JPH04292614A - Resin composition for sealing semiconductor - Google Patents

Resin composition for sealing semiconductor

Info

Publication number
JPH04292614A
JPH04292614A JP13071791A JP13071791A JPH04292614A JP H04292614 A JPH04292614 A JP H04292614A JP 13071791 A JP13071791 A JP 13071791A JP 13071791 A JP13071791 A JP 13071791A JP H04292614 A JPH04292614 A JP H04292614A
Authority
JP
Japan
Prior art keywords
formula
phenolic resin
epoxy resin
curing agent
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13071791A
Other languages
Japanese (ja)
Inventor
Shinichi Iwasaki
岩崎 慎一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP13071791A priority Critical patent/JPH04292614A/en
Publication of JPH04292614A publication Critical patent/JPH04292614A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To obtain the subject composition having excellent soldering stress resistance, moisture resistance, etc., and useful for the sealing of electronic parts such as transistor and integrated circuit by using a specific epoxy resin, a phenolic resin hardener, an inorganic filler and a cure accelerator as essential components. CONSTITUTION:The objective composition can be produced by compounding (A) an epoxy resin containing 50-100wt.% (based on total epoxy resin) of 3,3',5,5'- tetramethyl-4,4'-dihydroxybiphenyl glycidyl ether of formula I with (B) a phenolic resin hardener containing 50-100wt.% (based on total phenolic resin hardener) of a phenolic resin hardener of formula II (n is 0-5; R is H, halogen or 1-4C alkyl), (C) an inorganic filler (preferably fused silica powder), (D) a cure accelerator (e.g. diazabicyclo-undecene) and, as necessary, (E) a silane-coupling agent, a flame-retardant, a coloring agent (e.g. iron oxide red), etc.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、耐半田ストレス性及び
耐湿性に優れた半導体封止用樹脂組成物に関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin composition for encapsulating semiconductors having excellent solder stress resistance and moisture resistance.

【0002】0002

【従来の技術】従来、ダイオード、トランジスタ、集積
回路等の電子部品を熱硬化性樹脂で封止しているが、特
に集積回路では耐熱性、耐湿性に優れたオルソクレゾー
ルノボラックエポキシ樹脂をノボラック型フェノール樹
脂で硬化させたエポキシ樹脂が用いられている。ところ
が半導体パッケージの実装方法としては従来のスルーホ
ール実装から表面実装へ、そして半導体パッケージの種
類としては実装方法に対応してDIPからSOP、SO
J、PLCCに変わってきている。そして最近では、パ
ッケージの厚みが従来のものに比べて非常に薄い約1m
m厚のTSOP、TQFPというパッケージもあらわれ
てきている。
[Prior Art] Conventionally, electronic components such as diodes, transistors, and integrated circuits have been encapsulated with thermosetting resins.In particular, for integrated circuits, ortho-cresol novolac epoxy resins with excellent heat resistance and moisture resistance are used. Epoxy resin cured with phenolic resin is used. However, the mounting method for semiconductor packages has changed from conventional through-hole mounting to surface mounting, and the types of semiconductor packages have changed from DIP to SOP to SO.
J, it is changing to PLCC. And recently, the thickness of the package is about 1 m, which is much thinner than the conventional one.
Packages called m-thick TSOP and TQFP are also appearing.

【0003】即ち大型チップを小型で薄いパッケージに
封入することにより、応力によるクラック発生、これら
のクラックによる耐湿性の低下等の問題が大きくクロー
ズアップされてきている。特に半田付けの工程において
急激に200℃以上の高温にさらされることによりパッ
ケージの割れや樹脂とチップ間の剥離等により耐湿性が
劣化してしまうといった問題点がでてきている。そのた
め半田耐熱性と耐湿性の2点をクリアーできる封止樹脂
が必要とされている。
That is, by enclosing a large chip in a small and thin package, problems such as the occurrence of cracks due to stress and a decrease in moisture resistance due to these cracks have been brought into focus. In particular, problems have arisen in that moisture resistance deteriorates due to cracking of the package, peeling between the resin and the chip, etc. due to sudden exposure to high temperatures of 200° C. or higher during the soldering process. Therefore, there is a need for a sealing resin that can meet the two requirements of soldering heat resistance and moisture resistance.

