330388A (ja) | 1991-04-30 | 1991-04-30 | 真空ポンプ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04330388A true JPH04330388A (ja) | 1992-11-18 |
| JPH0559277B2 JPH0559277B2 (enExample) | 1993-08-30 |
Family
ID=14203034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9784491A Granted JPH04330388A (ja) | 1991-04-30 | 1991-04-30 | 真空ポンプ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04330388A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003209101A (ja) * | 2002-01-17 | 2003-07-25 | Tokura Kogyo Kk | Cvd排気系配管における塩化アンモニウムの付着防止方法 |
| WO2012017972A1 (en) * | 2010-08-05 | 2012-02-09 | Ebara Corporation | Exhaust system |
| KR20170037946A (ko) | 2014-07-31 | 2017-04-05 | 에드워즈 가부시키가이샤 | 드라이 펌프 및 배기가스 처리 방법 |
| JP2019143534A (ja) * | 2018-02-21 | 2019-08-29 | 住友重機械工業株式会社 | クライオポンプ |
| WO2025202928A1 (en) | 2024-03-29 | 2025-10-02 | Edwards Japan Limited | Vacuum exhaust system |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63314397A (ja) * | 1987-06-17 | 1988-12-22 | Hitachi Ltd | 真空ポンプ |
| JPH01237397A (ja) * | 1988-03-18 | 1989-09-21 | Hitachi Ltd | 真空ポンプ |
| JPH02188691A (ja) * | 1989-01-13 | 1990-07-24 | Hitachi Ltd | 真空ポンプ |
-
1991
- 1991-04-30 JP JP9784491A patent/JPH04330388A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63314397A (ja) * | 1987-06-17 | 1988-12-22 | Hitachi Ltd | 真空ポンプ |
| JPH01237397A (ja) * | 1988-03-18 | 1989-09-21 | Hitachi Ltd | 真空ポンプ |
| JPH02188691A (ja) * | 1989-01-13 | 1990-07-24 | Hitachi Ltd | 真空ポンプ |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003209101A (ja) * | 2002-01-17 | 2003-07-25 | Tokura Kogyo Kk | Cvd排気系配管における塩化アンモニウムの付着防止方法 |
| WO2012017972A1 (en) * | 2010-08-05 | 2012-02-09 | Ebara Corporation | Exhaust system |
| US9625168B2 (en) | 2010-08-05 | 2017-04-18 | Ebara Corporation | Exhaust system |
| KR20170037946A (ko) | 2014-07-31 | 2017-04-05 | 에드워즈 가부시키가이샤 | 드라이 펌프 및 배기가스 처리 방법 |
| US11592025B2 (en) | 2014-07-31 | 2023-02-28 | Edwards Japan Limited | Dry pump and exhaust gas treatment method |
| JP2019143534A (ja) * | 2018-02-21 | 2019-08-29 | 住友重機械工業株式会社 | クライオポンプ |
| WO2025202928A1 (en) | 2024-03-29 | 2025-10-02 | Edwards Japan Limited | Vacuum exhaust system |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0559277B2 (enExample) | 1993-08-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2001226774A (ja) | 反応副生成物の配管内付着防止装置及び付着防止方法 | |
| US4911812A (en) | Plasma treating method and apparatus therefor | |
| JPH01268030A (ja) | プラズマエッチング方法及び装置 | |
| JPH04330388A (ja) | 真空ポンプ装置 | |
| JPH0261067A (ja) | 熱処理装置 | |
| JP3155487B2 (ja) | ウェット酸化装置およびウェット酸化方法 | |
| JP2001126988A (ja) | 半導体製造装置 | |
| JP3449630B2 (ja) | 半導体製造装置 | |
| JP2004200364A (ja) | 排ガス処理装置および排ガス処理方法 | |
| JP2708569B2 (ja) | 真空装置の脱ガス方法及び脱ガス装置 | |
| JPS5812342B2 (ja) | 連続ドライエッチング方法 | |
| JPS6139519A (ja) | プラズマ処理装置 | |
| JPH06173010A (ja) | 熱処理装置 | |
| JP4122569B2 (ja) | ガス処理装置 | |
| JPH01302816A (ja) | 縦型熱処理装置 | |
| JPH04304381A (ja) | Cvd装置における排気システムの反応生成物除去装置 | |
| JPH10173025A (ja) | 半導体製造装置のロードロック室 | |
| JP4545852B2 (ja) | 排ガス処理装置 | |
| JPH04187771A (ja) | クリーニング方法 | |
| KR100503256B1 (ko) | 트랩장치 | |
| JP2635653B2 (ja) | 気相成長装置における排気処理部及びその運転方法 | |
| JPH0729842A (ja) | 熱処理装置 | |
| JP2916686B2 (ja) | 真空加熱炉の冷却用気体供給装置 | |
| JPH0774105A (ja) | 半導体製造装置 | |
| JP2003050085A (ja) | 真空処理装置 |