JPH0429439Y2 - - Google Patents
Info
- Publication number
- JPH0429439Y2 JPH0429439Y2 JP1982191351U JP19135182U JPH0429439Y2 JP H0429439 Y2 JPH0429439 Y2 JP H0429439Y2 JP 1982191351 U JP1982191351 U JP 1982191351U JP 19135182 U JP19135182 U JP 19135182U JP H0429439 Y2 JPH0429439 Y2 JP H0429439Y2
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- sample
- beam irradiation
- electron
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 33
- 238000010894 electron beam technology Methods 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 description 15
- 230000001678 irradiating effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19135182U JPS5997458U (ja) | 1982-12-20 | 1982-12-20 | イオン電子線照射装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19135182U JPS5997458U (ja) | 1982-12-20 | 1982-12-20 | イオン電子線照射装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5997458U JPS5997458U (ja) | 1984-07-02 |
JPH0429439Y2 true JPH0429439Y2 (bg) | 1992-07-16 |
Family
ID=30412081
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19135182U Granted JPS5997458U (ja) | 1982-12-20 | 1982-12-20 | イオン電子線照射装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5997458U (bg) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS515315A (en) * | 1974-07-04 | 1976-01-17 | Hiroshi Arima | Rensetsutairuno seizohoho |
JPS52104290A (en) * | 1976-02-27 | 1977-09-01 | Shimadzu Corp | Composite analysis unit |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54117059U (bg) * | 1978-02-03 | 1979-08-16 |
-
1982
- 1982-12-20 JP JP19135182U patent/JPS5997458U/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS515315A (en) * | 1974-07-04 | 1976-01-17 | Hiroshi Arima | Rensetsutairuno seizohoho |
JPS52104290A (en) * | 1976-02-27 | 1977-09-01 | Shimadzu Corp | Composite analysis unit |
Also Published As
Publication number | Publication date |
---|---|
JPS5997458U (ja) | 1984-07-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3616714B2 (ja) | 分析機器内の絶縁試料上を所定表面電位にするための装置 | |
JPS6213789B2 (bg) | ||
JP3399989B2 (ja) | 荷電粒子エネルギー分析装置 | |
JPH0429439Y2 (bg) | ||
JP3155570B2 (ja) | 収束イオンビーム質量分析方法及び収束イオンビーム質量分析複合装置 | |
JPH06124680A (ja) | 2次中性粒子質量分析装置 | |
JP2007103107A (ja) | 荷電粒子ビーム装置及び荷電粒子ビームの照射方法 | |
JP2007035642A (ja) | 電界エミッタの放出面を清掃する電界エミッタ配置及び方法 | |
JPH05135725A (ja) | 荷電粒子ビーム装置における有機ガス分子の除去方法 | |
JP2817277B2 (ja) | X線銃 | |
JP2637948B2 (ja) | ビームプラズマ型イオン銃 | |
JP3246609B2 (ja) | 荷電粒子露光装置におけるクリーニング方法とクリーニング装置 | |
JPH076609Y2 (ja) | 集束イオンビーム加工装置 | |
JP3535402B2 (ja) | イオンビーム装置 | |
JP2550033B2 (ja) | 荷電粒子引き込み機構 | |
JPH0668832A (ja) | 走査電子顕微鏡 | |
JPS6329230Y2 (bg) | ||
JPH0145068Y2 (bg) | ||
JPH02112140A (ja) | 低速イオン銃 | |
JPH0156520B2 (bg) | ||
JPH0475622B2 (bg) | ||
JPH04248240A (ja) | イオン照射器 | |
GB2038544A (en) | The minimisation of surface originating contamination in electron microscopes | |
JP2001110350A (ja) | 荷電粒子線装置 | |
JPH0773845A (ja) | イオン注入装置 |