【0004】これらの問題を解決するために半田付け時
の熱衝撃を緩和する目的で、熱可塑註オリゴマーの添加
(特開昭62−115849号公報)や各種シリコーン
化合物の添加(特開昭62−11585号公報、62−
116654号公報、62−128162号公報)、更
にはシリコーン変性(特開昭62−136860号公報
)などの手法で対処しているがいずれも半田付け時にパ
ッケージにクラックが生じてしまい信頼吐の優れた半導
体封止用エポキシ樹脂組成物を得るまでには至らなかっ
た。
To solve these problems, in order to alleviate the thermal shock during soldering, addition of thermoplastic oligomers (Japanese Unexamined Patent Publication No. 62-115849) and various silicone compounds (Unexamined Japanese Patent Publication No. 62-115849) have been proposed. -11585 Publication, 62-
116654, 62-128162) and silicone modification (Japanese Unexamined Patent Publication No. 62-136860), but all of these techniques resulted in cracks in the package during soldering, making it difficult to maintain reliability. However, it has not been possible to obtain an epoxy resin composition for semiconductor encapsulation.

【0005】一方、耐半田ストレス性に優れた耐熱性エ
ポキシ樹脂組成物を得る為に、樹脂系としては多官能エ
ポキシ樹脂の使用(特開昭61−168620号公報)
等が検討されてきたが、多官能エポキシ樹脂の使用によ
り架橋密度が上がり耐熱性は向上するが、特に200℃
〜300℃のような高温にさらされた場合においては耐
半田ストレス性が不充分であった。
On the other hand, in order to obtain a heat-resistant epoxy resin composition with excellent solder stress resistance, a polyfunctional epoxy resin is used as the resin system (Japanese Unexamined Patent Publication No. 168620/1983).
The use of polyfunctional epoxy resins increases crosslinking density and improves heat resistance, but especially at 200°C.
When exposed to high temperatures such as ~300°C, the solder stress resistance was insufficient.

【0006】[0006]

【発明が解決しようとする課題】本発明は耐半田ストレ
ス性及び耐湿性が著しく優れた半導体封止用樹脂組成物
を提供するものである。
OBJECTS OF THE INVENTION The present invention provides a resin composition for semiconductor encapsulation which has excellent solder stress resistance and moisture resistance.

【0007】[0007]

【課題を解決するための手段】本発明者らはこれらの問
題を解決するために鋭意研究を進め、つぎの組成を持つ
樹脂組成物を見い出した。エポキシ樹脂として式〔I〕
の化学構造式で示される3、3′、5、5′−テトラメ
チル−4、4′−ジヒドロキシビフェニルグリシジルエ
ーテル
[Means for Solving the Problems] In order to solve these problems, the present inventors conducted extensive research and discovered a resin composition having the following composition. Formula [I] as epoxy resin
3,3',5,5'-tetramethyl-4,4'-dihydroxybiphenyl glycidyl ether represented by the chemical structural formula

【0008】[0008]

【化3】 を総エポキシ樹脂量に対して50〜100重量%を含む
エポキシ樹脂とフェノール樹脂硬化剤として式〔II〕
で示される構造のジシクロペンタジエン変性フェノール
樹脂硬化剤
Formula [II] as an epoxy resin containing 50 to 100% by weight of [Chemical formula 3] and a phenol resin curing agent based on the total amount of epoxy resin
Dicyclopentadiene-modified phenolic resin curing agent with the structure shown in

【0009】[0009]

【化4】 (nは整数でありn=0〜5、式中のRは水素原子、ハ
ロゲン原子、炭素数1〜4のアルキル基の中から選択さ
れる原子または基)を総フェノール樹脂硬化剤量に対し
て50〜100重量%含むフェノール樹脂硬化剤、無機
充填材及び硬化促進剤を必須成分とした樹脂組成物で、
従来のエポキシ樹脂組成物に比べて、非常に優れた耐半
田ストレス性及び耐湿性を有したものである。
[Chemical formula 4] (n is an integer and n=0 to 5, R in the formula is an atom or group selected from a hydrogen atom, a halogen atom, and an alkyl group having 1 to 4 carbon atoms) is cured with a total phenolic resin A resin composition containing as essential components a phenolic resin curing agent, an inorganic filler, and a curing accelerator containing 50 to 100% by weight based on the amount of the agent,
It has extremely superior solder stress resistance and moisture resistance compared to conventional epoxy resin compositions.

【0010】0010

【作用】本発明において用いられる式〔I〕で示される
構造のビフェニル型エポキシ化合物は成形温度(175
℃)において数センチポイズであり従来のエポキシ樹脂
に比べて非常に低粘度を有するために、充填材の含有量
を大幅に増加させることが可能であり、樹脂組成物の衝
撃強度を向上させ半田耐熱性に優れるという特徴を有し
ている。式〔I〕で示されるビフェニル型エポキシ化合
物は単独で用いても他のエポキシ樹脂と混合して用いて
も良いがビフェニル型エポキシ化合物が総エポキシ樹脂
量中の50重量%以上とすることが必要である。50%
未満の場合は、流動性が悪い組成物となる。併用するエ
ポキシ樹脂としては、オルソクレゾールノボラックエポ
キシ樹脂、3官能エポキシ樹脂等が挙げられ、これらは
1種または2種以上混合して用いてもよい。
[Operation] The biphenyl type epoxy compound having the structure represented by the formula [I] used in the present invention has a molding temperature (175
Because it has a very low viscosity compared to traditional epoxy resins, only a few centipoise at ℃), it is possible to significantly increase the filler content, which improves the impact strength of the resin composition and improves solder heat resistance. It has the characteristic of being excellent in quality. The biphenyl-type epoxy compound represented by formula [I] may be used alone or mixed with other epoxy resins, but it is necessary that the biphenyl-type epoxy compound accounts for 50% by weight or more of the total amount of epoxy resin. It is. 50%
If it is less than 20%, the composition will have poor fluidity. Epoxy resins used in combination include orthocresol novolac epoxy resins, trifunctional epoxy resins, and the like, and these may be used alone or in combination of two or more.

【0011】式〔II〕で示される構造のジシクロペン
タジエン変性フェノール樹脂硬化剤は、分子中に可撓性
を有するジシクロペンタジエン構造を有することを特徴
とするものであり、これを用いることにより可撓性に富
み、耐半田ストレス姓に良好なエポキシ樹脂組成物を得
ることができる。
The dicyclopentadiene-modified phenolic resin curing agent having the structure represented by formula [II] is characterized by having a flexible dicyclopentadiene structure in the molecule, and by using this, It is possible to obtain an epoxy resin composition that is highly flexible and has good solder stress resistance.

【0012】ジシクロペンタジエン変性フェノール樹脂
硬化剤の使用量は、これを調節することにより耐半田ス
トレス性を最大限に引き出すことができる。耐半田スト
レス性の効果を出す為にはジシクロペンタジエン変性フ
ェノール樹脂硬化剤を全硬化剤に対して50重量%以上
、好ましくは70重量%以上の使用が望ましい。50重
量%未満だと可撓性が上がらず耐半田ストレス性が不充
分である。
By adjusting the amount of the dicyclopentadiene-modified phenolic resin curing agent used, the solder stress resistance can be maximized. In order to obtain the effect of solder stress resistance, it is desirable to use the dicyclopentadiene-modified phenol resin curing agent in an amount of 50% by weight or more, preferably 70% by weight or more based on the total curing agent. If it is less than 50% by weight, flexibility will not increase and solder stress resistance will be insufficient.

【0013】式〔II〕で示される構造のジシクロペン
タジエン変性フェノール樹脂硬化剤と併用する硬化剤と
しては、エポキシ樹脂と反応する硬化剤全般をいい例え
ば、フェノールノポラソク樹脂、クレゾールノボラソク
樹脂、トリス(ヒドロキシアルキルフェニル)メタン型
フェノール樹脂、パラキシレン変性フェノール樹脂等を
用いることができる。
[0013] The curing agent used in combination with the dicyclopentadiene-modified phenol resin curing agent having the structure represented by formula [II] includes any curing agent that reacts with epoxy resins, such as phenol noporasoc resin, cresol noporasoc resin, etc. A resin, tris(hydroxyalkylphenyl)methane type phenol resin, paraxylene modified phenol resin, etc. can be used.

【0014】エポキシ樹脂とフェノール樹脂硬化剤の配
合比は、硬化剤の水酸基数1に対し、エポキシ樹脂のエ
ポキシ基数を0.5〜2の範囲内になるように配合を調
製する必要がある。0.5未満または2を超えたものは
耐湿性、成形作業性および硬化物の電気特性が悪くなる
。好ましくは、硬化剤の水酸基数1に対し、エポキシ樹
脂のエポキシ基数が1.1〜1.3の範囲内とする配合
が好適である。1.1未満または1.3を超えたものは
、吸水性が上がり半田浸漬時の熱衝撃が増加し、耐半田
ストレス性が悪くなる傾向がある。
The blending ratio of the epoxy resin and the phenolic resin curing agent must be adjusted so that the number of epoxy groups in the epoxy resin is within the range of 0.5 to 2 to 1 hydroxyl group in the curing agent. If it is less than 0.5 or more than 2, the moisture resistance, molding workability, and electrical properties of the cured product will be poor. Preferably, the curing agent has 1 hydroxyl group and the epoxy resin has 1.1 to 1.3 epoxy groups. If it is less than 1.1 or more than 1.3, water absorption increases, thermal shock during solder immersion increases, and solder stress resistance tends to deteriorate.

【0015】本発明で用いる無機充填材としては、溶融
シリカ粉末、球状シリカ粉末、結晶シリカ粉末、2次凝
集シリカ粉末、多孔質シリカ粉末、2次凝集シリカ粉末
または多孔質シリカ粉末を粉砕したシリカ粉末、アルミ
ナ等が挙げられ、特に溶融シリカ粉末が好ましい。
As the inorganic filler used in the present invention, fused silica powder, spherical silica powder, crystalline silica powder, secondary agglomerated silica powder, porous silica powder, secondary agglomerated silica powder, or pulverized porous silica powder can be used. Examples include powder, alumina, etc., and fused silica powder is particularly preferred.

【0016】本発明に使用される硬化促進剤はエポキシ
基とフェノール性水酸基との反応を促進するものであれ
ばよく、一般に封止用材料に使用されているものを広く
使用することができ、例えばジアザビシク口ウンデセン
(DBU)、トリフェニルホスフィン(TPP)、ジメ
チルベンゾルアミン(BDMA)や2メチルイミダゾー
ル(2MZ)等が単独もしくは2種類以上混合して用い
られる。
The curing accelerator used in the present invention may be one that promotes the reaction between the epoxy group and the phenolic hydroxyl group, and a wide variety of those commonly used in sealing materials can be used. For example, diazabicundecene (DBU), triphenylphosphine (TPP), dimethylbenzolamine (BDMA), 2methylimidazole (2MZ), and the like are used alone or in combination of two or more.

【0017】本発明の封止用樹脂組成物はエポキシ樹脂
、フェノール樹脂硬化剤、無機充填材及び硬化促進剤を
必須成分とするが、これ以外に必要に応じてシランカッ
プリング剤、ブロム化エポキシ樹脂、三酸化アンチモン
、ヘキサブロムベンゼン等の難燃剤、カーボンブラック
、ベンガラ等の着色剤、天然ワックス、合成ワックス等
の離型剤及びシリコーンオイル、ゴム等の低応力添加剤
等の種々の添加剤を適宜配合しても差し支えがない。
The sealing resin composition of the present invention contains an epoxy resin, a phenol resin curing agent, an inorganic filler, and a curing accelerator as essential components, but in addition to these, a silane coupling agent and a brominated epoxy resin are optionally added. Various additives such as resins, flame retardants such as antimony trioxide and hexabromobenzene, colorants such as carbon black and red iron, mold release agents such as natural wax and synthetic wax, and low stress additives such as silicone oil and rubber. There is no problem in appropriately blending.

【0018】又、本発明の封止用樹脂組成物を成形材料
として製造するには、エポキシ樹脂、硬化剤、硬化促進
剤、充填剤、その他の添加剤をミキサー等によって十分
に均一に混合した後、さらに熱ロールまたはニーダー等
で溶融混練し、冷却後粉砕して成形材料とすることがで
きる。これらの成形材料は電子部品あるいは電気部品の
封止、被覆、絶縁等に適用することができる。
In order to produce the encapsulating resin composition of the present invention as a molding material, the epoxy resin, curing agent, curing accelerator, filler, and other additives are thoroughly and uniformly mixed using a mixer or the like. After that, the mixture is further melt-kneaded using a heated roll or a kneader, cooled, and then crushed to obtain a molding material. These molding materials can be applied to sealing, covering, insulating, etc. electronic or electrical components.

【0019】[0019]

【実施例】以下、本発明を実施例で示す。なお配合割合
は重量部とする。
[Examples] The present invention will be illustrated below with examples. The blending ratio is expressed in parts by weight.

【0020】実施例1〜4、比較例1、2表1に示した
それぞれの配合割合の組成物を常温にて十分に混合し、
更に95〜100℃で2軸ロールにより混練し、冷却後
粉砕して成形材料とし、これをタブレット化して半導体
封止用エポキシ樹脂組成物を得た。
Examples 1 to 4, Comparative Examples 1 and 2 The compositions having the proportions shown in Table 1 were thoroughly mixed at room temperature.
The mixture was further kneaded with a twin-screw roll at 95 to 100°C, cooled, and then ground to obtain a molding material, which was then made into tablets to obtain an epoxy resin composition for semiconductor encapsulation.

【0021】※1  式〔III〕で示されるジシクロ
ペンタジエン変性フェノール樹脂
*1 Dicyclopentadiene-modified phenol resin represented by formula [III]

【0022】[0022]

【化5】 (n=1、3、4の化合物の割合が2:6:2である混
合物)
[Chemical formula 5] (Mixture where the ratio of compounds n=1, 3, 4 is 2:6:2)

【0023】この材料をトランスファー成形機(成形条
件:金型温度175℃、硬化時間2分)を用いて成形し
、得られた成形品を175℃、8時間で後硬化し評価し
た。結果を表1に示す。
This material was molded using a transfer molding machine (molding conditions: mold temperature: 175°C, curing time: 2 minutes), and the resulting molded product was post-cured at 175°C for 8 hours and evaluated. The results are shown in Table 1.

【0024】評価方法 ※2  スパイラルフロー:EMMI−I−66に準じ
たスパイラルフロー測定用金型を用い、試料を20g、
成形温度175℃、成形圧力7.0MPa、成形時間2
分で成形した時の成形品の長さ。 ※3  半田耐熱性試験:成形品(チップサイズ36m
m2、パッケージ厚2.05mm)20個について85
℃、85%RHの水蒸気下で72時間処理後、240℃
の半田槽に10秒間浸漬し、クラックの発生した成形品
の個数を示す。 ※4  半田耐湿性試験:封止したテスト用素子を85
℃で、85%RHの環境下で72Hr処理し、その後2
50℃の半田槽に10秒間浸漬後、プレッシャークッカ
ー試験(125℃、100%RH)を行い回路のオープ
ン不良を測定した。
Evaluation method *2 Spiral flow: Using a spiral flow measurement mold conforming to EMMI-I-66, 20g of the sample was
Molding temperature: 175°C, molding pressure: 7.0 MPa, molding time: 2
The length of the molded product when molded in minutes. *3 Soldering heat resistance test: Molded product (chip size 36m)
m2, package thickness 2.05mm) 85 for 20 pieces
℃, 240℃ after 72 hours of treatment under steam at 85% RH
The number of molded products that cracked after being immersed in a solder bath for 10 seconds is shown. *4 Solder moisture resistance test: 85% of sealed test element
℃, treated for 72 hours in an environment of 85% RH, and then treated for 2 hours.
After being immersed in a solder bath at 50° C. for 10 seconds, a pressure cooker test (125° C., 100% RH) was conducted to measure open defects in the circuit.

【0025】[0025]

【表1】[Table 1]

【0026】[0026]

【発明の効果】本発明による半導体封止用樹脂組成物は
半田耐熱性及び耐湿性に極めて優れており、表面実装封
止用樹脂組成物として非常に信頼性の高いものである。
[Effects of the Invention] The resin composition for semiconductor encapsulation according to the present invention has extremely excellent soldering heat resistance and moisture resistance, and is extremely reliable as a resin composition for surface mount encapsulation.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  (A)式〔I〕の化学構造式で示され
る3、3′、5、5′−テトラメチル−4、4′−ジヒ
ドロキシビフェニルグリシジルエーテル 【化1】 を総エポキシ樹脂量に対して50〜100重量%を含む
エポキシ樹脂 (B)式〔II〕で示されるフェノール樹脂硬化剤【化
2】 (nは整数でありn=0〜5、式中のRは水素原子、ハ
ロゲン原子、炭素数1〜4のアルキル基の中から選択さ
れる原子または基)を総フェノール樹脂硬化剤量に対し
て50〜100重量%含むフェノール樹脂硬化剤(C)
無機充填材 (D)硬化促進剤を必須成分とすることを特徴とする半
導体封止用樹脂組成物。
Claim 1: (A) 3,3',5,5'-tetramethyl-4,4'-dihydroxybiphenyl glycidyl ether [Chemical formula 1] represented by the chemical structural formula of formula [I] in a total amount of epoxy resin Epoxy resin (B) containing 50 to 100% by weight of a phenolic resin curing agent represented by formula [II] [Chemical formula 2] (n is an integer and n = 0 to 5, R in the formula is a hydrogen atom, A phenolic resin curing agent (C) containing 50 to 100% by weight of a halogen atom, an atom or group selected from alkyl groups having 1 to 4 carbon atoms, based on the total amount of phenolic resin curing agent.
A resin composition for semiconductor encapsulation, characterized in that it contains an inorganic filler (D) and a curing accelerator as an essential component.
JP13071791A 1991-03-19 1991-03-19 Resin composition for sealing semiconductor Pending JPH04292614A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13071791A JPH04292614A (en) 1991-03-19 1991-03-19 Resin composition for sealing semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13071791A JPH04292614A (en) 1991-03-19 1991-03-19 Resin composition for sealing semiconductor

Publications (1)

Publication Number Publication Date
JPH04292614A true JPH04292614A (en) 1992-10-16

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP13071791A Pending JPH04292614A (en) 1991-03-19 1991-03-19 Resin composition for sealing semiconductor

Country Status (1)

Country Link
JP (1) JPH04292614A (en)

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